Abstract: A method of treatment of liquid, air and surfaces using UV radiation with a pulse duration of 10−6 to 10−3 sec. and a radiation intensity of at least 100 kWt/m2, using a plasma radiation source with a pulsed storage element, wherein the energy stored in the storage element at the time of discharge, the pulse duration and the area of the radiating surface of the radiation source are interrelated as follows: W0/A Srad t ½>1, where W0, is the energy stored in the storage element, Joules; Srad is the area of the radiating surface of the radiation source, m2; t½ is the radiation pulse duration at mid-height of a peak, sec.; A=108 Wt/m2 is the constant coefficient. A device for the UV treatment of liquid, air and surfaces includes a secondary winding integrated in a series with a charged condenser, and a pulsed lamp to form a discharging circuit.

Abstract: A method for surface treating a metallic substrate to enhance its corrosion resistance. The method comprises the step of applying to the surface of the substrate a pulse treatment with a beam of dense high-temperature radiation generated by a coaxial plasma accelerator of the erosion type. The method provides for rapid heating of the surface region of the substrate to modify its metallurgical structure, without substantial heating of the underlying bulk thereof, followed by rapid cooling, whereby crystal nucleation and growth are suppressed and phase segregation and separation of substrate additives or compounds is avoided.