Patents by Inventor Senlin Wang

Senlin Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250045495
    Abstract: The disclosure belongs to the technical field related to additive manufacturing model preprocessing, and discloses a field-based additive manufacturing digital model feature identification and extraction method and device, the method can convert the digital model represented by the facet into a signed distance field and introduce a simulated physical field of the forming/service simulation, the feature distance field after the frequency domain analysis filtering, and the geometric feature field obtained by the multi-precision convolution unit analysis according to the requirement of feature to be identified, then, multiple fields are combined to realize feature classification determination and labeling of features, and finally feature extraction is completed based on field data and isosurface and isoline reconstruction algorithms.
    Type: Application
    Filed: June 5, 2024
    Publication date: February 6, 2025
    Applicant: HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: Lichao Zhang, Senlin Wang, Zihua Zhang, Jinxin Wu, Si Chen, Jiang Huang
  • Publication number: 20250014284
    Abstract: Disclosed are free-form curved surface slicing method and device based on implicit model, includes following: (1) Using mesh model of layered curved surface to intersect with implicit model of a part to be manufactured to obtain contour lines; (2) Comparing rules for intersecting contour lines and meshes within mesh, mesh coordinates are substituted into implicit model, obtaining a position of an intersection point of contour lines in corresponding mesh; (3) Using interpolation method to calculate intersection coordinates of contour lines and mesh boundary, specifying storing sequence of interpolation points, storing intersection points of discrete line segments in mesh; (4) Merging unordered point sets obtained to establish topological relationship between point sets and discrete line segments, each line segment corresponds to two endpoints, each endpoint corresponds to two line segments, based on above, all points traversed will be connected into complete and ordered profile, that is sliced profile.
    Type: Application
    Filed: June 11, 2024
    Publication date: January 9, 2025
    Applicant: HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: Lichao Zhang, Si Chen, Senlin Wang, Jiang Huang, Jinxin Wu, Zihua Zhang
  • Publication number: 20200106124
    Abstract: Provided herein are silicon-based anode active materials for use in lithium-ion batteries, to their method of preparation and to their use in the anode of a lithium-ion battery. Also disclosed herein are lithium-ion batteries and anodes manufactured using the anode active materials described herein.
    Type: Application
    Filed: September 28, 2018
    Publication date: April 2, 2020
    Inventors: Senlin WANG, Laiyong XIE, Jing XIANG, Weiqun LI
  • Patent number: 10025152
    Abstract: An anti-electrostatic device used in an array substrate of a liquid crystal display and a method for manufacturing the same, and a substrate are disclosed. The method includes steps of: forming a first insulation layer on a first conductive layer; forming a pattern on the first insulation layer; forming an etching barrier layer on the pattern; forming a first via hole and a second via hole extending through the etching barrier layer, and forming a fifth via hole extending through the etching barrier layer and the first insulation layer; forming a second conductive layer on the etching barrier layer, wherein a first portion and a second portion of the second conductive layer are respectively electrically connected to the pattern via the first via hole and the second via hole, and one of them is electrically connected to the first conductive layer via a fifth via hole.
    Type: Grant
    Filed: June 22, 2017
    Date of Patent: July 17, 2018
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Xingfeng Ren, Senlin Wang
  • Publication number: 20170293189
    Abstract: An anti-electrostatic device used in an array substrate of a liquid crystal display and a method for manufacturing the same, and a substrate are disclosed. The method includes steps of: forming a first insulation layer on a first conductive layer; forming a pattern on the first insulation layer; forming an etching barrier layer on the pattern; forming a first via hole and a second via hole extending through the etching barrier layer, and forming a fifth via hole extending through the etching barrier layer and the first insulation layer; forming a second conductive layer on the etching barrier layer, wherein a first portion and a second portion of the second conductive layer are respectively electrically connected to the pattern via the first via hole and the second via hole, and one of them is electrically connected to the first conductive layer via a fifth via hole.
    Type: Application
    Filed: June 22, 2017
    Publication date: October 12, 2017
    Inventors: Xingfeng Ren, Senlin Wang