Abstract: Electron acceptor compounds, nonlinear optical chromophores made from the electron acceptor compounds, methods for making the electron acceptor compounds and nonlinear optical chromophores, lattices that include the nonlinear optical chromophores, and devices that include the nonlinear optical chromophores.

Abstract: The present invention discloses an apparatus and a method for determining the voltage level of a first signal from a playback device having an interface in compliance with an industrial standard. According to the method, first receive the first signal by a signal receiving pin electrically coupled to a signal transmitting pin of the interface. Then output a first output voltage by processing the first signal by the combination of a first zener diode and a first transistor and a second output voltage by processing the first signal by the combination of a second zener diode and a second transistor. Thus the voltage level of the first signal can be determined according to the first output voltage and the second output voltage.

Abstract: A polymeric cladding material, cladded waveguides, devices that include cladded waveguides, and methods for using the cladding material. The polymeric cladding material is a thermally reversibly crosslinkable polymer having high conductivity above its glass transition temperature.

Abstract: A polymeric cladding material, cladded waveguides, devices that include cladded waveguides, and methods for using the cladding material. The polymeric cladding material is a thermally reversibly crosslinkable polymer having high conductivity above its glass transition temperature.

Abstract: A method and apparatus for locally etching a substrate area the method including providing a substrate comprising a process surface; depositing a material layer over the process surface; and, applying a wet etchant to cover a targeted etching portion of the process surface while excluding an adjacent surrounding area to selectively etch the material layer overlying the targeted etching portion.

Abstract: A method and a system for updating software containing a first program and a first data group. The first program has a corresponding first program version number and the first data group has a corresponding first data group version number. The method includes providing a second program which has a corresponding second program version number; updating the first program using the second program when the value of the first program version number is different from the value of the second program version number; and deciding whether to update the first data group or not according to the updated first program version number of the updated first program.

Abstract: An apparatus comprising a substrate and an organic semiconductor matrix being located over the substrate. The organic semiconductor matrix includes one of a polymer co-polymer or a stabilized pentacene. The polymer includes monomers of pentacene or a substituted pentacene. The stabilized pentacene is a substituted pentacene having a lower oxidation rate than pentacene.

Abstract: A Cu damascene structure is formed where Cu diffusion barrier is formed by treating the top surface of the surrounding low-k interlayer dielectric with nitrogen or carbon containing medium to form a silicon nitride or silicon carbide diffusion barrier rather than capping the top surface of the Cu with metal diffusion barrier as is conventionally done.

Abstract: A method of forming pluralities of gate sidewall spacers each plurality comprising different associated gate sidewall spacer widths including providing a first plurality of gate structures; blanket depositing a first dielectric layer over the first plurality of gate structures; blanket depositing a second dielectric layer over the first dielectric layer; etching back through a thickness of the first and second dielectric layers; blanket depositing a first photoresist layer to cover the first plurality and patterning to selectively expose at least a second plurality of gate structures; isotropically etching the at least a second plurality of gate structures for a predetermined time period to selectively etch away a predetermined portion of the first dielectric layer; and, selectively etching away the second dielectric layer to leave gate structures comprising a plurality of associated sidewall spacer widths.

Abstract: An LCD panel including a first substrate, a second substrate and a smectic liquid crystal layer is disclosed. The first substrate includes a first electrode, a second electrode and a first horizontal alignment film. The first electrode has plural first portions. The second electrode has plural second portions. The first portions are spaced by the second portions. The electrical field directions formed between the first portions and the second portions are perpendicular to the surface of the first substrate. The electrical field direction on each first portion is opposite to that on each second portion. The first horizontal alignment film covers the first and the second electrodes. The second substrate includes a second horizontal alignment film. The horizontal rubbing direction of the first horizontal alignment film is parallel to that of the second horizontal alignment film. The smectic liquid crystal layer is sealed between the first and the second substrates.

Abstract: Nanoimprint lithography method and imprinted polymer film produced by the method. The polymer film includes a thermoreversibly crosslinkable polymer.

