Patents by Inventor Sena Yang

Sena Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12656689
    Abstract: Methods and systems for assembling electron spin and charge to possess one or more properties of a topological plasmonic spin texture array for performing lithography that is not limited by an optical system's diffraction limit are disclosed. According to one embodiment, the method includes defining a polarization of an optical field of light and a corresponding coupling-structure geometry. The method includes providing a coupling structure having the defined coupling-structure geometry in a metallic material, the coupling structure defining a region of the metallic material. The method includes directing light having the defined polarization to a center of the region, forming a lattice of plasmonic merons having a finer contrast resolution than a diffraction or reflection based resolution determined by Abbe limit based on the defined polarization of the optical field.
    Type: Grant
    Filed: August 19, 2022
    Date of Patent: June 16, 2026
    Assignees: University of Pittsburgh—Of the Commonwealth System of Higher Education, The Trustees of Columbia University In the City of New York
    Inventors: Hrvoje Petek, Zhikang Zhou, Atreyie Ghosh, Sena Yang, Tianyi Wang, Chen-Bin Huang, Yanan Dai
  • Publication number: 20240353758
    Abstract: Methods and systems for assembling electron spin and charge to possess one or more properties of a topological plasmonic spin texture array for performing lithography that is not limited by an optical system's diffraction limit are disclosed. According to one embodiment, the method includes defining a polarization of an optical field of light and a corresponding coupling-structure geometry. The method includes providing a coupling structure having the defined coupling-structure geometry in a metallic material, the coupling structure defining a region of the metallic material. The method includes directing light having the defined polarization to a center of the region, forming a lattice of plasmonic merons having a finer contrast resolution than a diffraction or reflection based resolution determined by Abbe limit based on the defined polarization of the optical field.
    Type: Application
    Filed: August 19, 2022
    Publication date: October 24, 2024
    Inventors: Hrvoje Petek, Zhikang Zhou, Atreyie Ghosh, Sena Yang, Tianyi Wang, Chen-Bin Huang, Yanan Dai