Patents by Inventor Sergei Shulepov

Sergei Shulepov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20070229786
    Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
    Type: Application
    Filed: March 28, 2006
    Publication date: October 4, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Kemper, Sjoerd Lambertus Donders, Joost Ottens, Edwin Kadijk, Sergei Shulepov
  • Lithographic apparatus
    Publication number: 20070110213
    Abstract: A barrier member is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.
    Type: Application
    Filed: March 29, 2006
    Publication date: May 17, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martinus Hendrikus Leenders, Nicolaas Kate, Nicolaas Kemper, Joost Ottens, Marcel Beckers, Johannes Smeulers, Michel Riepen, Sergei Shulepov
  • Lithographic apparatus and device manufacturing method
    Publication number: 20070030464
    Abstract: A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.
    Type: Application
    Filed: June 28, 2005
    Publication date: February 8, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Kemper, Sjoerd Donders, Christiaan Hoogendam, Nicolaas Kate, Sergei Shulepov
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050175776
    Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
    Type: Application
    Filed: November 12, 2004
    Publication date: August 11, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bod Streefkerk, Johannes Baselmans, Richard Bruls, Marcel Mathijs Dierichs, Sjoerd Donders, Christiaan Hoogendam, Hans Jansen, Erik Loopstra, Jeroen Johannes Mertens, Johannes Mulkens, Ronald Severijns, Sergei Shulepov, Herman Boom, Timotheus Sengers