Abstract: Methods and systems for drilling precise orifices in a wall of non-uniform thickness are provided. In one aspect, a thickness profile of at least a portion of the wall is created and the wall is irradiated with at least one laser beam to ablate a portion of the wall to thereby form an orifice in the wall. During the irradiation, one or more parameters of the least one laser beam are adjusted one or more times in accordance with the thickness profile to compensate for the non-uniform thickness of the wall.

Abstract: A laser machining system for machining a work-piece includes a laser scanning head, external optical subsystems, and an image acquisition device. The external optical subsystems correspond to optical channels that include a first optical channel and a second optical channel. The laser scanning head controls an optical path so that a laser beam is directed and focused on the work-piece through the first optical channel and the second optical channel at different times. The first optical channel and the second optical channel correspond to respective specific portions of the work-piece to be machined by the laser beam. The image acquisition device is positioned to view the work-piece through the optical path. The image acquisition device acquires via the first optical channel one or more images of the work-piece to determine a displacement of the work-piece with reference to a best optical focus position of the second optical channel.

Abstract: Methods and systems for drilling precise orifices in a wall of non-uniform thickness are provided. In one aspect, a thickness profile of at least a portion of the wall is created and the wall is irradiated with at least one laser beam to ablate a portion of the wall to thereby form an orifice in the wall. During the irradiation, one or more parameters of the least one laser beam are adjusted one or more times in accordance with the thickness profile to compensate for the non-uniform thickness of the wall.

Abstract: A laser machining system for machining a work-piece includes a laser scanning head, external optical subsystems, and an image acquisition device. The external optical subsystems correspond to optical channels that include a first optical channel and a second optical channel. The laser scanning head controls an optical path so that a laser beam is directed and focused on the work-piece through the first optical channel and the second optical channel at different times. The first optical channel and the second optical channel correspond to respective specific portions of the work-piece to be machined by the laser beam. The image acquisition device is positioned to view the work-piece through the optical path. The image acquisition device acquires via the first optical channel one or more images of the work-piece to determine a displacement of the work-piece with reference to a best optical focus position of the second optical channel.

Abstract: Methods and systems for precisely removing selected layers of materials from a multi-layer work piece using laser ablation are disclosed. Precise removal of one or more selected layers of materials of a work piece may be performed by irradiating at least one location on a multi-layer work piece with a laser beam, ablating material at the at least one location, detecting one or more characteristics of the material ablated at the at least one location and analyzing the one or more characteristics to identify a change in at least one of the one or more characteristics that indicates a change in the type of material being ablated. Related systems are also described.

Abstract: Methods and systems for precisely removing selected layers of materials from a multi-layer work piece using laser ablation are disclosed. Precise removal of one or more selected layers of materials of a work piece may be performed by irradiating at least one location on a multi-layer work piece with a laser beam, ablating material at the at least one location, detecting one or more characteristics of the material ablated at the at least one location and analyzing the one or more characteristics to identify a change in at least one of the one or more characteristics that indicates a change in the type of material being ablated. Related systems are also described.

Abstract: Embodiments of the present invention are directed to methods and systems for micromachining a conical surface. In one embodiment, such a system may include a rotating platform for receiving a long line of laser illumination, a mask having a predetermined pattern comprising a sector of a planar ring, the mask being positioned on the rotating platform, a workpiece stage having a rotational axis for rotating a removably-affixed workpiece comprising a conical surface, wherein the sector comprises the planar image of the conical surface, an excimer laser for producing a laser beam, a homogenizer for homogenizing the laser beam in at least a single direction, at least one condenser lens, a turning mirror and at least one projection lens.

Abstract: Embodiments of the present invention are directed to methods and systems for micromachining a conical surface. In one embodiment, such a system may include a rotating platform for receiving a long line of laser illumination, a mask having a predetermined pattern comprising a sector of a planar ring, the mask being positioned on the rotating platform, a workpiece stage having a rotational axis for rotating a removably-affixed workpiece comprising a conical surface, wherein the sector comprises the planar image of the conical surface, an excimer laser for producing a laser beam, a homogenizer for homogenizing the laser beam in at least a single direction, at least one condenser lens, a turning mirror and at least one projection lens.

Abstract: Embodiments of the present invention are directed to an illuminating optical device for forming a field of illumination. The optical device includes a first one-dimensional homogenizer positioned to homogenize a first dimension/axis of the field of illumination and a second one-dimensional homogenizer positioned to homogenize a second dimension/axis of the field of illumination.

Abstract: Embodiments of the present invention are directed to an illuminating optical device for forming a field of illumination. The optical device includes a first one-dimensional homogenizer positioned to homogenize a first dimension/axis of the field of illumination and a second one-dimensional homogenizer positioned to homogenize a second dimension/axis of the field of illumination.

