Abstract: A device that may be used for a phase change random access memory in a semiconductor device and a manufacturing method thereof are provided. The device includes a phase change unit and two sidewall electrodes respectively located on two opposite sidewalls of the phase change unit. The phase change unit includes a three layer structure, in which a phase change material layer is positioned between a top insulating material layer and a bottom insulating material layer. The first sidewall electrode and the second sidewall electrode are in contact with two opposite end faces of the phase change material layer. The contact area between electrode and phase change material is reduced, thereby obtaining a relatively small drive current and meeting a demand that the integrated level of such a device is increasingly enhanced.

Abstract: The present invention discloses a phase change memory and a manufacturing method thereof. The phase change memory according to the present invention uses top electrodes provided on the top of storage nodes to heat the storage nodes such that a phase change layer in the storage nodes undergoes a phase change. In the phase change memory of embodiments of the present invention, the contact area between the top electrode and the storage node is relatively small, which is good for phase change. Moreover, each column of storage nodes is connected by the same linear top electrode, which can improve photo alignment shift margin.