Abstract: A method of a terminal may comprise: transmitting channel state prediction-related information to a base station; receiving a channel prediction request signal for a first time instance from the base station; receiving auxiliary reference signal(s) (RS(s)) and a first RS from the base station based on the channel state prediction-related information; and transmitting channel prediction information for the first time instance to the base station, wherein the channel state prediction-related information includes information indicating that channel state information prediction of the terminal is possible, and the channel prediction request signal includes configuration information of the auxiliary RS(s) and configuration information of the first RS.

Abstract: A method of a communication node may comprise: transmitting required network configurations for applying each of artificial neural network models to a network node; and transmitting a status report of the first model including a model identifier field and a model information field for each of the artificial neural network models to the network node to activate at least one artificial neural network model among the artificial neural network models, wherein each of the required network configurations includes a configuration identifier and network configuration information.

Abstract: A method of a terminal may comprise: receiving a channel state information (CSI) request message from a base station, the CSI request message including first indication information indicating one of quantization configuration information of a first artificial intelligence (AI) model configured in the terminal to encode and transmit CSI; quantizing generated CSI feedback information based on the first indication information; and transmitting a CSI report message including the quantized CSI feedback information to the base station.

Abstract: A method of a terminal may comprise: receiving, from a CU of a base station, configuration information of one or more candidate cells and configuration information for measurement; performing L1 measurement on the candidate cells based on the configuration information for measurement; acquiring uplink synchronization for the candidate cells by performing an uplink synchronization management procedure for the candidate cells based on the configuration information of the candidate cells; reporting a result of the L1 measurement to a DU of the base station; receiving, from the DU of the base station, information on a target cell, being the target cell to switch among the candidate cells, based on the result of the L1 measurement; and applying the uplink synchronization acquired through the uplink synchronization management procedure to the target cell.

Abstract: A method of monitoring and managing performance of an artificial neural network model for an air interface may comprise: receiving, by a network (NW) including a communication node performing a function of monitoring and managing performance of an artificial neural network model, a performance metric of the artificial neural network model from a user equipment (UE); and controlling, by the communication node, activation or deactivation of the artificial neural network model according to the performance metric, wherein the artificial neural network model is activated to improve a main performance metric of a mobile communication system including the communication node and the UE connected through an air interface.

Abstract: A method of a terminal may comprise: receiving a first message including state information of a base station from the base station; identifying preliminary inactive state information included in the first message when the state information of the base station indicates a preliminary inactive state; and performing a cell selection based on the preliminary inactive state information.

Abstract: A method of a terminal may comprise: receiving a reference signal from a base station; generating channel information based on the reference signal; generating wavelet-transformed channel information by applying wavelet transform to the channel information; generating compressed channel information by compressing the wavelet-transformed channel information; and transmitting the compressed channel information to the base station.

Abstract: A handover method of a first terminal in a wireless communication system may comprise: transmitting a first measurement report message to a first cell that is a primary cell (PCell); receiving, from the first cell, one or more first configuration messages for one or more target cells determined according to the first measurement report message; adding each of the one or more target cells as a candidate PCell based on the one or more first configuration messages; and performing data transmission and reception with at least one cell among the first cell and the one or more candidate PCells.

Abstract: Proposed are cerium oxide particles for chemical mechanical polishing and a slurry composition for chemical mechanical polishing comprising the same. The surfaces of the cerium oxide particles comprise Ce3+ and Ce4+. When the cerium oxide particles are used, they may exhibit a high oxide removal rate and high oxide selectivity in a low particle content range despite their fine particle size as a result of increasing the proportion of Ce3+ on the cerium oxide surface.

Abstract: A mask glue removing apparatus includes a first plate including a plurality of nozzles to be adjusted at independent dispensing angles of each other and a head in which the plurality of nozzles are installed and configured to move the head close to a position corresponding to a region of a mask in which glue is present, adjust the dispensing angles of the plurality of nozzles to face the region in which the glue is present, and dispense a chemical liquid, rinse, or air through the plurality of nozzles to remove the glue, and a second plate on which the mask is placed and configured to adjust a position of a main body according to a removal process for the glue.

Abstract: A semiconductor memory device includes: a tunnel insulating layer disposed between a conductive pattern and a channel layer; a data storage layer disposed between the conductive pattern and the tunnel insulating layer, the data storage layer including a silicon nitride layer; a first blocking insulating layer disposed between the conductive pattern and the data storage layer; a second blocking insulating layer disposed between the conductive pattern and the first blocking insulating layer; and a carbon containing layer disposed at at least one position among a position between the tunnel insulating layer and the data storage layer, a position between the first blocking insulating layer and the data storage layer, a position in the tunnel insulating layer, and a position between the first blocking insulating layer and the second blocking insulating layer.

