Patents by Inventor Sen Hou
Sen Hou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20210213182Abstract: A medical hydrogel is formed by in-situ crosslinking an aldehyde-terminated multi-arm star polyethylene glycol and a polyamino compound. The aldehyde group and the multi-arm star polyethylene glycol are linked by a chemical bond such as an ether bond, an amide bond, an ester bond, a urethane bond, an imine bond, or a urea bond. The molar ratio of the amino in the polyamino compound to the aldehyde group in the aldehyde-terminated multi-arm star polyethylene glycol is 0.4-4.4:1. The polyamino compound is polylysine or a mixture of polylysine and polyethylenimine in a molar ratio of 2-30:3.Type: ApplicationFiled: July 4, 2019Publication date: July 15, 2021Inventors: Zhen PAN, Liang CHEN, Sen HOU
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Publication number: 20210162092Abstract: A medical hydrogel is formed by in-situ crosslinking an aldehyde-terminated multi-arm star polyethylene glycol and a polyamino compound. The aldehyde group and the multi-arm star polyethylene glycol are linked by a chemical bond such as an ether bond, an amide bond, a urethane bond, an imine bond, or a urea bond. The aldehyde group at the end of the multi-arm polyethylene glycol reacts with the amino group in the polyamino compound to produce Schiff base for crosslinking so that the medical injectable gel is formed. The prepared gel has a short gelling time, a desired gel burst strength, and a good stability in an aqueous solution.Type: ApplicationFiled: October 23, 2018Publication date: June 3, 2021Inventors: Zhen PAN, Liang CHEN, Sen HOU
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Patent number: 10513587Abstract: A self-integrating hydrogel includes a water-soluble polymer. The water-soluble polymer includes a repeating unit having at least one functional group that includes an oxygen atom, a sulfur atom, or a nitrogen atom, and a pendant chain covalently attached to the oxygen atom, the sulfur atom, or the nitrogen atom of the at least one functional group of the repeating unit. The pendant chain includes ureido-pyrimidinone.Type: GrantFiled: September 29, 2017Date of Patent: December 24, 2019Assignee: The Regents of the University of MichiganInventors: Peter X. Ma, Sen Hou
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Patent number: 10407473Abstract: Provided herein are FDC-SP polypeptides and methods of using such polypeptides. Methods include, but are not limited to, altering IgA concentration in a subject, treating a subject having signs of a disorder that includes excessive IgA production, identifying a compound that decreases the concentration of IgA in an animal, and identifying a compound that treats a condition associated with increased levels of IgA. Also provided herein is an animal that has decreased expression of an endogenous FDC-SP coding sequence. The animal may develop pathophysiological features of IgA nephropathy, and/or may display increased IgA in serum, saliva, bronchoalveolar lavage fluid, or a combination thereof; increased IgA expressing B lymphocytes in circulation, lymphoid tissue, or a combination thereof; or increased IgA production in vitro by isolated B lymphocytes.Type: GrantFiled: April 27, 2016Date of Patent: September 10, 2019Assignee: UNIVERSITY OF MANITOBAInventors: Aaron Marshall, Sen Hou
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Publication number: 20180094106Abstract: A self-integrating hydrogel includes a water-soluble polymer. The water-soluble polymer includes a repeating unit having at least one functional group that includes an oxygen atom, a sulfur atom, or a nitrogen atom, and a pendant chain covalently attached to the oxygen atom, the sulfur atom, or the nitrogen atom of the at least one functional group of the repeating unit. The pendant chain includes ureido-pyrimidinone.Type: ApplicationFiled: September 29, 2017Publication date: April 5, 2018Inventors: Peter X. Ma, Sen Hou
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Patent number: 9711381Abstract: A method and apparatus for cleaning a substrate after chemical mechanical planarizing (CMP) is provided. The apparatus comprises a housing, a substrate holder rotatable on a first axis and configured to retain a substrate in a substantially vertical orientation, a first pad holder having a pad retaining surface facing the substrate holder in a parallel and spaced apart relation, the first pad holder rotatable on a second axis disposed parallel to the first axis, a first actuator operable to move the pad holder relative to the substrate holder to change a distance between the first axis and the second axis, and a second pad holder disposed in the housing, the second pad holder having a pad retaining surface facing the substrate holder in a parallel and spaced apart relation, the second pad holder rotatable on a third axis parallel to the first axis and the second axis.Type: GrantFiled: January 29, 2014Date of Patent: July 18, 2017Assignee: APPLIED MATERIALS, INC.Inventors: Sen-Hou Ko, Lakshmanan Karuppiah