Abstract: An inspection system and an inspection method, the method including detecting flaws on a surface, determining the size, count, and position of flaws on the surface, providing a representation of the detected flaws by size, count, and position on a display, setting a display threshold value which is a function of a number of particles of a particular size to be displayed on the display, determining when the display threshold is breached and in response adjusting the display to cease displaying those flaws, storing at least one inspection threshold value, and determining when the inspection threshold value is breached and in response outputting an inspection interrupt signal to stop the inspection after the inspection threshold value is breached.

Abstract: A pellicle reflectivity monitoring system comprising a radiation source for directing radiation through a pellicle to an object to be inspected, a sensor device positioned to receive the portion of the radiation reflected by the pellicle, a processor, responsive to the sensor device, for determining the intensity of the portion of the radiation reflected by the pellicle, and a lens assembly, positioned in an optical path between the pellicle and the sensor device, for directing the portion of the radiation reflected by pellicles of different heights onto the sensor device. A comparator device compares the intensity of the radiation directed at the object to be inspected with the intensity of the portion of the radiation reflected by the pellicle and outputs a correction factor based on the comparison in order to compensate for the portion of the radiation reflected by the pellicle.

Abstract: A plate holder for a plate surface inspection system, the plate holder including a plate holder body and a calibration plate integral with the plate holder body thereby eliminating the need to load a separate special calibration plate in the plate holder each time the surface inspection system needs to be calibrated.

Abstract: An improved optical inspection system for detecting flaws on a diffractive surface containing surface patterns includes: an ultraviolet illumination means for illuminating a region on the diffractive surface to generate a scattered intensity distribution in response to either a flaw or a surface pattern; means for detecting the intensity level of the scattered intensity distribution at a plurality of locations about the diffractive surface; means for establishing a minimum detected intensity level; means, responsive to the minimum detected intensity level, for indicating the absence of a flaw on the illuminated region of the diffractive surface when the minimum detected intensity level is below a threshold intensity level and for indicating the presence of a flaw on the illuminated region of the diffractive surface when the minimum detected intensity level exceeds the threshold intensity level; and means for moving the diffractive surface to generate a scan pattern on the diffractive surface to inspect the en

Abstract: A system for processing particle size and position data for a surface under inspection, the system including an air spindle for rotating and a translation stage for translating the surface with respect to a beam of radiation used to detect particles on the surface; a rotational encoder for dividing the surface into a number N of angular vectors; a counter of counting the number of revolutions of the surface; a processor for collecting particle size and position data at each angular vector during each revolution; first and second FIFO memories having at least N address spaces, each address space allocated for a specific angular vector; and a routine for writing the collected particle size and position data to the first memory and for reading particle size and position data from the second memory and switching memories every M revolutions. The FIFO memories are programmed to store only the greater of stored size data and incoming size data.

Abstract: A surface pit and mound detection and discrimination system including a device for scanning a beam of radiation over a surface, and a mechanism for detecting a local slope on the surface for differentiating between whether the beam of radiation is scanning a pit or a mound on the surface.

Abstract: An optical inspection system and method for detecting flaws on a diffractive surface such as a reticle or wafer, includes illuminating a surface to be inspected to generate a first scattered energy angular distribution in response to a flaw on the surface and a second scattered energy angular distribution in response to an unflawed surface; the first and second energy distributions are sensed and the minimum energy detection energy level is established; determining whether the minimum detected energy level is in a first or second predetermined energy range and indicating that no flaw is present when the minimum detected energy level is in the first range and a flaw is present when the minimum detected energy level is in the second range.

Abstract: A surface inspection defect detection and confirmation technique in which a beam of radiation is directed at the surface to be inspected; the radiation scattered from the surface is separately sensed in the near-specular region indicative of a pit and in the far-specular region indicative of a flaw, the near-specular region signal and far-specular region signal are normalized, the near-specular component is discriminated, and the flaw signal is indicated as being a defect and not contamination when there is coincidence between the pit signal and flaw signal.

Abstract: An apparatus and method for uniquely detecting pits on a smooth surface by irradiating an area of the surface; separately sensing radiation scattered from the surface in the near-specular region indicative of a pit and in the far-specular region indicative of a flaw and producing signals representative thereof; normalizing the near-specular signal with respect to the far-specular signal to indicate a pit; and discriminating the near-specular components of the normalized signal representative of surface pits.

Abstract: In the surface inspection apparatus disclosed herein, an elongate array of electro-optical shutters is interposed between a laser beam which scans across the surface to be inspected and a photodetector system which collects light scattered from the surface along the scan line. The shutters are operated in a shifting pattern in synchronism with the scanning means thereby to block unwanted regular signal components.