Abstract: The present application relates to methods of forming patterned thin films on a substrate. In some embodiments a first patterned layer may be deposited on a substrate by a imprint lithography technique, such as microcontact printing. A second layer of a desired composition is selectively deposited over the first patterned layer by a vapor phase deposition process, such as ALD or CVD.

Abstract: The present application relates to methods of forming patterned thin films on a substrate. In some embodiments a first patterned layer may be deposited on a substrate by a imprint lithography technique, such as microcontact printing. A second layer of a desired composition is selectively deposited over the first patterned layer by a vapor phase deposition process, such as ALD or CVD.

Abstract: The invention relates to a method for producing metal conductors, for instance copper conductor patterns as electronic components on a substrate, such as paper. Said method is particularly suitable for producing metal conductors on papers for large scale mass production using printing or like machines. In the method, an electroless deposition is carried out in at least two steps wherein a solution is made of one of the metallic starting material or the reducing agent, or the other one is present in a gas or vapour form, followed by successive application thereof on the substrate.