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Patent number: 9646859Abstract: Embodiments of the present invention relates to an apparatus and method for cleaning a substrate using a disk brush. One embodiment provides a substrate cleaner comprising a substrate chuck disposed in the processing volume, and a brush assembly disposed in the processing volume, wherein the brush assembly comprises a disk brush movably disposed opposing the substrate chuck, and a processing surface of the disk brush contacts a surface of the substrate on the substrate chuck.Type: GrantFiled: April 30, 2010Date of Patent: May 9, 2017Assignee: APPLIED MATERIALS, INC.Inventors: Hui Chen, Allen L. D'Ambra, Sen-Hou Ko, Yufei Chen, Adrian Blank, Mario D. Silvetti, Gerald J. Alonzo, Lakshmanan Karuppiah
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Publication number: 20170040160Abstract: A method and apparatus for cleaning a substrate after chemical mechanical planarizing (CMP) is provided. The apparatus comprises a housing, a substrate holder rotatable on a first axis and configured to retain a substrate in a substantially vertical orientation, a first pad holder having a pad retaining surface facing the substrate holder in a parallel and space apart relation, the first pad holder rotatable on a second axis rotatable parallel to the first axis, a first actuator operable to move the pad holder relative to the substrate holder to change a distance defined between the first axis and the second axis, and a second pad holder disposed in the housing, the second pad holder having a pad retaining surface facing the substrate holder in a parallel and spaced apart relation, wherein the second pad holder is couple with a rotary arm.Type: ApplicationFiled: October 24, 2016Publication date: February 9, 2017Inventors: Hui CHEN, Sen-Hou KO
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Publication number: 20160368954Abstract: Provided herein are FDC-SP polypeptides and methods of using such polypeptides. Methods include, but are not limited to, altering IgA concentration in a subject, treating a subject having signs of a disorder that includes excessive IgA production, identifying a compound that decreases the concentration of IgA in an animal, and identifying a compound that treats a condition associated with increased levels of IgA. Also provided herein is an animal that has decreased expression of an endogenous FDC-SP coding sequence.Type: ApplicationFiled: April 27, 2016Publication date: December 22, 2016Inventors: Aaron Marshall, Sen Hou
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Patent number: 9508575Abstract: A method and apparatus for cleaning a substrate after chemical mechanical planarizing (CMP) is provided. The apparatus comprises a housing, a substrate holder rotatable on a first axis and configured to retain a substrate in a substantially vertical orientation, a first pad holder having a pad retaining surface facing the substrate holder in a parallel and space apart relation, the first pad holder rotatable on a second axis rotatable parallel to the first axis, a first actuator operable to move the pad holder relative to the substrate holder to change a distance defined between the first axis and the second axis, and a second pad holder disposed in the housing, the second pad holder having a pad retaining surface facing the substrate holder in a parallel and spaced apart relation, wherein the second pad holder is couple with a rotary arm.Type: GrantFiled: March 5, 2014Date of Patent: November 29, 2016Assignee: APPLIED MATERIALS, INC.Inventors: Hui Chen, Sen-Hou Ko
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Patent number: 9339526Abstract: Provided herein are FDC-SP polypeptides and methods of using such polypeptides. Methods include, but are not limited to, altering IgA concentration in a subject, treating a subject having signs of a disorder that includes excessive IgA production, identifying a compound that decreases the concentration of IgA in an animal, and identifying a compound that treats a condition associated with increased levels of IgA. Also provided herein is an animal that has decreased expression of an endogenous FDC-SP coding sequence. The animal may develop pathophysiological features of IgA nephropathy, and/or may display increased IgA in serum, saliva, bronchoalveolar lavage fluid, or a combination thereof; increased IgA expressing B lymphocytes in circulation, lymphoid tissue, or a combination thereof; or increased IgA production in vitro by isolated B lymphocytes.Type: GrantFiled: January 17, 2012Date of Patent: May 17, 2016Assignee: UNIVERSITY OF MANITOBAInventors: Aaron Marshall, Sen Hou
