Abstract: A method for producing a bis(fluorosulfonyl)imide lithium salt is disclosed. The method includes the steps of: (a) reacting bis(chlorosulfonyl)imide with NH4F(HF)n (n=0-10) to prepare ammonium bis(fluorosulfonyl)imide; and (b) reacting the ammonium bis(fluorosulfonyl)imide with a lithium base, wherein in at least one of steps (a) and (b), after the reaction, a process of adding an alkoxy trialkyl silane to the reaction solution to remove a fluorine anion is performed.

Abstract: A vehicle body includes a floor member, a support member coupled to an upper surface of the floor member, and a frame member coupled to an upper end of the support member to define a space between the floor member and the frame member, wherein the space is configured to house an item. The item may include a high-voltage battery.

Abstract: The present invention relates to a prepreg which is manufactured by impregnating thermosetting resin composition and at least one thermoplastic additive into unidirectional carbon fiber, and to a resin composition for high speed curing prepreg for car body parts through press method and a prepreg product containing the same by differentiating a resin constituent, a resin equivalent weight, viscosity, gel time and glass transition temperature differing from those described in the prior art.

Abstract: The present invention relates to a prepreg which is manufactured by impregnating thermosetting resin composition and at least one thermoplastic additive into unidirectional carbon fiber, and to a resin composition for high speed curing prepreg for car body parts through press method and a prepreg product containing the same by differentiating a resin constituent, a resin equivalent weight, viscosity, gel time and glass transition temperature differing from those described in the prior art.

Abstract: Provided are a cleaning device that may be applied to a manufacturing equipment without stopping operations of the equipment, a cleaning method, and a method of manufacturing a device. The cleaning device includes: a frame substrate configured to frame the cleaning device; a first functional membrane on a first surface of the frame substrate; and a second functional membrane on a second surface of the frame substrate, which is opposite to the first surface. The cleaning method includes: positioning a cleaning device including a frame substrate and functional membranes formed on opposite surfaces of the frame substrate on a support configured to support a substrate, during a semiconductor manufacturing process or a display manufacturing process on the substrate; maintaining the positioning of the cleaning device on the support for a predetermined time period; and removing the cleaning device from the support.