Abstract: A sample analysis apparatus includes a first chamber that performs a first heating process for heating a small sample and a second chamber including a second chamber housing in which a second heating process for heating a wafer sample is performed. The first chamber includes a first chamber housing in which the first heating process is performed, a first support that supports the small sample, a first heating device that heats the small sample, an accommodation housing in which the small sample is accommodated, a sample tray arranged in the accommodation space, sample container configured to store the small sample, and a transfer module configured to transfer the sample container and the small sample from the accommodation housing to the first chamber.