Patents by Inventor Seok-Jun Seo
Seok-Jun Seo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11854536Abstract: A keyword spotting apparatus, method, and computer-readable recording medium are disclosed. The keyword spotting method using an artificial neural network according to an embodiment of the disclosure may include obtaining an input feature map from an input voice; performing a first convolution operation on the input feature map for each of n different filters having the same channel length as the input feature map, wherein a width of each of the filters is w1 and the width w1 is less than a width of the input feature map; performing a second convolution operation on a result of the first convolution operation for each of different filters having the same channel length as the input feature map; storing a result of the second convolution operation as an output feature map; and extracting a voice keyword by applying the output feature map to a learned machine learning model.Type: GrantFiled: September 4, 2020Date of Patent: December 26, 2023Assignee: Hyperconnect Inc.Inventors: Sang Il Ahn, Seung Woo Choi, Seok Jun Seo, Beom Jun Shin
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Publication number: 20230154453Abstract: Systems and techniques to generate imitative responses are illustrated. response generation method performed in an electronic apparatus of the present disclosure includes acquiring at least one piece of utterance data, acquiring a first context corresponding to the utterance data from a context candidate set, generating one or more dialogue sets including the first context and the utterance data, receiving a second context from a user, and acquiring a response corresponding to the second context using a language model based on the one or more dialogue sets.Type: ApplicationFiled: October 13, 2022Publication date: May 18, 2023Applicant: Hyperconnect Inc.Inventors: Enkhbayar Erdenee, Beom Su Kim, Sang Bum Kim, Seok Jun Seo, Jin Yong Yoo, Bu Ru Chang, Seung Ju Han
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Publication number: 20230080930Abstract: Disclosed is a method of training a dialogue model in an electronic device, the method including selecting a first context from a first dialogue data set including at least one pair of a context and a response corresponding to the context, generating a first response corresponding to the first context through a first dialogue model, generating an augmented dialogue dataset by incorporating a pair of the first context and the first response corresponding to the first context into the first dialogue data set, and training a second dialogue model based on the augmented dialogue dataset.Type: ApplicationFiled: June 17, 2022Publication date: March 16, 2023Applicant: Hyperconnect Inc.Inventors: Seok Jun Seo, Seung Ju Han, Beom Su Kim, Bu Ru Chang, Enkhbayar Erdenee
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Publication number: 20230077528Abstract: A training method of a conversation model according to various example embodiments of the present disclosure may include identifying a first context, identifying a first response set corresponding to the first context based on a first model, identifying a response subset selected from the first response set based on a gold response corresponding to the first context and training a second model based on the first context information and the response subset.Type: ApplicationFiled: June 2, 2022Publication date: March 16, 2023Applicant: Hyperconnect Inc.Inventors: Enkhbayar Erdenee, Beom Su Kim, Seok Jun Seo, Sang Il Ahn, Bu Ru Chang, Seung Ju Han
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Patent number: 11457077Abstract: A server may include a communication interface for receiving a plurality of profile information from a plurality of terminals; and a processor configured to divide users of the plurality of terminals into a plurality of groups based on a first criterion, to divide users of a first gender included in each group into a plurality of subgroups based on a second criterion different from the first criterion, to divide users of a second gender different from the first gender, included in each group into a plurality of matching groups to correspond to each of the plurality of subgroups, and to provide profile information of users included in each of the plurality of matching groups corresponding to each of the plurality of subgroups among the plurality of profile information to users included in each of the plurality of subgroups.Type: GrantFiled: September 9, 2020Date of Patent: September 27, 2022Assignee: Hyperconnect Inc.Inventors: Sang Il Ahn, Hyeong Keol Nam, Seok Jun Seo, Seok Hwan Choi, Jae Hyeuk Oh
