Abstract: Provided are a polymer including a first repeating unit represented by Formula 1 and having a glass transition temperature of 50° C. or less, a polymer-containing composition including the polymer, and a method of forming a pattern by using the polymer-containing composition: wherein, in Formula 1, descriptions of L11 to L13, a11 to a13, An, R11, R12, b12, and p1 are provided in the present specification.

Abstract: A semiconductor photoresist composition and a method of forming patterns, the composition includes an acid reactive polymer; a resin additive including a block copolymer; a photo acid generator; a photo-decomposable quencher; and a solvent, wherein the block copolymer includes an A-block and a B-block, a water contact angle of a polymer film consisting of the A-block is greater than about 50° and less than or equal to about 100°, and a water contact angle of a polymer film consisting of the B-block is greater than about 0° and less than or equal to about 50°.

Abstract: Proposed are a core-satellite micelle containing a tetra-block copolymer and a preparation method thereof. The core-satellite micelle includes a core, a shell surrounding the core, and a plurality of satellite domains positioned inside the shell. The core-satellite micelle contains a tetra-block copolymer represented by Structural Formula 1 below. The shell includes a first-monomer first block A1 and a first-monomer second block A2, and the satellite domain includes a second-monomer first block B1 and a second-monomer second block B2. The core-satellite micelle is foiled through self-assembly of the tetra-block copolymer, thereby having a larger interfacial contact area than existing block-copolymer micelles. Therefore, the core-satellite micelle can be used in next-generation nanotechnology applications such as drug delivery systems, porous catalyst materials, and sensors.

Abstract: A photoresist composition for extreme ultraviolet (EUV) radiation and a method of manufacturing a semiconductor device, the photoresist composition includes a polymer resin; a photoacid generator; and a photoreactive additive that includes at least two diazonaphthoquinone (DNQ) groups, wherein the at least two DNQ groups are represented by Formula 1 or Formula 2 described herein.

Abstract: Proposed are a core-satellite micelle containing a tetra-block copolymer and a preparation method thereof. The core-satellite micelle includes a core, a shell surrounding the core, and a plurality of satellite domains positioned inside the shell. The core-satellite micelle contains a tetra-block copolymer represented by Structural Formula 1 below. The shell includes a first-monomer first block A1 and a first-monomer second block A2, and the satellite domain includes a second-monomer first block B1 and a second-monomer second block B2. The core-satellite micelle is foiled through self-assembly of the tetra-block copolymer, thereby having a larger interfacial contact area than existing block-copolymer micelles. Therefore, the core-satellite micelle can be used in next-generation nanotechnology applications such as drug delivery systems, porous catalyst materials, and sensors.

Abstract: Provided are a tactile sensor, a method of manufacturing the tactile sensor, and a three-dimensional (3D) mapping method. The tactile sensor includes a total reflection layer; a pixel layer formed on the total reflection layer and including a microarray; and a tactile pad layer formed on the pixel layer.

Abstract: Provided are a tactile sensor, a method of manufacturing the tactile sensor, and a three-dimensional (3D) mapping method. The tactile sensor includes a total reflection layer; a pixel layer formed on the total reflection layer and including a microarray; and a tactile pad layer formed on the pixel layer.