Abstract: The present disclosure relates to a knee joint augment having an anatomical shape. More specifically, the present disclosure relates to a knee joint augment that is used for artificial joint replacement to replace lost bone, wherein the augment is used in artificial knee replacement surgery to be coupled to a knee implant. The augment includes a top surface configured to be brought into contact with a distal surface of a base plate that forms the body of a tibia element and a bottom surface configured to be brought into contact with a cut surface of a tibia. The bottom surface has an area smaller than that of the top surface, and has a tapered shape that narrows from the top to the bottom.

Abstract: Disclosed are a sunscreen composition containing cerium oxide (CeO2) particles having surfaces modified with polyhydroxystearic acid and a method for preparing the sunscreen composition. The sunscreen composition containing cerium oxide (CeO2) particles having surfaces modified with polyhydroxystearic acid exhibits excellent dispersion stability even after a long period of time elapses.

Abstract: Disclosed are a sunscreen composition containing surface-defected cerium oxide particles and a method for preparing the sunscreen composition. The sunscreen composition containing surface-defected cerium oxide particles has excellent ability to kill bacteria, may have a high sun protection factor (SPF) and a high PA index, and may exhibit excellent dispersion stability since the layer separation thereof does not occur even after a long period of time elapses.

Abstract: Disclosed are a sunscreen composition that absorbs light in the UVA region and a method for preparing the sunscreen composition. Light in the UVA region is light in the wavelength band that affects skin aging and penetrates to the dermis inside the skin. Hence, when the sunscreen composition is used, the sunscreen composition absorbs the light and an effect of preventing skin aging is thus obtained.

Abstract: A knee trial which is coupled to identify the mobility of an implant before the implant is implanted by total knee arthroplasty, and more particularly, a detachable knee trial which includes a plate trial, an insert trial, and an adapter for easy attachment and detachment of the two trials, wherein the adapter includes an elastic member on one side thereof to firmly couple the two trials by pressing the plate trial and the insert trial with opposite ends of the elastic member and to alleviate the burdens of an operator and a patient by allowing the adapter to be attached and detached even only with a simple operation of pressing the adapter and compressing the elastic member by a hand and promptly and precisely performing an operation of selecting an implant of a suitable size while applying various trials in the total knee arthroplasty process and shortening surgery time, alleviating the burdens of a surgeon and a patient, and wherein one side of the adapter is formed of plastic, making it possible to couple

Abstract: A baseplate trial holding apparatus which holds a baseplate trial disposed in a proximal tibia during total knee arthroplasty or revision total knee arthroplasty, and includes a keel location setting part for setting an insertion location of a keel punch, and a knee joint implant surgical instrument set including the same.

Abstract: A mask glue removing apparatus includes a first plate including a plurality of nozzles to be adjusted at independent dispensing angles of each other and a head in which the plurality of nozzles are installed and configured to move the head close to a position corresponding to a region of a mask in which glue is present, adjust the dispensing angles of the plurality of nozzles to face the region in which the glue is present, and dispense a chemical liquid, rinse, or air through the plurality of nozzles to remove the glue, and a second plate on which the mask is placed and configured to adjust a position of a main body according to a removal process for the glue.

Abstract: The present invention relates to a coupler assembly for a tibial cutting guide, the assembly including an aligning coupler having a first side coupled to an aligning member by sliding and a second side slid in an adaptor groove of the tibial cutting guide, and a handle slidably coupled to the aligning coupler. More particularly, the present invention relates to a coupler assembly for a tibial cutting guide, the assembly enabling an aligner and a cutting guide to be easily coupled and decoupled through an adaptor without specific operation because when the handle is slid to the cutting guide, the handle is fixed to the cutting guide, and the cutting guide and the adaptor are locked, and when the handle is slid in the opposite direction from the cutting guide, the handle is separated from the cutting guide, and the cutting guide and the adaptor are unlocked.

Abstract: The present invention relates to a slurry composition for polishing and a method for polishing a semiconductor thin film with steps of a high aspect ratio, and more particularly, by comprising polishing particles, a compound represented by Chemical Formula 1 below, and a compound represented by Chemical Formula 2 below, to make a slurry composition for polishing that has a high polishing speed in high stepped regions while simultaneously protecting low stepped regions to obtain a high degree of flatness without leaving remaining steps after the completion of polishing, and a method for polishing a semiconductor thin film with steps of a high aspect ratio. in Chemical Formula 1, n is an integer of 1 to 10, in Chemical Formula 2, R1 to R4 are independently C1-C10 alkyl groups, and m is an integer of 1 to 10.