Abstract: Masters for imprint processes are produced by providing a resist layer, and patterning the resist layer after a respective mold pattern to produce a patterned resist layer adapted to be directly used as a master for imprint lithography. Preferably the resist is spin cast on a substrate and is comprised of a photoresist, such as negative-tone, electron-beam sensitive resist having a glass transition temperature above 200° C. and adapted to be mechanically stable to pressures up to 104 psi. Preferably, the resist is a polymer resist, such as an epoxy resist e.g. SU8 and SU8-2000. Patterning the resist layer includes the steps of structuring the resist layer, soft-baking the structured resist layer in order to selectively cross-link the structured portion of the structured resist layer and developing the structured resist layer in order to receive a patterned resist layer. The patterned resist layer is preferably cured e.g.

Abstract: A method of making symmetrical mercury cadmium telluride layers by epitaxial growth on a cadmium telluride substrate, performed inside a reactor with two communicating zones, kept at different and controlled temperatures. Growth solution is directly prepared inside the reactor by submitting to a specific thermal cycle a weighed tellurium quantity, a saturating cadmium telluride substrate and a mercury bath.

Abstract: A process for making single-crystal mercury cadmium telluride layers by epitaxial growth on a cadmium telluride substrate, performed inside a reactor with two communication zones, kept at different and controlled temperatures. The growth solution is directly prepared inside the reactor by subjecting weighed cadmium and tellurium quantities and a mercury bath to a specific thermal cycle so that the mercury concentration in the solution is established by absorption from the vapor phase and is controlled by the lower temperature level.

Abstract: Movable stand for lampholders comprising an articulated parallelogram member associated with one end to a supporting base and carrying, at the other end, a lampholder. In order to balance the articulated parallelogram friction means are provided acting on a rod member of the articulated parallelogram. The friction means comprise a pair of shoes, arranged opposite each other and having a substantially mating shape to the shape of the rod member whereon the shoes are acting. The pair of shoes is supported by a pair of leaf springs pivoted at their other ends to an opposite rod member to the rod member whereon the shoes are acting.