Patents by Inventor Seon-Su Shin

Seon-Su Shin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240173341
    Abstract: Disclosed is a method for, preventing, ameliorating or treating dementia by administering a composition containing 2?-fucosyllactose. 2?-FL ameliorates brain damage caused by amyloid beta and neuroinflammation by suppressing or preventing accumulation of the amyloid beta, thus being highly effective in preventing, ameliorating and treating dementia.
    Type: Application
    Filed: November 14, 2023
    Publication date: May 30, 2024
    Applicant: Advanced Protein Technologies Corp.
    Inventors: Chul Soo SHIN, Jong Won YOON, Seon Min JEON, Young Ha SONG, Jong Gil YOO, Jeong Su BANG
  • Patent number: 7083338
    Abstract: A lithography equipment is provided, which includes: a coater coating a substrate with resist; a first buffer storing the substrate supplied from the coater; a baker baking the substrate supplied from the first buffer; a first turn table rotating the substrate supplied from the baker; a first transferor communicating the substrate with the coater, the first buffer, the baker, and the first turntable; an exposer exposing light to the substrate supplied from the first turntable; a developer developing the resist on the substrate supplied from the exposer; and a second transferor communicating the substrate with the first turntable, the exposer, and the developer.
    Type: Grant
    Filed: October 27, 2004
    Date of Patent: August 1, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Seon-Su Shin, Seong-Bong Kim, Yeong-Beom Lee
  • Publication number: 20050089324
    Abstract: A lithography equipment is provided, which includes: a coater coating a substrate with resist; a first buffer storing the substrate supplied from the coater; a baker baking the substrate supplied from the first buffer; a first turn table rotating the substrate supplied from the baker; a first transferor communicating the substrate with the coater, the first buffer, the baker, and the first turntable; an exposer exposing light to the substrate supplied from the first turntable; a developer developing the resist on the substrate supplied from the exposer; and a second transferor communicating the substrate with the first turntable, the exposer, and the developer.
    Type: Application
    Filed: October 27, 2004
    Publication date: April 28, 2005
    Inventors: Seon-Su Shin, Seong-Bong Kim, Yeong-Beom Lee