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Publication number: 20210074270Abstract: A keyword spotting apparatus, method, and computer-readable recording medium are disclosed. The keyword spotting method using an artificial neural network according to an embodiment of the disclosure may include obtaining an input feature map from an input voice; performing a first convolution operation on the input feature map for each of n different filters having the same channel length as the input feature map, wherein a width of each of the filters is w1 and the width w1 is less than a width of the input feature map; performing a second convolution operation on a result of the first convolution operation for each of different filters having the same channel length as the input feature map; storing a result of the second convolution operation as an output feature map; and extracting a voice keyword by applying the output feature map to a learned machine learning model.Type: ApplicationFiled: September 4, 2020Publication date: March 11, 2021Inventors: Sang Il Ahn, Seung Woo Choi, Seok Jun Seo, Beom Jun Shin
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Publication number: 20210075883Abstract: A server may include a communication interface for receiving a plurality of profile information from a plurality of terminals; and a processor configured to divide users of the plurality of terminals into a plurality of groups based on a first criterion, to divide users of a first gender included in each group into a plurality of subgroups based on a second criterion different from the first criterion, to divide users of a second gender different from the first gender, included in each group into a plurality of matching groups to correspond to each of the plurality of subgroups, and to provide profile information of users included in each of the plurality of matching groups corresponding to each of the plurality of subgroups among the plurality of profile information to users included in each of the plurality of subgroups.Type: ApplicationFiled: September 9, 2020Publication date: March 11, 2021Inventors: Sang Il Ahn, Hyeong Keol Nam, Seok Jun Seo, Seok Hwan Choi, Jae Hyeuk Oh
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Patent number: 10006554Abstract: A spring vent for a tire vulcanizing mold comprises: a sleeve having a flow path vertically passing therethrough; a head opening/closing an inlet at an upper end of the flow path; a rod comprising a bar-type body formed below the head and disposed along the flow path and a stopper formed below the body to be hung to an outside of an outlet at a lower end of the flow path; and a spring inserted into the body. The stopper of the rod is formed to have a spherical shape. An elastic hole having an open bottom is formed in the stopper.Type: GrantFiled: July 15, 2016Date of Patent: June 26, 2018Assignee: MEGA INDUSTRY CO., LTD.Inventor: Seok Jun Seo
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Publication number: 20170350520Abstract: A spring vent for a tire vulcanizing mold comprises: a sleeve having a flow path vertically passing therethrough; a head opening/closing an inlet at an upper end of the flow path; a rod comprising a bar-type body formed below the head and disposed along the flow path and a stopper formed below the body to be hung to an outside of an outlet at a lower end of the flow path; and a spring inserted into the body. The stopper of the rod is formed to have a spherical shape. An elastic hole having an open bottom is formed in the stopper.Type: ApplicationFiled: July 15, 2016Publication date: December 7, 2017Inventor: Seok Jun Seo
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Patent number: 9343534Abstract: According to example embodiments, a semiconductor material may include zinc, nitrogen, and fluorine. The semiconductor material may further include oxygen. The semiconductor material may include a compound. For example, the semiconductor material may include zinc fluorooxynitride. The semiconductor material may include zinc oxynitride containing fluorine. The semiconductor material may include zinc fluoronitride. The semiconductor material may be applied as a channel material of a thin film transistor (TFT).Type: GrantFiled: November 29, 2013Date of Patent: May 17, 2016Assignees: Samsung Electronics Co., Ltd., Samsung Display Co., Ltd.Inventors: Tae-sang Kim, Sun-jae Kim, Hyun-suk Kim, Myung-kwan Ryu, Joon-seok Park, Seok-jun Seo, Jong-baek Seon, Kyoung-seok Son
