Patents by Inventor Senrin Fu

Senrin Fu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7780783
    Abstract: The invention provides an apparatus for producing a single crystal, and a method for producing a silicon single crystal using the same. An apparatus for producing a single crystal includes a heating device which heats polycrystalline silicon raw material held in a crucible to form silicon melt, and a pulling up device which grows a silicon single crystal while pulling it up from the silicon melt accompanied with rotation. By providing the apparatus with a magnetic field generation unit which applies to the silicon melt a cusp magnetic field a shape of neutral plane of which is symmetric around the rotation axis of the silicon single crystal and is curved in the upward direction, various conditions for producing a silicon single crystal having a defect free region is relaxed, and a silicon single crystal having a defect free region is produced at high efficiency.
    Type: Grant
    Filed: October 9, 2007
    Date of Patent: August 24, 2010
    Assignee: Sumco Corporation
    Inventors: Norihito Fukatsu, Kazuyuki Egashira, Senrin Fu
  • Publication number: 20080060572
    Abstract: The present invention relates to a magnetic field applied pulling method for pulling a silicon single crystal. A silicon melt is stored in a quartz crucible provided in a chamber. A horizontal magnetic field generated by a pair of exciting coils disposed so as to interpose the chamber is applied to the silicon melt. A seed crystal provided to the lower end of a wire cable is immersed in the silicon melt, and a silicon single crystal ingot is grown beneath the seed crystal elevated by pulling the wire cable while rotating the wire cable. The exciting coils are placed outside the chamber such that the centers of the exciting coils in a vertical direction are positioned upper than the surface of the silicon melt. A distance D of the vertical center of each exciting coil from the surface level of the silicon melt satisfies 0?D?10L where L denotes the depth of the silicon melt when the pulling of the silicon single crystal ingot is started.
    Type: Application
    Filed: August 24, 2005
    Publication date: March 13, 2008
    Inventors: Senrin Fu, Naoki Ono
  • Publication number: 20080038179
    Abstract: The invention provides an apparatus for producing a single crystal, and a method for producing a silicon single crystal using the same. An apparatus for producing a single crystal includes a heating device which heats polycrystalline silicon raw material held in a crucible to form silicon melt, and a pulling up device which grows a silicon single crystal while pulling it up from the silicon melt accompanied with rotation. By providing the apparatus with a magnetic field generation unit which applies to the silicon melt a cusp magnetic field a shape of neutral plane of which is symmetric around the rotation axis of the silicon single crystal and is curved in the upward direction, various conditions for producing a silicon single crystal having a defect free region is relaxed, and a silicon single crystal having a defect free region is produced at high efficiency.
    Type: Application
    Filed: October 9, 2007
    Publication date: February 14, 2008
    Applicant: SUMCO CORPORATION
    Inventors: Norihito Fukatsu, Kazuyuki Egashira, Senrin Fu
  • Patent number: 7300518
    Abstract: The invention provides an apparatus for producing a single crystal, and a method for producing a silicon single crystal using the same. An apparatus for producing a single crystal includes a heating device which heats polycrystalline silicon raw material held in a crucible to form silicon melt, and a pulling up device which grows a silicon single crystal while pulling it up from the silicon melt accompanied with rotation. By providing the apparatus with a magnetic field generation unit which applies to the silicon melt a cusp magnetic field a shape of neutral plane of which is symmetric around the rotation axis of the silicon single crystal and is curved in the upward direction, various conditions for producing a silicon single crystal having a defect free region is relaxed, and a silicon single crystal having a defect free region is produced at high efficiency.
    Type: Grant
    Filed: May 18, 2005
    Date of Patent: November 27, 2007
    Assignee: Sumco Corporation
    Inventors: Norihito Fukatsu, Kazuyuki Egashira, Senrin Fu
  • Publication number: 20060107889
    Abstract: The invention provides an apparatus for producing a single crystal, and a method for producing a silicon single crystal using the same. An apparatus for producing a single crystal includes a heating device which heats polycrystalline silicon raw material held in a crucible to form silicon melt, and a pulling up device which grows a silicon single crystal while pulling it up from the silicon melt accompanied with rotation. By providing the apparatus with a magnetic field generation unit which applies to the silicon melt a cusp magnetic field a shape of neutral plane of which is symmetric around the rotation axis of the silicon single crystal and is curved in the upward direction, various conditions for producing a silicon single crystal having a defect free region is relaxed, and a silicon single crystal having a defect free region is produced at high efficiency.
    Type: Application
    Filed: May 18, 2005
    Publication date: May 25, 2006
    Applicant: SUMCO CORPORATION
    Inventors: Norihito Fukatsu, Kazuyuki Egashira, Senrin Fu