Abstract: A method of optimizing a bond out design includes steps of: (a) receiving as input an initial bond out design including at least one selected I/O pad and a top redistribution layer; (b) determining whether to include a lower redistribution layer in an optimized bond out design; (c) selecting a trace design to be included in the optimized bond out design for connecting the selected I/O pad to the top redistribution layer according to a bump function of the selected I/O pad; and (d) generating as output the optimized bond out design.

Abstract: A method of optimizing a bond out design includes steps of: (a) receiving as input an initial bond out design including at least one selected I/O pad and a top redistribution layer; (b) determining whether to include a lower redistribution layer in an optimized bond out design; (c) selecting a trace design to be included in the optimized bond out design for connecting the selected I/O pad to the top redistribution layer according to a bump function of the selected I/O pad; and (d) generating as output the optimized bond out design.

Abstract: A multi-level redistribution layer trace reduces current crowding in solder bumps of an integrated circuit package. A multi-level redistribution layer trace for an integrated circuit die includes a redistribution layer trace formed on the integrated circuit die in each of a plurality of electrically conductive layers and an I/O pad formed at a termination of the redistribution layer trace so that the I/O pad extends through each of the plurality of electrically conductive layers to form an electrical junction between the termination of the redistribution layer trace and the I/O pad in each of the plurality of electrically conductive layers. The redistribution layer trace may also be slotted to divide current flow horizontally at the electrical junction between the termination of the redistribution layer trace and the I/O pad in each of the plurality of electrically conductive layers.

Abstract: A multi-level redistribution layer trace reduces current crowding in solder bumps of an integrated circuit package. A multi-level redistribution layer trace for an integrated circuit die includes a redistribution layer trace formed on the integrated circuit die in each of a plurality of electrically conductive layers and an I/O pad formed at a termination of the redistribution layer trace so that the I/O pad extends through each of the plurality of electrically conductive layers to form an electrical junction between the termination of the redistribution layer trace and the I/O pad in each of the plurality of electrically conductive layers. The redistribution layer trace may also be slotted to divide current flow horizontally at the electrical junction between the termination of the redistribution layer trace and the I/O pad in each of the plurality of electrically conductive layers.

Abstract: A multi-level redistribution layer trace reduces current crowding in solder bumps of an integrated circuit package. A multi-level redistribution layer trace for an integrated circuit die includes a redistribution layer trace formed on the integrated circuit die in each of a plurality of electrically conductive layers and an I/O pad formed at a termination of the redistribution layer trace so that the I/O pad extends through each of the plurality of electrically conductive layers to form an electrical junction between the termination of the redistribution layer trace and the I/O pad in each of the plurality of electrically conductive layers. The redistribution layer trace may also be slotted to divide current flow horizontally at the electrical junction between the termination of the redistribution layer trace and the I/O pad in each of the plurality of electrically conductive layers.

Abstract: A test package for electromigration testing includes a die having a plurality of I/O pads formed on a metal layer, a plurality of traces formed on the die electrically connecting adjacent pairs of the I/O pads, a plurality of bumped interconnects formed on the I/O pads, and a substrate having a plurality of bump-to-bump interconnects formed on a top surface of the substrate adjacent to the die wherein the plurality of bump-to-bump interconnects is electrically coupled to the plurality of bumped interconnects so that the plurality of bumped interconnects is connected in series.

Abstract: A test package for electromigration testing includes a die having a plurality of I/O pads formed on a metal layer, a plurality of traces formed on the die electrically connecting adjacent pairs of the I/O pads, a plurality of bumped interconnects formed on the I/O pads, and a substrate having a plurality of bump-to-bump interconnects formed on a top surface of the substrate adjacent to the die wherein the plurality of bump-to-bump interconnects is electrically coupled to the plurality of bumped interconnects so that the plurality of bumped interconnects is connected in series.

Abstract: A method for measuring electromigration includes the steps of measuring a corresponding voltage increase across an interconnect as a function of time for a plurality of nonzero heating rates and calculating an interconnect integrity from the voltage increase.

Abstract: A method for wafer bumping includes the steps of spreading a layer of an electrically conductive paste on a surface having a plurality of electrical contacts and exposing a beam-paste interaction volume to a beam of energy to bond a portion of the layer of the electrically conductive paste to at least one of the plurality of electrical contacts for forming a wafer bump.