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Publication number: 20140360976Abstract: A method and apparatus for conditioning a processing surface of a cylindrical roller disposed in a brush box is described. In one embodiment, a method for processing a substrate is described. The method includes transferring a substrate to a tank, positioning the substrate between two cylindrical rollers disposed in the tank, moving each of the two cylindrical rollers into a first position where a processing surface of each of the cylindrical rollers contacts major surfaces of the substrate, processing the substrate by providing relative motion between at least one of the two cylindrical rollers and the substrate, moving each of the two cylindrical rollers to a second position that is spaced apart from the major surfaces of the substrate, the second position including contacting the processing surface with a conditioning device, and transferring the substrate out of the tank while conditioning the processing surface.Type: ApplicationFiled: August 26, 2014Publication date: December 11, 2014Inventors: Sen-Hou KO, Lakshmanan KARUPPIAH
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Publication number: 20140261539Abstract: A method and apparatus for cleaning a substrate after chemical mechanical planarizing (CMP) is provided. The apparatus comprises a housing, a substrate holder rotatable on a first axis and configured to retain a substrate in a substantially vertical orientation, a first pad holder having a pad retaining surface facing the substrate holder in a parallel and space apart relation, the first pad holder rotatable on a second axis rotatable parallel to the first axis, a first actuator operable to move the pad holder relative to the substrate holder to change a distance defined between the first axis and the second axis, and a second pad holder disposed in the housing, the second pad holder having a pad retaining surface facing the substrate holder in a parallel and spaced apart relation, wherein the second pad holder is couple with a rotary arm.Type: ApplicationFiled: March 5, 2014Publication date: September 18, 2014Inventors: Hui CHEN, Sen-Hou KO
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Patent number: 8813293Abstract: A method and apparatus for conditioning a processing surface of a cylindrical roller disposed in a brush box is described. In one embodiment, a brush box is described. The brush box includes a tank having an interior volume and a pair of cylindrical rollers at least partially disposed in the interior volume, each of the cylindrical rollers being rotatable about a respective axis, an actuator assembly coupled to each of the cylindrical rollers to move the respective cylindrical roller between a first position where the cylindrical rollers are in proximity and a second position where the cylindrical rollers are spaced away from each other, and a conditioning device for each of the cylindrical rollers, each conditioning device including a conditioner disposed in the interior volume, the conditioner contacting an outer surface of each of the cylindrical rollers when the rollers are in the second position.Type: GrantFiled: May 17, 2013Date of Patent: August 26, 2014Assignee: Applied Materials, Inc.Inventors: Sen-Hou Ko, Lakshmanan Karuppiah
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Publication number: 20140209239Abstract: A method and apparatus for cleaning a substrate after chemical mechanical planarizing (CMP) is provided. The apparatus comprises a housing, a substrate holder rotatable on a first axis and configured to retain a substrate in a substantially vertical orientation, a first pad holder having a pad retaining surface facing the substrate holder in a parallel and spaced apart relation, the first pad holder rotatable on a second axis disposed parallel to the first axis, a first actuator operable to move the pad holder relative to the substrate holder to change a distance between the first axis and the second axis, and a second pad holder disposed in the housing, the second pad holder having a pad retaining surface facing the substrate holder in a parallel and spaced apart relation, the second pad holder rotatable on a third axis parallel to the first axis and the second axis.Type: ApplicationFiled: January 29, 2014Publication date: July 31, 2014Inventors: Sen-Hou Ko, Lakshmanan Karuppiah
