Patents by Inventor Serge F. C. L. Wetzels

Serge F. C. L. Wetzels has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positioning system for use in lithographic apparatus
    Patent number: 6852989
    Abstract: A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a lithographic projection apparatus including an illumination system for supplying a projection beam of radiation, a first object table for holding a mask, a second, movable object table for holding a substrate, and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate.
    Type: Grant
    Filed: August 27, 2003
    Date of Patent: February 8, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Yim Bun P. Kwan, Serge F. C. L. Wetzels, Gerjan P. Veldhuis
  • Positioning system for use in lithographic apparatus
    Patent number: 6635887
    Abstract: A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a lithographic projection apparatus including an illumination system for supplying a projection beam of radiation, a first object table for holding a mask, a second, movable object table for holding a substrate, and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate.
    Type: Grant
    Filed: November 29, 2000
    Date of Patent: October 21, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Yim Bun P. Kwan, Serge F. C. L. Wetzels, Gerjan P. Veldhuis