Patents by Inventor Senzo Shimizu

Senzo Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4994313
    Abstract: A parison, as a precursor of a container, composed at least of a thermoplastic resin (resin A) and another thermoplastic resin having excellent gas-barrier property (resin B) and containing a multilayered resin layer at least in an intermediate layer between an outermost layer and an innermost layer each composed of resin A at parts other than the open end part of the mouth portion of the parison, or wholly in the parison, said multilayered resin layer being formed by using an injection-molding machine equipped with a static mixing-stirring device provided in a nozzle portion of an injection cylinder, or in a mold, or in a resin flow passage between the nozzle portion and a mold, and injecting the resins A and B through the static mixing-stirring device so that flows of the resins A and B are divided in a plurality of thin layers parallel to the flowing direction; and a process for production thereof.
    Type: Grant
    Filed: August 15, 1989
    Date of Patent: February 19, 1991
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Senzo Shimizu, Yoshiaki Momose, Yozo Yoshida, Takao Ohta
  • Patent number: 4868026
    Abstract: A biaxially oriented blow-molded container composed of a thermoplastic gas-barrier resin (resin B) and a thermoplastic resin (resin A) other than resin B and having excellent gas-barrier property and delamination strength. The container comprises a substantially non-oriented mouth portion composed of resin A, a portion composed of two layers of resin A and one layer of resin B which are laminated with the resin A layer and the resin B layer occurring alternately and a portion composed of three layers of resin A and two layers of resin B which are laminated with the resin A layer and the resin B layer occurring alternately. A portion having a small radius of curvature where delamination tends to occur is formed in a three-layer structure. A process for producing the container is also provided.
    Type: Grant
    Filed: August 9, 1988
    Date of Patent: September 19, 1989
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Senzo Shimizu, Yoshiaki Momose, Yozo Yoshida
  • Patent number: 4816308
    Abstract: A biaxially oriented multilayered container consisting of a body portion and a mouth portion. The body portion comprises one or more layers of a thermoplastic gas-barrier resin B and layers of a thermoplastic resin A other than the resin B which are larger in number than the resin B layers by 1, the resin A and B layers being laminated alternately, and at least the open end part of said mouth portion is composed of a single layer of the resin A. As a characteristic feature, a coarsely mixed resin layer of resins A and B in which the proportion of resin particles having a long diameter of not more than 10 .mu.m is not more than 10% exists in at least one of the boundaries between the resin A and B layers.
    Type: Grant
    Filed: December 21, 1987
    Date of Patent: March 28, 1989
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Senzo Shimizu, Yoshiaki Momose, Yozo Yoshida
  • Patent number: 4728549
    Abstract: A multilayered container comprising a wall portion consisting of thermoplastic gas barrier resin (resin B) layers and thermoplastic resin (resin A) layers, with the terminal portion of the mouth opening being of a thermoplastic resin (resin A), said wall portion being a multilayered structure formed by alternately laminating the resin A layers and the resin B layers in such a manner that there are at least two resin B layers, with the proviso that there is one more of the resin A layer than the number of the resin B layers, said structure having been biaxially oriented.
    Type: Grant
    Filed: October 30, 1985
    Date of Patent: March 1, 1988
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Senzo Shimizu, Mitsuyasu Nagano, Tsutomu Ishizeki, Yoshiaki Momose
  • Patent number: 4702859
    Abstract: An electrically conductive polyamide resin composition comprising(A) 100 parts by weight of a polyamide resin derived from xylylenediamine as a main diamine component and an alpha, omega-linear aliphatic dicarboxylic acid as a main dicarboxylic acid component,(B) 5 to 100 parts by weight of nylon 66,(C) 30 to 300 parts by weight of glass fibers,(D) 5 to 40 parts by weight of furnace black, and(E) 5 to 40 parts by weight of graphite.
    Type: Grant
    Filed: December 29, 1986
    Date of Patent: October 27, 1987
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Senzo Shimizu, Isao Nomura, Kenichi Narita
  • Patent number: 4560788
    Abstract: A process for producing an oligoester which comprises:(a) the step of reacting isophthalic acid and propylene oxide in a reaction medium in the presence of a specific catalyst comprising a tetraalkyl ammonium compound to prepare an oligoester, and(b) the step of removing volatile components from the resulting oligoester by heating the oligoester at a temperature of 180.degree.-280.degree. C. is disclosed. The oligoester is used as an intermediate for preparing unsaturated polyesters.
