Patents by Inventor Seo Youngsoo

Seo Youngsoo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition for film formation, method of film formation, and silica-based film
    Publication number: 20020086167
    Abstract: A composition for film formation which is capable of giving a silica-based coating film having an exceeding low dielectric constant and improved mechanical strength and useful as an interlayer insulating film in semiconductor devices and the like, a process for producing the composition, and a silica-based film obtained from the composition. The composition comprises (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing one or more silane compounds, and (B) an organic solvent.
    Type: Application
    Filed: February 26, 2001
    Publication date: July 4, 2002
    Applicant: JSR CORPORATION
    Inventors: Eiji Hayashi, Kouichi Hasegawa, Seo Youngsoo
  • Composition for film formation, method of film formation, and silica-based film
    Patent number: 6413647
    Abstract: A composition for film formation which is capable of giving a silica-based coating film having an exceeding low dielectric constant and improved mechanical strength and useful as an interlayer insulating film in semiconductor devices and the like, a process for producing the composition, and a silica-based film obtained from the composition. The composition comprises (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing one or more silane compounds, and (B) an organic solvent.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: July 2, 2002
    Assignee: JSR Corporation
    Inventors: Eiji Hayashi, Kouichi Hasegawa, Seo Youngsoo
  • Composition for film formation, method of film formation, and silica-based film
    Publication number: 20020020327
    Abstract: A composition for film formation which comprises:
    Type: Application
    Filed: April 9, 2001
    Publication date: February 21, 2002
    Applicant: JSR CORPORATION
    Inventors: Eiji Hayashi, Kouichi Hasegawa, Seo Youngsoo