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Publication number: 20130318644Abstract: Provided herein are FDC-SP polypeptides and methods of using such polypeptides. Methods include, but are not limited to, altering IgA concentration in a subject, treating a subject having signs of a disorder that includes excessive IgA production, identifying a compound that decreases the concentration of IgA in an animal, and identifying a compound that treats a condition associated with increased levels of IgA. Also provided herein is an animal that has decreased expression of an endogenous FDC-SP coding sequence.Type: ApplicationFiled: January 17, 2012Publication date: November 28, 2013Applicant: UNIVERSITY OF MANITOBAInventors: Aaron Marshall, Sen Hou
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Patent number: 8550879Abstract: Embodiments of the present invention generally provide an improved conditioning module and conditioning disks for improved pressure distribution during the process of conditioning a polishing pad of a chemical mechanical polishing (CMP) system. In one embodiment, a conditioning module comprising multiple, small conditioning disks is provided. In one embodiment, a conditioning disk having a compliant backing member is provided. In one embodiment, the compliant backing member comprises a semi-rigid backing member cut into a spiral shape to provide compliancy. In another embodiment, the compliant backing member comprises a fluid-pressurized, flexible membrane. Each embodiment of the present invention provides an improved pressure distribution across the face of each conditioning disk, resulting in increased disk life as well as increased conditioning rate and uniformity.Type: GrantFiled: October 23, 2008Date of Patent: October 8, 2013Assignee: Applied Materials, Inc.Inventors: Hung Chih Chen, Sen-Hou Ko, Shou-Sung Chang
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Publication number: 20130247314Abstract: A method and apparatus for conditioning a processing surface of a cylindrical roller disposed in a brush box is described. In one embodiment, a brush box is described. The brush box includes a tank having an interior volume and a pair of cylindrical rollers at least partially disposed in the interior volume, each of the cylindrical rollers being rotatable about a respective axis, an actuator assembly coupled to each of the cylindrical rollers to move the respective cylindrical roller between a first position where the cylindrical rollers are in proximity and a second position where the cylindrical rollers are spaced away from each other, and a conditioning device for each of the cylindrical rollers, each conditioning device including a conditioner disposed in the interior volume, the conditioner contacting an outer surface of each of the cylindrical rollers when the rollers are in the second position.Type: ApplicationFiled: May 17, 2013Publication date: September 26, 2013Inventors: Sen-Hou KO, Lakshmanan KARUPPIAH
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Publication number: 20130196572Abstract: A particle cleaning module includes a housing, a substrate holder, a pad holder, an actuator and a pad conditioner. The substrate holder is disposed in the housing, is configured to retain a substrate in a substantially vertical orientation, and is rotatable on a first axis. The pad holder is disposed in the housing, has a pad retaining surface facing the substrate holder in a parallel and spaced apart relation, and is rotatable on a second axis parallel to the first axis. The actuator is operable to move the pad holder relative to the substrate holder to change a distance defined between the pad retaining surface and the substrate. The pad conditioner is disposed in the housing and has a conditioning surface oriented parallel to the pad retaining surface.Type: ApplicationFiled: January 27, 2012Publication date: August 1, 2013Inventors: Sen-Hou Ko, Hui Chen
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Publication number: 20130185884Abstract: A method and apparatus for cleaning a substrate are provided. In one embodiment, a particle cleaning module is provided that includes a substrate holder and a pad holder disposed in a housing, and an actuator operable to move the pad holder relative to the substrate holder. The substrate holder is configured to retain and rotate a substrate in a substantially vertical orientation. The pad holder has a pad retaining surface that faces the substrate holder in a parallel and spaced apart relation. The pad holder is rotatable on an axis parallel to an axis on which the substrate holder rotates. The actuator is operable to move the pad holder relative to the substrate holder as to change a distance defined between the first axis and the second axis.Type: ApplicationFiled: January 24, 2013Publication date: July 25, 2013Inventors: Sen-Hou Ko, Lakshmanan Karuppiah