Patents by Inventor Sergey V Oshemkov

Sergey V Oshemkov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for repairing defected photomasks
    Patent number: 7459242
    Abstract: A system and method for repairing a photomask (52) for use in a photolithography process is disclosed, the photomask (52), consisting of a substrate layer (38) and a chrome layer (36) over the substrate layer (38), having a defect (42) in the chrome layer (36), the method comprising: providing a pulsed laser source (1) for generating an ultra-short pulsed laser beam; providing optical elements for scanning, directing and focusing the pulsed laser beam at a desired target location; directing the pulsed laser beam through the substrate and focusing it on a target location located inside the substrate adjacent the defect (42) to write a diffractive optical element (34), thus changing the scattering properties of the substrate at the target location.
    Type: Grant
    Filed: December 12, 2002
    Date of Patent: December 2, 2008
    Assignee: Pixer Technology Ltd.
    Inventors: Eitan Zait, Vladimir J. Dmitriev, Sergey V Oshemkov, Nikolay N. Guletskiy, Guy Ben-Zvi