Patents by Inventor Seong Yong KWON

Seong Yong KWON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240093066
    Abstract: The present invention provides a specific acrylate compound component for a pressure-sensitive adhesive composition where it has excellent wettability, light resistance, and heat resistance. Moreover, it provides the pressure-sensitive adhesive composition which can cover step differences and defects and can minimize air bubbles or liftings between laminated layers while satisfying fundamentally required physical properties such as durability and pressure-sensitive adhesive. Especially, it provides the pressure-sensitive adhesive composition capable of minimizing air bubbles or liftings between laminated layers while satisfying fundamentally required physical properties such as durability and pressure-sensitive adhesive even when left at high temperature for a long time. It also provides an optical pressure-sensitive adhesive product which can cover defects located between laminated layers for a display module or a transparent electrode product.
    Type: Application
    Filed: August 8, 2023
    Publication date: March 21, 2024
    Inventors: Moon Ho HAM, Hong JANG, Ye Pil KWON, Jang Hee CHO, Seong Yong YOON, Jee Hong MIN
  • Patent number: 10910232
    Abstract: A copper plasma etching method according an exemplary embodiment includes: placing a substrate on a susceptor in a process chamber of a plasma etching apparatus; supplying an etching gas that include hydrogen chloride into the process chamber; plasma-etching a conductor layer that include copper in the substrate; and maintaining a temperature of the susceptor at 10° C. or less during the plasma-etching.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: February 2, 2021
    Assignees: SAMSUNG DISPLAY CO., LTD., KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, SEJONG CAMPUS
    Inventors: Sang Gab Kim, MunPyo Hong, Hyun Min Cho, Seong Yong Kwon, Ho Won Yoon
  • Publication number: 20190103287
    Abstract: A copper plasma etching method according an exemplary embodiment includes: placing a substrate on a susceptor in a process chamber of a plasma etching apparatus; supplying an etching gas that include hydrogen chloride into the process chamber; plasma-etching a conductor layer that include copper in the substrate; and maintaining a temperature of the susceptor at 10° C. or less during the plasma-etching.
    Type: Application
    Filed: August 21, 2018
    Publication date: April 4, 2019
    Inventors: Sang Gab KIM, MunPyo HONG, Hyun Min CHO, Seong Yong KWON, Ho Won YOON