Patents by Inventor Seog-Jeong Song

Seog-Jeong Song has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for manufacturing array board for display device
    Patent number: 8216762
    Abstract: An array for a display device is formed by adhering a positive dry film resist, which has a positive photoresist resin layer over a supporting film, to a substrate such that the photoresist resin layer adheres on a surface of the substrate. The supporting film is then released from the photoresist resin layer adhered to the surface of the substrate, the layer is exposed to light; and the positive type photoresist layer is developed to remove exposed regions.
    Type: Grant
    Filed: February 1, 2006
    Date of Patent: July 10, 2012
    Assignee: Kolon Industries, Inc.
    Inventors: Byoung-Kee Kim, Se-Hyung Park, Dal-Seok Byun, Seog-Jeong Song, Jong-Min Park
  • Composition for positive type photoresist and positive type photoresist film manufactured thereby
    Patent number: 8197934
    Abstract: Disclosed are a composition for positive type photoresist and a positive type photoresist film manufactured thereby. The composition comprises an alkali soluble resin, a photosensitive compound, a thermo-curable cross linking agent, a sensitivity enhancer and a solvent. The photoresist film has a supporting film and a photoresist layer formed on the supporting film, wherein the photoresist layer comprises the alkali soluble resin, the photosensitive compound, the thermo-curable cross linking agent and the sensitivity enhancer.
    Type: Grant
    Filed: April 6, 2007
    Date of Patent: June 12, 2012
    Assignee: Kolon Industries, Inc.
    Inventors: Byoung-Kee Kim, Se-Hyung Park, Bryong-Il Lee, Jong-Min Park, Seog-Jeong Song
  • Composition For Positive Type Photoresist and Positive Type Photoresist Film Manufactured Thereby
    Publication number: 20090274900
    Abstract: Disclosed are a composition for positive type photoresist and a positive type photoresist film manufactured thereby. The composition comprises an alkali soluble resin, a photosensitive compound, a thermo-curable cross linking agent, a sensitivity enhancer and a solvent. The photoresist film has a supporting film and a photoresist layer formed on the supporting film, wherein the photoresist layer comprises the alkali soluble resin, the photosensitive compound, the thermo-curable cross linking agent and the sensitivity enhancer.
    Type: Application
    Filed: April 6, 2007
    Publication date: November 5, 2009
    Applicant: Kolon Industries, Inc.
    Inventors: Byoung-Kee Kim, Se-Hyung Park, Bryong-Il Lee, Jong-Min Park, Seog-Jeong Song
  • Positive Dry Film Photoresist and Composition For Preparing the Same
    Publication number: 20080166659
    Abstract: A positive type photoresist resin film contains a support film and a positive photoresist resin layer laminated over the support film. The photoresist layer may be formed from a composition containing a resin, a photosensitive compound, and a first solvent having a boiling point sufficiently high such that a second solvent can be removed from the composition by heating while the first solvent is substantially retained in the composition.
    Type: Application
    Filed: February 1, 2006
    Publication date: July 10, 2008
    Inventors: Byoung-Kee Kim, Se-Hyung Park, Dal-Seok Byun, Seog-Jeong Song, Jong-Min Park
  • Method For Manufacturing Array Board For Display Device
    Publication number: 20080135842
    Abstract: An array for a display device is formed by adhering a positive dry film resist, which has a positive photoresist resin layer over a supporting film, to a substrate such that the photoresist resin layer adheres on a surface of the substrate. The supporting film is then released from the photoresist resin layer adhered to the surface of the substrate, the layer is exposed to light; and the positive type photoresist layer is developed to remove exposed regions.
    Type: Application
    Filed: February 1, 2006
    Publication date: June 12, 2008
    Inventors: Byoung-Kee Kim, Se-Hyung Park, Dal-Seok Byun, Seog-Jeong Song, Jong-Min Park