Patents by Inventor Seong Yong KWON

Seong Yong KWON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10910232
    Abstract: A copper plasma etching method according an exemplary embodiment includes: placing a substrate on a susceptor in a process chamber of a plasma etching apparatus; supplying an etching gas that include hydrogen chloride into the process chamber; plasma-etching a conductor layer that include copper in the substrate; and maintaining a temperature of the susceptor at 10° C. or less during the plasma-etching.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: February 2, 2021
    Assignees: SAMSUNG DISPLAY CO., LTD., KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, SEJONG CAMPUS
    Inventors: Sang Gab Kim, MunPyo Hong, Hyun Min Cho, Seong Yong Kwon, Ho Won Yoon
  • Publication number: 20190103287
    Abstract: A copper plasma etching method according an exemplary embodiment includes: placing a substrate on a susceptor in a process chamber of a plasma etching apparatus; supplying an etching gas that include hydrogen chloride into the process chamber; plasma-etching a conductor layer that include copper in the substrate; and maintaining a temperature of the susceptor at 10° C. or less during the plasma-etching.
    Type: Application
    Filed: August 21, 2018
    Publication date: April 4, 2019
    Inventors: Sang Gab KIM, MunPyo HONG, Hyun Min CHO, Seong Yong KWON, Ho Won YOON