Patents by Inventor Seizo Doi

Seizo Doi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Computer-aided designing assistant apparatus and method of assisting designing of environmentally conscious product
    Patent number: 7266482
    Abstract: Disclosed is a computer-aided product designing assistant apparatus and method for assisting designing of an environmentally conscious product by presenting at least one design guideline to be adopted in designing the environmental counscious product.
    Type: Grant
    Filed: July 1, 2004
    Date of Patent: September 4, 2007
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hideki Kobayashi, Seizo Doi, Kazuhito Haruki, Akinori Hongu
  • Computer-aided designing assistant apparatus and method of assisting designing of environmentally conscious product
    Publication number: 20040236551
    Abstract: Disclosed is a computer-aided product designing assistant apparatus and method for assisting designing of an environmentally conscious product by presenting at least one design guideline to be adopted in designing the environmental counscious product.
    Type: Application
    Filed: July 1, 2004
    Publication date: November 25, 2004
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Hideki Kobayashi, Seizo Doi, Kazuhito Haruki, Akinori Hongu
  • Computer-aided designing assistant apparatus and method of assisting designing of environmentally conscious product
    Patent number: 6811344
    Abstract: Disclosed is a computer-aided product designing assistant apparatus and method for assisting designing of an environmentally conscious product by presenting at least one design guideline to be adopted in designing the environmental conscious product.
    Type: Grant
    Filed: May 28, 1999
    Date of Patent: November 2, 2004
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hideki Kobayashi, Seizo Doi, Kazuhito Haruki, Akinori Hongu
  • Electron-beam lithography system and method for drawing nanometer-order pattern
    Patent number: 5767521
    Abstract: An electron-beam lithography system employing an "electron holography" technique is disclosed. The system at least comprises: a shaping aperture for shaping an electron beam emitted from an electron-beam source so as to have a specific beam shape; at least two single crystal thin films for diffracting the electron beam passed through this shaping aperture; focusing means for respectively focusing the incident electron beam passed through these single crystal thin films and the diffracted electron beams diffracted by these single crystal thin films; and a select aperture for selecting only the desired diffracted electron beams. The transmitted incident electron beam interferes with the diffracted electron beams, whereby a stripe pattern having a desired nanometer-order pitch is formed on a resist surface coated onto a semiconductor substrate or a mask blank.
    Type: Grant
    Filed: September 14, 1995
    Date of Patent: June 16, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shiro Takeno, Shigeru Kanbayashi, Mitsuo Koike, Seizo Doi, Iwao Higashikawa