Abstract: The present invention provides an imprint apparatus which forms a pattern of an imprint material onto a substrate by using a mold, the apparatus including a control unit configured to provide a user interface for displaying a first map indicating a supply position of the imprint material to be supplied onto the substrate, an adjustment window for adjusting a value of an apparatus parameter which is set in the imprint apparatus and used to change a supply position of the imprint material, and a second map indicating a supply position of the imprint material after adjustment of the value of the apparatus parameter.

Abstract: An imprinting method is capable of strictly interpolating application distribution of uncured resin material being applied to a substrate for each shot and interpolating application distribution of uncured resin material for each shot while reducing workload in a generation step. The imprinting apparatus includes a mold; a mold driving unit; a dispenser that applies uncured resin material to the substrate; a light source that cures uncured resin material as a pattern; a dispenser control unit that controls the dispenser by generating the application distribution of the uncured resin material to the resin pattern for each of a plurality of shots; and a main control unit that interpolates application distribution of uncured resin material, which has been generated by the dispenser control unit, using shot layout information of relative position among positions of a plurality of shots, the dispenser, and the light source with respect to the substrate, as variables.

Abstract: Provided is an imprinting method that is capable of strictly performing the interpolation of the application distribution of an uncured resin material to be applied to a substrate for each shot as well as efficiently performing the reinterpolation of the application distribution of the uncured resin material for each shot while reducing the workload in a generation step.

Abstract: An object of the present disclosure is to provide an imprinting apparatus capable of detecting a surface state of a substrate with accuracy even when the surface state of the substrate changes. An imprinting apparatus of the present disclosure is one for contacting an imprint material on a substrate with a mold, and forming a pattern of the imprint material on the substrate. The imprinting apparatus includes a detector configured to irradiate the substrate with light, optically detect reflected light from the substrate to detect a state of the imprint material on the substrate, and switch a detection condition during an imprinting process.

Abstract: The present invention provides an imprint apparatus that performs imprint processing of forming a pattern of an imprint material on a substrate using a mold, the apparatus including an image sensing unit configured to sense at least one of the mold and the substrate and obtain an image, and a determination unit configured to determine normality/abnormality of the imprint processing, wherein the imprint processing includes a first step of supplying the imprint material onto the substrate, and a second step of bringing the mold and the imprint material on the substrate into contact with each other, and the determination unit changes a reference of determination of the normality/abnormality of the imprint processing for each step of the imprint processing and determines the normality/abnormality of the imprint processing based on the image sensed by the image sensing unit.

Abstract: The present invention provides an imprint apparatus which forms a relief pattern in an imprint material on a substrate using a mold, the apparatus including a curing unit configured to cure the imprint material, a moving unit configured to relatively move the mold and the substrate, a detection unit configured to detect a pattern of light reflected by the mold and light reflected by the substrate, and a processing unit configured to obtain information on a separation state of the mold and the cured imprint material on the substrate based on the pattern detected by the detection unit while separating the mold from the imprint material by widening, using the moving unit, an interval between the mold and the substrate.

Abstract: Provided is an imprinting method that is capable of strictly performing the interpolation of the application distribution of an uncured resin material to be applied to a substrate for each shot as well as efficiently performing the reinterpolation of the application distribution of the uncured resin material for each shot while reducing the workload in a generation step.

Abstract: An exposure apparatus for exposing a substrate to radiation based on parameters. The apparatus includes a display, an input device, and a processor configured to execute a program for editing the parameters. The processor is configured to cause, in accordance with the program, the display to display a first group of a first classification name for classifying the parameters, a plurality of names of works to be executed by the apparatus, a second group of a second classification name for classifying the parameters, a plurality of names of functions, each of which is contained in at least one of the works, and contents of parameters corresponding to a combination of one of the plurality of names of works of the first classification name and one of the plurality of names of functions of the second classification name, respectively selected by the input device.

Abstract: An exposure apparatus configured to measure a position of at least one of a mark formed on an original plate and a mark formed on a substrate and to expose the substrate to radiant energy based on the measured position includes a stage configured to hold one of the original plate and the substrate and to be moved, a scope configured to capture an image of the mark formed on one of the original plate and the substrate held by the stage, an input unit configured to be operated to instruct a position of the stage, a display, and a controller configured to combine images respectively captured by the scope at a plurality of positions of the stage instructed by the input unit into a combined image and to cause the display to display the combined image.

Abstract: An exposure apparatus for exposing a substrate to radiation based on parameters includes a display, an input device, and a processor configured to execute a program for editing the parameters. The processor is configured to cause, in accordance with the program, the display to display a first group of a first classification name for classifying the parameters, a second group of a second classification name for classifying the parameters, and contents of parameters corresponding to a combination of the first classification name and the second classification name selected by the input device.