Patents by Inventor Seong-Sue Kim

Seong-Sue Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190232847
    Abstract: A sliding-type footrest device for a vehicle includes: a guide rail mounted on a floor panel and extending in a forward-and-backward direction; a footrest housing engaged with the guide rail to slide along the guide rail in the forward-and-backward direction, the footrest housing having a door configured to be opened or closed; and a footrest box disposed inside the footrest housing and allowing a backseat passenger to place feet into the footrest while the door is open.
    Type: Application
    Filed: May 15, 2018
    Publication date: August 1, 2019
    Inventors: Eun Sue KIM, Dae Ig JUNG, Jai Hak KIM, Seung Hyeok CHANG, Byoung Wan BAE, Seong Bin JEONG, Sin Jeong KANG, Duk Kyu BYUN
  • Patent number: 10338477
    Abstract: A lithography apparatus is provided. The lithography apparatus a reticle having a first surface and a second surface facing each other, and a pattern region formed on the first surface, a reticle stage facing the second surface of the reticle, the reticle stage to chuck the reticle, a protection conductor within a chamber housing the reticle and the reticle stage; and a power source to supply a voltage to the protection conductor.
    Type: Grant
    Filed: August 10, 2017
    Date of Patent: July 2, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Do Hyung Kim, Seong Sue Kim
  • Publication number: 20190196321
    Abstract: An extreme ultraviolet (EUV) mask blank is provided. The EUV mask blank includes a substrate having a first surface and a second surface opposed to each other, a reflective layer having first reflective layers and second reflective layers alternately stacked on the first surface of the substrate, a capping layer on the reflective layer, and a hydrogen absorber layer between the reflective layer and the capping layer, the hydrogen absorber layer configured to store hydrogen and being in contact with the capping layer.
    Type: Application
    Filed: December 19, 2018
    Publication date: June 27, 2019
    Inventors: Ho Yeon KIM, Seong Chul HONG, Seong Sue KIM
  • Publication number: 20180164694
    Abstract: A lithography apparatus is provided. The lithography apparatus a reticle having a first surface and a second surface facing each other, and a pattern region formed on the first surface, a reticle stage facing the second surface of the reticle, the reticle stage to chuck the reticle, a protection conductor within a chamber housing the reticle and the reticle stage; and a power source to supply a voltage to the protection conductor.
    Type: Application
    Filed: August 10, 2017
    Publication date: June 14, 2018
    Inventors: Do Hyung KIM, Seong Sue KIM
  • Patent number: 9645484
    Abstract: Reflective masks, and methods of manufacturing the same, include a reflective multi-layer on a mask substrate, a plurality of support patterns spaced apart from one another in the main trench. The plurality of support patterns are in a main trench of the reflective multi-layer. The plurality of support patterns correspond to areas of the reflective mask not transferred onto an exposure target substrate. The support patterns partition the main trench to form a plurality of auxiliary trenches. The reflective mask further includes a light absorption pattern including a plurality of auxiliary light absorption patterns in the auxiliary trenches.
    Type: Grant
    Filed: August 17, 2015
    Date of Patent: May 9, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Seong-sue Kim, Hwan-seok Seo, In-sung Kim, Tae-geun Kim
  • Patent number: 9588413
    Abstract: Provided are a photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate and an energy receiving layer covering the other side surface of the substrate. The method includes determining a local correction position on a frontside surface of the photomask according to a detected error of the photomask, and locally applying an energy beam to a backside surface region of the photomask aligned with the local correction position in a thickness direction of the photomask. The invention may be applicable to structures other than photomasks that benefit from modification of surface heights or selectively applied stress.
    Type: Grant
    Filed: September 7, 2016
    Date of Patent: March 7, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sang-hyun Kim, Seong-sue Kim, Dong-gun Lee
  • Publication number: 20160377973
    Abstract: Provided are photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate and an energy receiving layer covering the other side surface of the substrate. The method includes determining a local correction position on a frontside surface of the photomask according to a detected error of the photomask, and locally applying an energy beam to a backside surface region of the photomask aligned with the local correction position in a thickness direction of the photomask. The invention may be applicable to structures other than photomasks that benefit from modification of surface heights or selectively applied stress.
