Abstract: The invention relates to methods of making articles of semiconducting material and semiconducting material articles formed thereby, such as articles of semiconducting material that may be useful in making photovoltaic cells.

Abstract: A method of measuring a shape of a specular reflective surface is provided. A pattern displayed on a surface of a target positioned at a target plane is produced from a specular reflective surface positioned at a measurement plane. An image of the reflection is recorded at an imaging plane. Positions of a plurality of points on the specular reflective surface relative to the imaging plane are determined. A first relation between feature positions on the image of the reflection and feature positions on the pattern is determined. The shape of the specular reflective surface is determined from a second relation involving a surface profile of the specular reflective surface and the first relation using the positions of the plurality of points as an initial condition.

Abstract: A method of measuring a shape of a specular reflective surface is provided. A pattern displayed on a surface of a target positioned at a target plane is produced from a specular reflective surface positioned at a measurement plane. An image of the reflection is recorded at an imaging plane. Positions of a plurality of points on the specular reflective surface relative to the imaging plane are determined. A first relation between feature positions on the image of the reflection and feature positions on the pattern is determined. The shape of the specular reflective surface is determined from a second relation involving a surface profile of the specular reflective surface and the first relation using the positions of the plurality of points as an initial condition.

Abstract: Methods and apparatuses for determining a thickness of a glass substrate are disclosed. The method includes conveying the glass substrate past an optical measurement head and determining a measurement separation distance dm between a first surface plane of the glass substrate and the optical measurement head. A position of the optical measurement head relative to the first surface plane of the glass substrate is adjusted based on the measurement separation distance dm between the first surface plane of the glass substrate and the optical measurement head such that the glass substrate is within a working range of the optical measurement head as the glass substrate is conveyed past the optical measurement head. A thickness Tm of the glass substrate is measured with the optical measurement head as the glass substrate is conveyed past the optical measurement head.

Abstract: The invention relates to methods of making unsupported articles of semiconducting material using thermally active molds having an external surface temperature, Tsurface, and a core temperature, Tcore, whererin Tsurface>Tcore.

Abstract: The invention relates to methods of making articles of semiconducting material and semiconducting material articles formed thereby, such as articles of semiconducting material that may be useful in making photovoltaic cells.

Abstract: A method for measuring relative positions of a specular reflective surface of an object along a measurement line is provided. The method includes converging at least one converging light beam at a nominal position on the measurement line and forming a reflected beam from the specular reflection surface. An image of the reflected beam is recorded at a detector plane. A position of the image of the reflected beam on the detector plane is determined and converted to a displacement of the specular reflection surface from the nominal position along the measurement line. A system for carrying out the method is also provided.

Abstract: A method of measuring a shape of a specular reflective surface is provided. A pattern displayed on a surface of a target positioned at a target plane is produced from a specular reflective surface positioned at a measurement plane. An image of the reflection is recorded at an imaging plane. Positions of a plurality of points on the specular reflective surface relative to the imaging plane are determined. A first relation between feature positions on the image of the reflection and feature positions on the pattern is determined. The shape of the specular reflective surface is determined from a second relation involving a surface profile of the specular reflective surface and the first relation using the positions of the plurality of points as an initial condition.

Abstract: An inspection system and method are described herein which use an illuminating system (e.g., light source (strobe) and light sharpening components) and an imaging system (e.g., digital camera and computer/software) to inspect and identify surface and body defects in a glass sheet (e.g., liquid crystal display (LCD) glass substrate).