Patents by Inventor Selina Shi

Selina Shi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9616395
    Abstract: Disclosed are membranes formed from self-assembling diblock copolymers of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing porous membranes. Embodiments of the membranes contain the diblock copolymer self-assembled into a cylindrical morphology. Also disclosed is a method of preparing such membrane which involves spray coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by annealing the thin film in a solvent vapor and/or soaking in a solvent or mixture of solvents to form a nanoporous membrane.
    Type: Grant
    Filed: March 12, 2015
    Date of Patent: April 11, 2017
    Assignee: Pall Corportaion
    Inventors: Khaled Abdel-Hakim Helmy Aamer, Amarnauth Singh, Selina Shi
  • Patent number: 9604181
    Abstract: Disclosed are membranes formed from self-assembling block copolymers, for example, a diblock copolymer of the formula (I): wherein R1—R4, n, and m are as described herein, which find use in preparing nanoporous membranes. Embodiments of the membranes contain the block copolymer that self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such membrane which involves spray coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by annealing the thin film in a solvent vapor and/or soaking in a solvent or mixture of solvents to form a nanoporous membrane.
    Type: Grant
    Filed: March 12, 2015
    Date of Patent: March 28, 2017
    Assignee: Pall Corporation
    Inventors: Khaled Abdel-Hakim Helmy Aamer, Amarnauth Singh, Selina Shi
  • Patent number: 9598543
    Abstract: Disclosed are self-assembled structures formed from self-assembling block copolymers, for example, a diblock copolymer of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing nanoporous membranes. In an embodiment, the block copolymer self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such membrane which involves spin coating a polymer solution containing the block copolymer to obtain a thin film, followed by solvent annealing of the film. Further disclosed is a method of preparing porous membranes from the self-assembled structures.
    Type: Grant
    Filed: May 30, 2014
    Date of Patent: March 21, 2017
    Assignee: Pall Corporation
    Inventors: Khaled Abdel-Hakim Helmy Aamer, Selina Shi
  • Patent number: 9593217
    Abstract: Disclosed are self-assembled structures formed from a self-assembling diblock copolymer of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing porous membranes. In an embodiment, the diblock copolymer is present in the self-assembled structures in a cylindrical morphology. Also disclosed is a method of preparing a self-assembled structure, which involves spin coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by solvent annealing of the film.
    Type: Grant
    Filed: May 30, 2014
    Date of Patent: March 14, 2017
    Assignee: Pall Corporation
    Inventors: Khaled Abdel-Hakim Helmy Aamer, Selina Shi
  • Patent number: 9593219
    Abstract: Disclosed are membranes formed from self-assembling block copolymers, for example, diblock copolymers of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing nanoporous membranes. Embodiments of the membranes contain a block copolymer that self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such membrane which involves spin coating a polymer solution containing the block copolymer to obtain a thin film, followed by annealing the thin film in a solvent vapor and/or soaking in a solvent or mixture of solvents to form a nanoporous membrane.
    Type: Grant
    Filed: May 30, 2014
    Date of Patent: March 14, 2017
    Assignee: Pall Corporation
    Inventors: Khaled Abdel-Hakim Helmy Aamer, Selina Shi
  • Patent number: 9593218
    Abstract: Disclosed are self-assembled structures formed from self-assembling diblock copolymers of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing nanoporous membranes. In embodiments of the self-assembled structure, the block copolymer self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such self-assembled structure which involves spin coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by solvent annealing of the film. Further disclosed is a method of preparing porous membranes from the self-assembled structures.
    Type: Grant
    Filed: May 30, 2014
    Date of Patent: March 14, 2017
    Assignee: Pall Corporation
    Inventors: Khaled Abdel-Hakim Helmy Aamer, Selina Shi
  • Patent number: 9469733
    Abstract: Disclosed are self-assembled structures prepared from block copolymers, for example, diblock copolymers of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing nanoporous membranes. In an embodiment, the block copolymer self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such self-assembled structures which involves spin coating a polymer solution containing the block copolymer to obtain a thin film, followed by solvent annealing of the film. Further disclosed is a method of preparing porous membranes from the self-assembled structures.
    Type: Grant
    Filed: May 30, 2014
    Date of Patent: October 18, 2016
    Assignee: Pall Corporation
    Inventors: Khaled Abdel-Hakim Helmy Aamer, Selina Shi
  • Publication number: 20150343398
    Abstract: Disclosed are membranes formed from self-assembling block copolymers, for example, a diblock copolymer of the formula (I): wherein R1—R4, n, and m are as described herein, which find use in preparing nanoporous membranes. Embodiments of the membranes contain the block copolymer that self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such membrane which involves spray coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by annealing the thin film in a solvent vapor and/or soaking in a solvent or mixture of solvents to form a nanoporous membrane.
