Patents by Inventor Seong-O Choi

Seong-O Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9330820
    Abstract: Methods are provided for fabricating three-dimensional electrically conductive structures. Three-dimensional electrically conductive microstructures are also provided. The method may include providing a mold having at least one microdepression which defines a three-dimensional structure; filling the microdepression of the mold with at least one substrate material; molding the at least one substrate material to form a substrate; and depositing and patterning of at least one electrically conductive layer either during the molding process or subsequent to the molding process to form an electrically conductive structure. In one embodiment, the three-dimensional electrically conductive microstructure comprises an electrically functional microneedle array comprising two or more microneedles, each including a high aspect ratio, polymeric three dimensional substrate structure which is at least substantially coated by an electrically conductive layer.
    Type: Grant
    Filed: April 30, 2013
    Date of Patent: May 3, 2016
    Assignee: GEORGIA TECH RESEARCH CORPORATION
    Inventors: Mark G. Allen, Seong-O Choi, Jung-Hwan Pauk, Xiaosong Wu, Yanzhu Zhao, Yong-Kyu Yoon, Swaminathan Rajaraman
  • Publication number: 20130306356
    Abstract: Methods are provided for fabricating three-dimensional electrically conductive structures. Three-dimensional electrically conductive microstructures are also provided. The method may include providing a mold having at least one microdepression which defines a three-dimensional structure; filling the microdepression of the mold with at least one substrate material; molding the at least one substrate material to form a substrate; and depositing and patterning of at least one electrically conductive layer either during the molding process or subsequent to the molding process to form an electrically conductive structure. In one embodiment, the three-dimensional electrically conductive microstructure comprises an electrically functional microneedle array comprising two or more microneedles, each including a high aspect ratio, polymeric three dimensional substrate structure which is at least substantially coated by an electrically conductive layer.
    Type: Application
    Filed: April 30, 2013
    Publication date: November 21, 2013
    Applicant: Georgia Tech Research Corporation
    Inventors: Mark G. Allen, Seong-O Choi, Jung-Hwan Pauk, Xiaosong Wu, Yanzhu Zhao, Yong-Kyu Yoon, Swaminathan Rajaraman
  • Publication number: 20080063866
    Abstract: Methods are provided for fabricating three-dimensional electrically conductive structures. Three-dimensional electrically conductive microstructures are also provided. The method may include providing a mold having at least one microdepression which defines a three-dimensional structure; filling the microdepression of the mold with at least one substrate material; molding the at least one substrate material to form a substrate; and depositing and patterning of at least one electrically conductive layer either during the molding process or subsequent to the molding process to form an electrically conductive structure. In one embodiment, the three-dimensional electrically conductive microstructure comprises an electrically functional microneedle array comprising two or more microneedles, each including a high aspect ratio, polymeric three dimensional substrate structure which is at least substantially coated by an electrically conductive layer.
    Type: Application
    Filed: May 29, 2007
    Publication date: March 13, 2008
    Applicant: GEORGIA TECH RESEARCH CORPORATION
    Inventors: Mark Allen, Seong-O Choi, Jung-Hwan Park, Xiaosong Wu, Yanzhu Zhao, Yong-Kyu Yoon, Swaminathan Rajaraman