Patents by Inventor Seohee PARK

Seohee PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240081047
    Abstract: A semiconductor device includes a conductive pattern and a spacer structure disposed on a side surface of the conductive pattern. The spacer structure includes an inner spacer in contact with the side surface of the conductive pattern, an outer spacer spaced apart from the side surface of the conductive pattern, and an air gap disposed between the inner spacer and the outer spacer. The inner spacer includes an inner oxidized region exposed by the air gap. A concentration of oxygen in the inner oxidized region has a gradient in which the oxygen concentration decreases in a direction away from the air gap.
    Type: Application
    Filed: July 12, 2023
    Publication date: March 7, 2024
    Inventors: Teawon Kim, Seohee Park, Yongsuk Tak, Minkyung Kang, Joonnyung Heo
  • Patent number: 11725145
    Abstract: A diacetylene-based lyotropic liquid crystal mixture according to an embodiment includes by mixing diacetylene-based compounds containing iodide and triiodide Chemical Formula 1 and Chemical Formula 2. The lyotropic liquid crystal mixture may be prepared by synthesizing an [X]—C—Rm-[D]-Rn compound, synthesizing an [A+X?]—C—Rm-D-Rn compound, and synthesizing an [A+B?]—C—Rm-D-Rn compound. A thin polarizing film may be prepared through simple coating of a lyotropic liquid crystal mixture prepared by mixing diacetylene-based compounds containing iodide and triiodide.
    Type: Grant
    Filed: April 17, 2019
    Date of Patent: August 15, 2023
    Assignee: INDUSTRIAL COOPERATION FOUNDATION CHONBUK NATIONAL UNIVERSITY
    Inventors: Kwang Un Jeong, Yu Jin Choi, Seohee Park
  • Publication number: 20230209825
    Abstract: Provided is a method of manufacturing a semiconductor device, the method including: forming a mold structure comprising insulation layers and sacrificial layers alternately and repeatedly stacked on a substrate; forming a channel hole extending through the mold structure; forming a blocking layer in the channel hole; forming a charge storage layer on the blocking layer; forming a tunnel insulation layer including a doping element on the charge storage layer; performing heat treatment to diffuse the doping element from the tunnel insulation layer to the charge storage layer; and forming a channel layer on the tunnel insulation layer.
    Type: Application
    Filed: October 17, 2022
    Publication date: June 29, 2023
    Inventors: Minkyung Kang, Suhyeong Lee, Seohee Park, Gukhyon Yon, Yongsuk Tak
  • Publication number: 20230134099
    Abstract: A semiconductor device includes: a substrate; a conductive line extending on the substrate in a first horizontal direction; an isolation insulating layer extending on the substrate and the conductive line in a second horizontal direction intersecting with the first horizontal direction, and defining a channel trench extending through the isolation insulating layer from an upper surface of the isolation insulating layer to a lower surface of the isolation insulating layer; a crystalline oxide semiconductor layer extending along at least a portion of an inner side surface of the channel trench and at least a portion of a bottom surface of the channel trench and coming in contact with the conductive line; and a gate electrode extending on the crystalline oxide semiconductor layer inside the channel trench in the second horizontal direction.
    Type: Application
    Filed: May 26, 2022
    Publication date: May 4, 2023
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Teawon KIM, Yurim KIM, Seohee PARK, Kong-Soo LEE, Yong Suk TAK
  • Publication number: 20230137072
    Abstract: A semiconductor device includes a channel layer disposed on a substrate and a gate structure formed on or under the channel layer. The channel layer includes a single-layer oxide semiconductor material, the channel layer includes indium (In), gallium (Ga), and oxygen (O), the channel layer includes a first region, a second region, and a third region, the third region contacting the gate structure, a second region between the first region and the third region, the first region is the closer to the substrate than the second region and the third region, each of the first region and the third region has a concentration of Ga higher than a concentration of In, and the second region has a concentration of In higher than a concentration of Ga.
    Type: Application
    Filed: June 24, 2022
    Publication date: May 4, 2023
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Teawon KIM, Yurim KIM, Seohee PARK, Kong-Soo LEE, Yong Suk TAK
  • Publication number: 20210395612
    Abstract: A diacetylene-based lyotropic liquid crystal mixture according to an embodiment includes by mixing diacetylene-based compounds containing iodide and triiodide Chemical Formula 1 and Chemical Formula 2. The lyotropic liquid crystal mixture may be prepared by synthesizing an [X]—C—Rm-[D]-Rn compound, synthesizing an [A+X?]—C—Rm-D-Rn compound, and synthesizing an [A+B?]—C—Rm-D-Rn compound. A thin polarizing film may be prepared through simple coating of a lyotropic liquid crystal mixture prepared by mixing diacetylene-based compounds containing iodide and triiodide.
    Type: Application
    Filed: April 17, 2019
    Publication date: December 23, 2021
    Inventors: Kwang Un JEONG, Yu Jin CHOI, Seohee PARK