    Type: Application
    Filed: March 12, 2015
    Publication date: December 3, 2015
    Applicant: PALL CORPORATION
    Inventors: Khaled Abdel-Hakim Helmy AAMER, Amarnauth SINGH, Selina SHI
  • Publication number: 20150343397
    Abstract: Disclosed are membranes formed from self-assembling diblock copolymers of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing porous membranes. Embodiments of the membranes contain the diblock copolymer self-assembled into a cylindrical morphology. Also disclosed is a method of preparing such membrane which involves spray coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by annealing the thin film in a solvent vapor and/or soaking in a solvent or mixture of solvents to form a nanoporous membrane.
    Type: Application
    Filed: March 12, 2015
    Publication date: December 3, 2015
    Applicant: PALL CORPORATION
    Inventors: Khaled Abdel-Hakim Helmy AAMER, Amarnauth SINGH, Selina SHI
  • Publication number: 20150344638
    Abstract: Disclosed are self-assembled structures formed from self-assembling block copolymers, for example, a diblock copolymer of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing nanoporous membranes. In an embodiment, the block copolymer self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such membrane which involves spin coating a polymer solution containing the block copolymer to obtain a thin film, followed by solvent annealing of the film. Further disclosed is a method of preparing porous membranes from the self-assembled structures.
    Type: Application
    Filed: May 30, 2014
    Publication date: December 3, 2015
    Inventors: Khaled Abdel-Hakim Helmy AAMER, Selina SHI
  • Publication number: 20150344637
    Abstract: Disclosed are self-assembled structures prepared from block copolymers, for example, diblock copolymers of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing nanoporous membranes. In an embodiment, the block copolymer self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such self-assembled structures which involves spin coating a polymer solution containing the block copolymer to obtain a thin film, followed by solvent annealing of the film. Further disclosed is a method of preparing porous membranes from the self-assembled structures.
    Type: Application
    Filed: May 30, 2014
    Publication date: December 3, 2015
    Inventors: Khaled Abdel-Hakim Helmy AAMER, Selina SHI
  • Publication number: 20150344653
    Abstract: Disclosed are self-assembled structures formed from a self-assembling diblock copolymer of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing porous membranes. In an embodiment, the diblock copolymer is present in the self-assembled structures in a cylindrical morphology. Also disclosed is a method of preparing a self-assembled structure, which involves spin coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by solvent annealing of the film.
    Type: Application
    Filed: May 30, 2014
    Publication date: December 3, 2015
    Inventors: Khaled Abdel-Hakim Helmy AAMER, Selina SHI
  • Publication number: 20150344654
    Abstract: Disclosed are self-assembled structures formed from self-assembling diblock copolymers of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing nanoporous membranes. In embodiments of the self-assembled structure, the block copolymer self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such self-assembled structure which involves spin coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by solvent annealing of the film. Further disclosed is a method of preparing porous membranes from the self-assembled structures.
    Type: Application
    Filed: May 30, 2014
    Publication date: December 3, 2015
    Inventors: Khaled Abdel-Hakim Helmy AAMER, Selina SHI
  • Publication number: 20150344655
    Abstract: Disclosed are membranes formed from self-assembling block copolymers, for example, diblock copolymers of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing nanoporous membranes. Embodiments of the membranes contain a block copolymer that self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such membrane which involves spin coating a polymer solution containing the block copolymer to obtain a thin film, followed by annealing the thin film in a solvent vapor and/or soaking in a solvent or mixture of solvents to form a nanoporous membrane.
    Type: Application
    Filed: May 30, 2014
    Publication date: December 3, 2015
    Inventors: Khaled Abdel-Hakim Helmy AAMER, Selina SHI
  • Patent number: 9162189
    Abstract: Disclosed are membranes formed from self-assembling diblock copolymers of the formula (I): wherein R1 is C1-C22 alkyl, R2 is C6-C20 aryl or heteroaryl, one of R3 and R4 is a C6-C14 aryl and the other is C1-C22 alkoxy, and n and m are independently about 10 to about 2000, which find use in preparing nanoporous membranes. Embodiments of the membranes contain the diblock copolymer that self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such a membrane which involves spin coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by annealing the thin film in a solvent vapor and/or soaking in a solvent or mixture of solvents to form a nanoporous membrane.
    Type: Grant
    Filed: May 30, 2014
    Date of Patent: October 20, 2015
    Assignee: Pall Corporation
    Inventors: Khaled Abdel-Hakim Helmy Aamer, Selina Shi