    Type: Application
    Filed: September 7, 2016
    Publication date: December 29, 2016
    Inventors: Sang-hyun KIM, Seong-sue KIM, Dong-gun LEE
  • Patent number: 9465286
    Abstract: Provided are a photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate and an energy receiving layer covering the other side surface of the substrate. The method includes determining a local correction position on a frontside surface of the photomask according to a detected error of the photomask, and locally applying an energy beam to a backside surface region of the photomask aligned with the local correction position in a thickness direction of the photomask. The invention may be applicable to structures other than photomasks that benefit from modification of surface heights or selectively applied stress.
    Type: Grant
    Filed: December 9, 2014
    Date of Patent: October 11, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sang-hyun Kim, Seong-sue Kim, Dong-gun Lee
  • Publication number: 20160116835
    Abstract: Reflective masks, and methods of manufacturing the same, include a reflective multi-layer on a mask substrate, a plurality of support patterns spaced apart from one another in the main trench. The plurality of support patterns are in a main trench of the reflective multi-layer. The plurality of support patterns correspond to areas of the reflective mask not transferred onto an exposure target substrate. The support patterns partition the main trench to form a plurality of auxiliary trenches. The reflective mask further includes a light absorption pattern including a plurality of auxiliary light absorption patterns in the auxiliary trenches.
    Type: Application
    Filed: August 17, 2015
    Publication date: April 28, 2016
    Inventors: Seong-sue KIM, Hwan-seok SEO, In-sung KIM, Tae-geun KIM
  • Patent number: 9239516
    Abstract: A reflective extreme ultraviolet mask includes a mask substrate having an exposing region and a peripheral region, the mask substrate including a light-scattering portion in the peripheral region, a reflective layer on an upper surface of the mask substrate, the reflective layer having a first opening exposing the light-scattering portion, and an absorbing layer pattern on the reflective layer, the absorbing layer pattern having a second opening in light communication with the first opening.
    Type: Grant
    Filed: February 25, 2015
    Date of Patent: January 19, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Tae-Geun Kim, Dong-Wan Kim, Dong-Gun Lee, Seong-Sue Kim
  • Patent number: 9176375
    Abstract: Methods of reducing a registration error of a photomask are provided. A method of reducing a registration error of a photomask may include identifying the registration error with respect to a pattern element in a pattern region of the photomask. Moreover, the method may include reducing a thickness of a portion of a non-pattern region of the photomask by irradiating an energy beam onto a location of the non-pattern region of the photomask that is spaced apart from the pattern element, to generate stress at the pattern element. Related photomasks and methods of manufacturing an integrated circuit are also provided.
    Type: Grant
    Filed: February 10, 2014
    Date of Patent: November 3, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-hyun Kim, Seong-sue Kim, Dong-gun Lee, Chalykh Roman, Mun-ja Kim
  • Patent number: 9170480
    Abstract: According to example embodiments, a reflective EUV mask may include a mask substrate, a patterned structure and a non-patterned structure on the mask substrate. At least one of the patterned structure and the non-patterned structure may include a thermally treated region configured to reduce a reflectivity of the respective patterned and non-patterned structure.
    Type: Grant
    Filed: June 14, 2013
    Date of Patent: October 27, 2015
    Assignee: Samsung Electronics Co. LTD.
    Inventors: Dong-gun Lee, Seong-Sue Kim, Tae-Geun Kim
  • Publication number: 20150168822
    Abstract: A reflective extreme ultraviolet mask includes a mask substrate having an exposing region and a peripheral region, the mask substrate including a light-scattering portion in the peripheral region, a reflective layer on an upper surface of the mask substrate, the reflective layer having a first opening exposing the light-scattering portion, and an absorbing layer pattern on the reflective layer, the absorbing layer pattern having a second opening in light communication with the first opening.
    Type: Application
    Filed: February 25, 2015
    Publication date: June 18, 2015
    Inventors: Tae-Geun KIM, Dong-Wan KIM, Dong-Gun LEE, Seong-Sue KIM
  • Publication number: 20150160550
    Abstract: Provided are a photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate and an energy receiving layer covering the other side surface of the substrate. The method includes determining a local correction position on a frontside surface of the photomask according to a detected error of the photomask, and locally applying an energy beam to a backside surface region of the photomask aligned with the local correction position in a thickness direction of the photomask. The invention may be applicable to structures other than photomasks that benefit from modification of surface heights or selectively applied stress.