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Patent number: 9245957Abstract: According to example embodiments, a semiconductor material may include zinc, nitrogen, and fluorine. The semiconductor material may further include oxygen. The semiconductor material may include a compound. For example, the semiconductor material may include zinc fluorooxynitride. The semiconductor material may include zinc oxynitride containing fluorine. The semiconductor material may include zinc fluoronitride. The semiconductor material may be applied as a channel material of a thin film transistor (TFT).Type: GrantFiled: November 29, 2013Date of Patent: January 26, 2016Assignees: Samsung Electronics Co., Ltd., Samsung Display Co., Ltd.Inventors: Tae-sang Kim, Sun-jae Kim, Hyun-suk Kim, Myung-kwan Ryu, Joon-seok Park, Seok-jun Seo, Jong-baek Seon, Kyoung-seok Son
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Patent number: 9123750Abstract: According to example embodiments, a transistor may include a gate electrode, a gate insulating layer, and a channel layer stacked on each other; and a source electrode and a drain electrode contacting first and second regions of the channel layer, respectively. The channel layer may include metal oxynitride. The first and second regions of the channel layer may be treated with a plasma containing hydrogen, and the first and second regions have a higher carrier concentration than a carrier concentration of a remaining region of the channel layer. The first and second regions of the channel layer may have a lower oxygen concentration and a higher nitrogen concentration than that of the remaining region thereof. The metal oxynitride of the channel layer may include a zinc oxynitride (ZnON)-based semiconductor.Type: GrantFiled: September 3, 2013Date of Patent: September 1, 2015Assignees: Samsung Electronics Co., Ltd., Samsung Display Co., Ltd.Inventors: Joon-seok Park, Sun-jae Kim, Tae-sang Kim, Hyun-suk Kim, Myung-kwan Ryu, Seok-jun Seo, Jong-baek Seon, Kyoung-seok Son, Sang-yoon Lee
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Patent number: 9076721Abstract: A transistor includes a channel layer including an oxynitride semiconductor doped with at least one of hafnium (Hf) and zirconium (Zr), a source on one side portion of the channel layer and a drain on another side portion of the channel layer, a gate corresponding to the channel layer, and a gate insulation layer between the channel layer and the gate.Type: GrantFiled: February 19, 2013Date of Patent: July 7, 2015Assignee: Samsung Electronics Co., Ltd.Inventors: Joon-seok Park, Sun-jae Kim, Tae-sang Kim, Hyun-suk Kim, Myung-kwan Ryu, Seok-jun Seo, Jong-baek Seon, Kyoung-seok Son, Sang-yoon Lee
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Patent number: 9035294Abstract: A transistor may include a channel layer formed of an oxide semiconductor. The oxide semiconductor may include GaZnON, and a proportion of Ga content to a total content of Ga and Zn of the channel layer is about 0.5 to about 4.5 at %.Type: GrantFiled: July 17, 2012Date of Patent: May 19, 2015Assignee: Samsung Display Co., Ltd.Inventors: Joon-seok Park, Tae-sang Kim, Hyun-suk Kim, Myung-kwan Ryu, Jong-baek Seon, Kyoung-seok Son, Sang-yoon Lee, Seok-jun Seo
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Publication number: 20150060990Abstract: Provided are transistors, methods of manufacturing the same, and electronic devices including the transistors. A transistor includes a channel layer having a multi-layer structure having first and second layers, the first and second semiconductor layers including a plurality of elements having respective concentrations, and the first layer is disposed closer to a gate than the second layer. The second layer has a higher electrical resistance than the first layer as a result of a combination of the elements and of their respective concentrations. At least one of the first and second layers includes a semiconductor material including zinc, oxygen, and nitrogen. One of the first and second layers includes a semiconductor material including zinc fluoronitride. An oxygen content of the second layer is higher than an oxygen content of the first layer. A fluorine content of the second layer is higher than a fluorine content of the first layer.Type: ApplicationFiled: March 12, 2014Publication date: March 5, 2015Applicant: Samsung Electronics Co., Ltd.Inventors: Sun-jae KIM, Tae-sang KIM, Myung-kwan RYU, Joon-seok PARK, Seok-jun SEO, Kyoung-seok SON, Seong-ho CHO