    Type: Grant
    Filed: August 8, 1983
    Date of Patent: December 24, 1985
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Akira Miyamoto, Senzo Shimizu, Masayoshi Okamura, Hiroka Tanisake, Yasumitsu Higuchi, Toshio Hidaka, Koji Yamamoto, Toshiyuki Abe
  • Patent number: 4500668
    Abstract: A resin composition for molding materials, said composition comprising(I) 100 parts by weight of a resin composition composed of(A) 5 to 95 parts by weight of a polyamide resin composed of 1 to 99% by weight of a polyamide resin obtained from xylylenediamine and an alpha, omega-linear aliphatic dibasic acid and 99 to 1% by weight of nylon 66, and(B) 95 to 5 parts by weight of a styrene-acrylonitrile copolymer containing 5 to 50 mole % of acrylonitrile as a copolymer component, and(II) 5 to 150 parts by weight of an inorganic filler.
    Type: Grant
    Filed: September 21, 1983
    Date of Patent: February 19, 1985
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Senzo Shimizu, Isao Nomura, Kazuo Yamamiya, Tsuneaki Masuda
  • Patent number: 4438257
    Abstract: A process for preparing a polyamide is provided. The polyamide is prepared by causing a dicarboxylic acid and a diamine to polycondensate directly under an atmosphere of an inert gas at atmospheric pressure. The polycondensation reaction is mainly carried out in two diamine component-adding steps, one step comprising adding part of the diamine to the molten dicarboxylic acid until the molar ratio of the diamine to the dicarboxylic acid is brought to within the range of from 0.900 to 0.990 while raising continuously the temperature of the reaction mixture to a temperature not exceeding about 5.degree. C. above the melting point of the object polyamide and the other step comprising adding the remainder of the diamine to the reaction mixture maintained at a temperature higher than about 10.degree. C., but not exceeding about 35.degree. C. above the melting point of the object polyamide until the overall molar ratio of the diamine to the dicarboxylic acid is brought to within the range of from 0.995 to 1.005.
    Type: Grant
    Filed: December 20, 1982
    Date of Patent: March 20, 1984
    Assignee: Mitsubishi Gas Chemical Co., Ltd.
    Inventors: Akira Miyamoto, Senzo Shimizu, Masahiro Harada, Tamotu Ajiro, Hideki Hara
  • Patent number: 4433136
    Abstract: A process for preparing a polyamide is provided. The polyamide is prepared by effecting direct polycondensation reaction of a dicarboxylic acid component containing at least 80 mole % of adipic acid and a diamine component containing at least 70 mole % of m-xylylene diamine under an atmosphere of an inert gas and at atmospheric pressure at a controlled temperature which is higher than the melting point of the dicarboxylic acid component and which can maintain the reaction mixture in a uniformly-fluidized state throughout the reaction.
    Type: Grant
    Filed: June 1, 1982
    Date of Patent: February 21, 1984
    Assignee: Mitsubishi Gas Chemical Company Inc.
    Inventors: Akira Miyamoto, Senzo Shimizu, Kazuo Yamamiya, Masahiro Harada
  • Patent number: 4395534
    Abstract: A process for producing an aromatic polyester carbonate resin in which the molar ratio of the dihydric phenolic compound residue to aromatic dicarboxylic acid residue to carbonate bond is in the range of 2:0.5:1.5-2:1.4:0.6 and these constituent components form an alternating configuration of high regularity, said process comprising a first step wherein in producing a hydroxyl-terminated aromatic oligocarbonate by reacting a dihydric phenolic compound with a halogenated carbonyl compound in a reaction medium consisting of water and a water-immiscible solvent in the presence of a basic inorganic compound, the reaction is carried out by using the basic inorganic compound in an amount of 0.6-1.6 moles per mole of the dihydric phenolic compound and the halogenated carbonyl compound in an amount of 0.3-0.