    Type: Application
    Filed: December 9, 2014
    Publication date: June 11, 2015
    Inventors: Sang-hyun KIM, Seong-sue KIM, Dong-gun LEE
  • Publication number: 20150131071
    Abstract: A semiconductor device manufacturing apparatus includes a mask stage including a mask holder system that fixes a photomask, the mask holder system having a first fixing portion mounted at a first position of the mask holder system to fix the photomask, and a second fixing portion at a second position of the mask holder system and spaced apart from the first position, the second fixing portion fixing a pellicle assembly to be spaced apart from the photomask on the first fixing portion.
    Type: Application
    Filed: November 6, 2014
    Publication date: May 14, 2015
    Inventors: Dong-wan KIM, Seong-sue KIM, Chang-young JEONG, Dong-gun LEE
  • Patent number: 9025624
    Abstract: A beam generator for an aerial image generating apparatus includes a laser source for emitting a laser beam and a short wavelength beam source for generating a short wavelength beam by processing the laser beam such that the short wavelength beam is coherent with and has a wavelength shorter than that of the laser beam. A spectral unit includes a quartz plate and a spectral layer coated on a surface of the quartz plate. The spectral layer has a Brewster's angle greater than 70° with respect to the laser beam such that the short wavelength beam is reflected from the spectral unit without the laser beam, increasing the reflectivity of the shortwave beam while decreasing the reflectivity and absorptivity of the laser beam in the spectral unit.
    Type: Grant
    Filed: July 10, 2012
    Date of Patent: May 5, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dong-Gun Lee, Seong-Sue Kim, Hwan-Seok Seo
  • Patent number: 8968969
    Abstract: A reflective extreme ultraviolet mask includes a mask substrate having an exposing region and a peripheral region, the mask substrate including a light-scattering portion in the peripheral region, a reflective layer on an upper surface of the mask substrate, the reflective layer having a first opening exposing the light-scattering portion, and an absorbing layer pattern on the reflective layer, the absorbing layer pattern having a second opening in light communication with the first opening.
    Type: Grant
    Filed: November 22, 2011
    Date of Patent: March 3, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Tae-Geun Kim, Dong-Wan Kim, Dong-Gun Lee, Seong-Sue Kim
  • Publication number: 20140363633
    Abstract: Methods of reducing a registration error of a photomask are provided. A method of reducing a registration error of a photomask may include identifying the registration error with respect to a pattern element in a pattern region of the photomask. Moreover, the method may include reducing a thickness of a portion of a non-pattern region of the photomask by irradiating an energy beam onto a location of the non-pattern region of the photomask that is spaced apart from the pattern element, to generate stress at the pattern element. Related photomasks and methods of manufacturing an integrated circuit are also provided.
    Type: Application
    Filed: February 10, 2014
    Publication date: December 11, 2014
    Inventors: Sang-hyun Kim, Seong-sue Kim, Dong-gun Lee, Chalykh Roman, Mun-ja Kim
  • Patent number: 8779403
    Abstract: An apparatus and a method for generating extreme ultra violet radiation are provided. The apparatus for generating extreme ultra violet radiation includes a light source, a first reflecting mirror on which source light emitted from the light source is incident, a second reflecting mirror on which first reflected light reflected by the first reflecting mirror is incident, a focus mirror on which second reflected light reflected by the second reflecting mirror is incident, the focus mirror reflecting third reflected light back to the second reflecting mirror, and a gas cell on which fourth reflected light reflected by the second reflecting mirror is incident.
    Type: Grant
    Filed: December 11, 2013
    Date of Patent: July 15, 2014
    Assignees: Samsung Electronics Co., Ltd., Fine Semitech Corp.
    Inventors: Dong-Gun Lee, Eok-Bong Kim, Jong-Ju Park, Seong-Sue Kim
  • Publication number: 20140166906
    Abstract: An extreme ultra violet (EUV) generation device includes a light source for outputting laser beam, a pulse width compression system for compressing a pulse width of the laser beam, a gas cell for receiving the laser beam having the compressed pulse width incident from the pulse width compression system and generating EUV light, and a vacuum chamber housing the pulse width compression system and the gas cell.
    Type: Application
    Filed: November 12, 2013
    Publication date: June 19, 2014
    Inventors: Eok-bong KIM, Jong-ju PARK, Dong-gun LEE, Seong-sue KIM