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Patent number: 8829515Abstract: Transistors having sulfur-doped zinc oxynitride channel layers, and methods of manufacturing the same, include a ZnON channel layer with sulfur content ratio with respect to a zinc content of from about 0.1 at % to about 1.2 at %, a source electrode and a drain electrode respectively formed on a first region and a second region of the channel layer, a gate electrode corresponding to the channel layer, and a gate insulation layer between the channel layer and the gate electrode.Type: GrantFiled: December 20, 2012Date of Patent: September 9, 2014Assignees: Samsung Electronics Co., Ltd., Samsung Display Co., Ltd.Inventors: Jong-baek Seon, Tae-sang Kim, Hyun-suk Kim, Myung-kwan Ryu, Joon-seok Park, Seok-jun Seo, Kyoung-seok Son, Sang-yoon Lee
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Publication number: 20140159035Abstract: According to example embodiments, a transistor may include a gate electrode, a gate insulating layer, and a channel layer stacked on each other; and a source electrode and a drain electrode contacting first and second regions of the channel layer, respectively. The channel layer may include metal oxynitride. The first and second regions of the channel layer may be treated with a plasma containing hydrogen, and the first and second regions have a higher carrier concentration than a carrier concentration of a remaining region of the channel layer. The first and second regions of the channel layer may have a lower oxygen concentration and a higher nitrogen concentration than that of the remaining region thereof. The metal oxynitride of the channel layer may include a zinc oxynitride (ZnON)-based semiconductor.Type: ApplicationFiled: September 3, 2013Publication date: June 12, 2014Applicants: SAMSUNG DISPLAY CO., LTD., SAMSUNG ELECTRONICS CO., LTD.Inventors: Joon-seok PARK, Sun-jae KIM, Tae-sang KIM, Hyun-suk KIM, Myung-kwan RYU, Seok-jun SEO, Jong-baek SEON, Kyoung-seok SON, Sang-yoon LEE
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Publication number: 20140151690Abstract: According to example embodiments, a semiconductor material may include zinc, nitrogen, and fluorine. The semiconductor material may further include oxygen. The semiconductor material may include a compound. For example, the semiconductor material may include zinc fluorooxynitride. The semiconductor material may include zinc oxynitride containing fluorine. The semiconductor material may include zinc fluoronitride. The semiconductor material may be applied as a channel material of a thin film transistor (TFT).Type: ApplicationFiled: November 29, 2013Publication date: June 5, 2014Applicants: SAMSUNG DISPLAY CO., LTD., SAMSUNG ELECTRONICS CO., LTD.Inventors: Tae-sang KIM, Sun-jae KIM, Hyun-suk KIM, Myung-kwan RYU, Joon-seok PARK, Seok-jun SEO, Jong-baek SEON, Kyoung-seok SON
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Publication number: 20140152936Abstract: According to example embodiments, a semiconductor material may include zinc, nitrogen, and fluorine. The semiconductor material may further include oxygen. The semiconductor material may include a compound. For example, the semiconductor material may include zinc fluorooxynitride. The semiconductor material may include zinc oxynitride containing fluorine. The semiconductor material may include zinc fluoronitride. The semiconductor material may be applied as a channel material of a thin film transistor (TFT).Type: ApplicationFiled: November 29, 2013Publication date: June 5, 2014Applicants: SAMSUNG DISPLAY CO., LTD., SAMSUNG ELECTRONICS CO., LTD.Inventors: Tae-sang KIM, Sun-jae KIM, Hyun-suk KIM, Myung-kwan RYU, Joon-seok PARK, Seok-jun SEO, Jong-baek SEON, Kyoung-seok SON
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Patent number: D1029868Type: GrantFiled: August 24, 2022Date of Patent: June 4, 2024Assignee: Hyperconnect Inc.Inventors: Beom Su Kim, Seung Ju Han, Enkhbayar Erdenee, Seok Jun Seo, Jin Yong Yoo, Yeon Woo Lee, Sang Bum Kim, Su Hyun Lee, Se Yeon Oh, Sun Young Bae