Patents by Inventor Seo Jung PARK

Seo Jung PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • NOVEL NAPHTHYRIDINONE DERIVATIVE HAVING INHIBITORY ACTIVITY AGAINST ECTONUCLEOTIDE PYROPHOSPHATASE-PHOSPHODIESTERASE AND USE THEREOF
    Publication number: 20240140944
    Abstract: The present invention relates to a novel naphthyridinone derivative compound, a pharmaceutically acceptable salt thereof, a hydrate thereof, or a stereoisomer thereof, which are each relevant to a compound for inhibiting ENPP1, a composition for inhibiting ENPP1, and a method for inhibiting ENPP1.
    Type: Application
    Filed: December 29, 2021
    Publication date: May 2, 2024
    Applicant: TXINNO BIOSCIENCE INC.
    Inventors: Seo Jung Han, Chan Sun Park, Sung Joon Kim, Jae Eun Cheong, Jung Hwan Choi, Ali Imran, Sun Woo Lee, Yong Yea Park, Ah Ran Yu, Sun Young Park
  • Apparatus for treating substrate
    Patent number: 11699605
    Abstract: An apparatus for treating a substrate includes a chamber having a treating space formed therein, a substrate support unit that supports the substrate in the treating space, a plate that is located to face the substrate support unit in the treating space and that has a plurality of holes formed therein, a gas supply unit that supplies gas into the treating space through the holes, and a gas exhaust unit that exhausts the gas in the treating space through the holes.
    Type: Grant
    Filed: May 11, 2020
    Date of Patent: July 11, 2023
    Assignee: SEMES CO., LTD.
    Inventors: Kyungsik Shin, Jung-Hyun Lee, Jinki Shin, Seo Jung Park
  • Apparatus for treating substrate and method for treating apparatus
    Patent number: 11295952
    Abstract: An apparatus for treating a substrate is disclosed. The apparatus for treating the substrate includes a housing having a treatment space inside the housing, a plate to support the substrate inside the housing, a heating member provided inside the plate to heat the substrate and including a plurality of heating zones, a temperature measuring member to measure a temperature of the substrate with respect to each of the plurality of heating zones of the heating member, and a control unit to control a temperature for the heating member in a dynamic section of a temperature change graph measured in the temperature measuring member. The control unit performs temperature control with respect to each of the plurality of heating zones of the heating member to uniformize the thickness of the thin film on the substrate.
    Type: Grant
    Filed: June 9, 2020
    Date of Patent: April 5, 2022
    Assignee: Semes Co., Ltd.
    Inventors: Tae Sub Lee, Gyu Hyun Kim, Sung Yong Lee, Donghyuk Seo, Seo Jung Park
  • APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING APPARATUS
    Publication number: 20200388496
    Abstract: An apparatus for treating a substrate is disclosed. The apparatus for treating the substrate includes a housing having a treatment space inside the housing, a plate to support the substrate inside the housing, a heating member provided inside the plate to heat the substrate and including a plurality of heating zones, a temperature measuring member to measure a temperature of the substrate with respect to each of the plurality of heating zones of the heating member, and a control unit to control a temperature for the heating member in a dynamic section of a temperature change graph measured in the temperature measuring member. The control unit performs temperature control with respect to each of the plurality of heating zones of the heating member to uniformize the thickness of the thin film on the substrate.
    Type: Application
    Filed: June 9, 2020
    Publication date: December 10, 2020
    Applicant: SEMES CO., LTD.
    Inventors: Tae Sub LEE, Gyu Hyun KIM, Sung Yong LEE, Donghyuk SEO, Seo Jung PARK
  • APPARATUS FOR TREATING SUBSTRATE
    Publication number: 20200357663
    Abstract: An apparatus for treating a substrate includes a chamber having a treating space formed therein, a substrate support unit that supports the substrate in the treating space, a plate that is located to face the substrate support unit in the treating space and that has a plurality of holes formed therein, a gas supply unit that supplies gas into the treating space through the holes, and a gas exhaust unit that exhausts the gas in the treating space through the holes.
    Type: Application
    Filed: May 11, 2020
    Publication date: November 12, 2020
    Applicant: SEMES CO., LTD.
    Inventors: Kyungsik SHIN, Jung-Hyun LEE, Jinki SHIN, Seo Jung PARK