Abstract: A wafer based APC method for controlling an oxide (Cu, or TaN) polish step is described and combines a feed forward model that compensates for incoming wafer variations with a feed backward model which compensates for CMP variations. The method is geared toward minimizing Rs 3? variations. A Rs target value is inputted with metrology data from previous processes that affects the width and thickness of the copper layer. A copper thickness target and polish time for the first wafer is determined. Post CMP measurement data of the first wafer is used to modify the polish rate with a disturbance factor and an updated polish time is computed for subsequent wafers. The CMP recipe for each wafer is adjusted with metrology data and post CMP measurements. The APC method is successful in controlling copper Rs variations for the 90 nm technology node and is independent of copper pattern density.

Abstract: Nonlinear optically active compounds, methods for making nonlinear optically active compounds, compounds useful for making nonlinear optically active compounds, methods for making compounds useful for making nonlinear optically active compounds, macrostructures that include nonlinear optically active components, and devices including the nonlinear optically active compounds and the macrostructures.

Abstract: A method of forming spacers with different widths on a semiconductor substrate, includes the steps of disposing a first spacer layer over the substrate, defining the first spacer layer into a plurality of spacers of a first width, and disposing a second spacer layer selectively over the first spacer layer of a number of the spacers preselected for the second spacer layer, the predetermined number of the spacers with the second spacer layer each having a second width which is different from the first width.

Abstract: Nonlinear optically active compounds, methods for making nonlinear optically active compounds, compounds useful for making nonlinear optically active compounds, methods for making compounds useful for making nonlinear optically active compounds, macrostructures that include nonlinear optically active components, and devices including the nonlinear optically active compounds and the macrostructures.

Abstract: A method of forming pluralities of gate sidewall spacers each plurality comprising different associated gate sidewall spacer widths including providing a plurality of gate structures formed overlying a substrate and a plurality of dielectric layers formed substantially conformally overlying the gate structures; exposing a first selected portion of the plurality followed by anisotropically etching through a thickness portion comprising at least the uppermost dielectric layer to form a first sidewall spacer width; exposing a first subsequent selected portion of the plurality followed by etching through at least a thickness portion of the uppermost dielectric layer; and, exposing a second subsequent selected portion of the plurality followed by anisotropically etching through at least a thickness portion of the uppermost dielectric layer to form a subsequent sidewall spacer width.

Abstract: A method and a system for updating software containing a first program and a first data group. The first program has a corresponding first program version number and the first data group has a corresponding first data group version number. The method includes providing a second program which has a corresponding second program version number; updating the first program using the second program when the value of the first program version number is different from the value of the second program version number; and deciding whether to update the first data group or not according to the updated first program version number of the updated first program.

Abstract: Apparatus for forming a semiconductor structure comprising a first layer on top of a substrate wherein the first layer defines conductive regions such as copper interconnect lines and non-conductive regions such as dielectric materials. The conductive regions are covered by a second layer of a material different than the first layer such as for example nickel and then the structure is heat treated such that the interconnect lines and second metal, such as a copper interconnect line and a nickel second layer, interact with each other to form an alloy layer. The alloy layer has superior qualities for adhering to both the copper interconnect lines and a subsequently deposited dielectric material.

Abstract: A method and apparatus for locally etching a substrate area the method including providing a substrate comprising a process surface; depositing a material layer over the process surface; and, applying a wet etchant to cover a targeted etching portion of the process surface while excluding an adjacent surrounding area to selectively etch the material layer overlying the targeted etching portion.

Abstract: A method for fabricating dielectric barrier layers in integrated circuit structures such as damascene structures is provided. In one embodiment, a low-k dielectric layer formed on a substrate is provided. The low-k dielectric layer has at least one opening exposing an underlying metal layer. A first silicon carbide barrier layer is formed to conformally cover the exposed surfaces of the opening. A portion of the first silicon carbide barrier layer above the low-k dielectric layer and over the bottom of the opening is converted with an oxidation treatment into a layer of silicon oxide. The silicon oxide layer is removed above the low-k dielectric layer and from the bottom of the opening. The opening is filled with a conductive layer in electrical contact with the underlying metal layer. The conductive layer is removed above the low-k dielectric layer to a predetermined depth below the low-k dielectric layer to define a recess therebelow.