    Type: Grant
    Filed: November 17, 1981
    Date of Patent: July 26, 1983
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Senzo Shimizu, Isao Nomura, Masahiro Harada, Motohachi Usui, Susumu Taniyama, Shigeo Yanada
  • Patent number: 4362858
    Abstract: A process for producing an aromatic polyester copolymer wherein the alternating configuration of the components making up the copolymer is highly regular, said process comprising a first step of reacting a dihydric phenolic compound with an aromatic dicarboxylic acid dichloride A in a reaction medium consisting of water and a water-immiscible solvent in the presence of a basic inorganic compound to give a phenolic hydroxyl-terminated aromatic oligoester containing predominantly an oligomer having a degree of polymerization of 1-2, and a second step of reacting the aromatic dihydroxy oligoester obtained in the first step with an aromatic dicarboxylic acid dichloride B in the presence of a basic inorganic compound in an amount at least sufficient to neutralize the free phenolic hydroxyl groups remaining in the reaction product mixture obtained in the first step.
    Type: Grant
    Filed: December 3, 1981
    Date of Patent: December 7, 1982
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Senzo Shimizu, Isao Nomura, Motohachi Usui, Mashahiro Harada
  • Patent number: 4306056
    Abstract: Processes for producing an oligoester and producing unsaturated polyester resin by use of the oligoester using unsaturated dibasic acid or its anhydride and isophthalic acid as dibasic acid components, and propylene oxide as a polyol component, characterized by (a) the step of reacting isophthalic acid with propylene oxide in the presence of an amine compound catalyst to form an oligoester, (b) the step of removing volatile components from the oligoester by heating it at a temperature range of 180.degree.-300.degree. C., (c) the step of treating the resulting oligoester with silica-alumina compound having adsorbing property, and (d) the step of reacting the oligoester so treated with the unsaturated dibasic acid or its anhydride.
    Type: Grant
    Filed: May 16, 1980
    Date of Patent: December 15, 1981
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Akira Miyamoto, Senzo Shimizu, Fumitaka Satoh, Yasumitsu Higuchi, Toshiyuki Abe, Kohji Yamamoto
  • Patent number: 4212951
    Abstract: A process for the isolation of particulate polyarylene esters having good thermal stability and hydrolytic stability, which comprises adding to a solution of a polyarylene ester in an organic solvent a poor solvent for the polyarylene ester at least in an amount such that said solution reaches a cloud point, followed by subjecting said mixed solution to an aging treatment whereby the polyarylene ester precipitates as solids, characterized in that said poor solvent is a mixed poor solvent consisting of 5-95% by weight of an aliphatic alcohol with 1-5 carbons and the other poor solvent for the polyarylene ester, the amount of said mixed poor solvent added being within the range of 100-200% by weight of the amount such that said solution reaches the cloud point and not exceeding the amount of said solution.
    Type: Grant
    Filed: November 28, 1978
    Date of Patent: July 15, 1980
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Senzo Shimizu, Isao Nomura, Motohachi Usui, Masahiro Harada
  • Patent number: 4202965
    Abstract: A method for isolating a polyarylene ester from a solution of the polyarylene ester in tetrahydrofuran and/or dioxane which is prepared by polycondensing a dihydric phenol compound and an aromatic dicarboxylic acid or its derivative, which comprises adding water to the solvent solution to form a water-containing solution, the weight ratio of water to the solvent solution being from 0.01 to 0.5, subjecting the resulting water-containing solution to an aging treatment, then precipitating substantially all of the polyarylene ester as a particulate solid from the water-containing solution, and separating the precipitated polyarylene ester from the water-containing solution.
    Type: Grant
    Filed: September 22, 1978
    Date of Patent: May 13, 1980
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Senzo Shimizu, Isao Nomura, Masahiro Harada
  • Patent number: 4058497
    Abstract: This invention relates to a one package system cold-setting type coating composition which comprises an acrylic copolymer having carboxyl groups in its molecule or an alkyd resin, an aluminum alkoxide complex and a keto-enol tautomeric compound, characterized by adding a specific nitrogen compound to the composition for preventing discoloration of a coated substance.
    Type: Grant
    Filed: September 2, 1975
    Date of Patent: November 15, 1977
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Keiun Ko, Naomitsu Takashina, Senzo Shimizu, Masuya Ikegami, Yoshinori Iwamoto