Abstract: The present invention relates to a method for preparing a slurry composition and a slurry composition prepared thereby, and has advantages of reducing scratches and residual particles, which are considered to be one of the biggest factors contributing to the decline in yield due to macroparticles and aggregated particles, while maintaining a high polishing rate, in a semiconductor CMP process. Furthermore, the present invention can achieve excellent results in the application to various patterns required in the ultra-large scale integration semiconductor process, the wafer non-uniformity (WIWNU) exhibiting a polishing rate, polishing selectivity, and polishing uniformity, which meet the needs, and the micro-scratch minimization.

Abstract: The present invention relates to a method for preparing a slurry composition and a slurry composition prepared thereby, and has advantages of reducing scratches and residual particles, which are considered to be one of the biggest factors contributing to the decline in yield due to macroparticles and aggregated particles, while maintaining a high polishing rate, in a semiconductor CMP process. Furthermore, the present invention can achieve excellent results in the application to various patterns required in the ultra-large scale integration semiconductor process, the wafer non-uniformity (WIWNU) exhibiting a polishing rate, polishing selectivity, and polishing uniformity, which meet the needs, and the micro-scratch minimization.

Abstract: The invention relates to a bicycle parking apparatus. The disclosed bicycle parking apparatus comprises: a rotational driving member providing driving power; a rotating storage unit consisting of multiple levels, rotated by the driving power from the rotational driving member, and partitioned so as to store bicycles in a radial configuration; an elevating unit, provided at a peripheral side of the rotating storage unit, for raising and lowering loaded bicycles; and a loading/unloading unit, provided at the elevating unit, for grasping and loading a bicycle from the outside onto the elevating unit or unloading a bicycle from the elevating unit to the outside.

Abstract: The invention relates to a bicycle parking apparatus. The disclosed bicycle parking apparatus comprises: a rotational driving member providing driving power; a rotating storage unit consisting of multiple levels, rotated by the driving power from the rotational driving member, and partitioned so as to store bicycles in a radial configuration; an elevating unit, provided at a peripheral side of the rotating storage unit, for raising and lowering loaded bicycles; and a loading/unloading unit, provided at the elevating unit, for grasping and loading a bicycle from the outside onto the elevating unit or unloading a bicycle from the elevating unit to the outside.