Patents by Inventor Sekikin Sho

Sekikin Sho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100022080
    Abstract: The method of manufacturing the semiconductor device includes nitridizing a silicon substrate with ammonia while heating the silicon substrate, then heating the silicon substrate in an atmosphere containing nitrogen and oxygen to form a gate insulating film including a silicon-based insulating film containing nitrogen and oxygen, then annealing the silicon substrate in an oxygen atmosphere, and forming a gate electrode on the gate insulating film.
    Type: Application
    Filed: September 29, 2009
    Publication date: January 28, 2010
    Inventors: Sekikin Sho, Kazuto Ikeda