Abstract: A color filter substrate includes a substrate, a black matrix disposed on the substrate, a color filter on a sub-pixel area partitioned by the black matrix, a common electrode disposed on the color filter to receive a common voltage, and an anti-reflective layer configured to prevent the reflection of light in the color filter substrate.

Abstract: A color filter substrate includes a substrate, a black matrix disposed on the substrate, a color filter on a sub-pixel area partitioned by the black matrix, a common electrode disposed on the color filter to receive a common voltage, and an anti-reflective layer configured to prevent the reflection of light in the color filter substrate.

Abstract: A color filter substrate includes a substrate, a black matrix disposed on the substrate, a color filter on a sub-pixel area partitioned by the black matrix, a common electrode disposed on the color filter to receive a common voltage, and an anti-reflective layer configured to prevent the reflection of light in the color filter substrate.

Abstract: A color filter may include a red pigment as a main component of a pigment, and at least one of a green pigment and a blue pigment as an additional pigment at 0.5-10 wt % among the entire pigment. The color filter may include a green pigment as a main component of a pigment, and at least one of a red pigment, a blue pigment, and a violet pigment at 0.5-10 wt % as an additional pigment among the entire pigment. The color filter may include a blue pigment as the main component of the pigment, and at least one of a red pigment and a green pigment as the additional pigment at 0.5-10 wt % among the entire pigment.

Abstract: A color filter substrate includes a substrate, a black matrix disposed on the substrate, a color filter on a sub-pixel area partitioned by the black matrix, a common electrode disposed on the color filter to receive a common voltage, and an anti-reflective layer configured to prevent the reflection of light in the color filter substrate.

Abstract: A color filter substrate includes a substrate, a black matrix disposed on the substrate, a color filter on a sub-pixel area partitioned by the black matrix, a common electrode disposed on the color filter to receive a common voltage, and an anti-reflective layer configured to prevent the reflection of light in the color filter substrate.

Abstract: A color filter may include a red pigment as a main component of a pigment, and at least one of a green pigment and a blue pigment as an additional pigment at 0.5-10 wt % among the entire pigment. The color filter may include a green pigment as a main component of a pigment, and at least one of a red pigment, a blue pigment, and a violet pigment at 0.5-10 wt % as an additional pigment among the entire pigment. The color filter may include a blue pigment as the main component of the pigment, and at least one of a red pigment and a green pigment as the additional pigment at 0.5-10 wt % among the entire pigment.

Abstract: The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the -value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.

Abstract: A color filter substrate is provided. The color filter substrate includes a base substrate, a first color filter and a second color filter. The base substrate includes a first pixel region and a second pixel region that has a first sub-region and a second sub-region. The first color filter is formed in a first pixel region and a first sub-region of the second pixel region. The second color filter is formed in a second sub-region of the second pixel region.

Abstract: The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the -value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.

Abstract: A color filter substrate includes a substrate, a black matrix disposed on the substrate, a color filter on a sub-pixel area partitioned by the black matrix, a common electrode disposed on the color filter to receive a common voltage, and an anti-reflective layer configured to prevent the reflection of light in the color filter substrate.

Abstract: A color filter substrate is provided. The color filter substrate includes a base substrate, a first color filter and a second color filter. The base substrate includes a first pixel region and a second pixel region that has a first sub-region and a second sub-region. The first color filter is formed in a first pixel region and a first sub-region of the second pixel region. The second color filter is formed in a second sub-region of the second pixel region.

Abstract: The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the &ggr;-value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.