Abstract: Devices, systems and methods including a spray chamber are described. In certain examples, the spray chamber may be configured with an outer chamber configured to provide tangential gas flows. In other instances, an inner tube can be positioned within the outer chamber and may comprise a plurality of microchannels. In some examples, the outer chamber may comprise dual gas inlet ports. In some instances, the spray chamber may be configured to provide tangential gas flow and laminar gas flows to prevent droplet formation on surfaces of the spray chamber. Optical emission devices, optical absorption devices and mass spectrometers using the spray chamber are also described.

Abstract: Certain embodiments of ion interfaces are described that can provide higher sensitivities improved ion transmission and multiple operating modes. In some configurations, the ion interface may comprise a first element and a second element each of which can receive a non-zero voltage. In one configuration, the first element can be a hyperskimmer cone and the second element can be a cylindrical lens. Systems and methods using the interface are also described.

Abstract: Devices, systems and methods including a spray chamber are described. In certain examples, the spray chamber may be configured with an outer chamber configured to provide tangential gas flows. In other instances, an inner tube can be positioned within the outer chamber and may comprise a plurality of microchannels. In some examples, the outer chamber may comprise dual gas inlet ports. In some instances, the spray chamber may be configured to provide tangential gas flow and laminar gas flows to prevent droplet formation on surfaces of the spray chamber. Optical emission devices, optical absorption devices and mass spectrometers using the spray chamber are also described.

Abstract: Devices, systems and methods including a spray chamber are described. In certain examples, the spray chamber may be configured with an outer chamber configured to provide tangential gas flows. In other instances, an inner tube can be positioned within the outer chamber and may comprise a plurality of microchannels. In some examples, the outer chamber may comprise dual gas inlet ports. In some instances, the spray chamber may be configured to provide tangential gas flow and laminar gas flows to prevent droplet formation on surfaces of the spray chamber. Optical emission devices, optical absorption devices and mass spectrometers using the spray chamber are also described.

Abstract: Devices, systems and methods including a spray chamber are described. In certain examples, the spray chamber may be configured with an outer chamber configured to provide tangential gas flows. In other instances, an inner tube can be positioned within the outer chamber and may comprise a plurality of microchannels. In some examples, the outer chamber may comprise dual gas inlet ports. In some instances, the spray chamber may be configured to provide tangential gas flow and laminar gas flows to prevent droplet formation on surfaces of the spray chamber. Optical emission devices, optical absorption devices and mass spectrometers using the spray chamber are also described.

Abstract: Devices, systems and methods including a spray chamber are described. In certain examples, the spray chamber may be configured with an outer chamber configured to provide tangential gas flows. In other instances, an inner tube can be positioned within the outer chamber and may comprise a plurality of microchannels. In some examples, the outer chamber may comprise dual gas inlet ports. In some instances, the spray chamber may be configured to provide tangential gas flow and laminar gas flows to prevent droplet formation on surfaces of the spray chamber. Optical emission devices, optical absorption devices and mass spectrometers using the spray chamber are also described.

Abstract: Devices, systems and methods including a spray chamber are described. In certain examples, the spray chamber may be configured with an outer chamber configured to provide tangential gas flows. In other instances, an inner tube can be positioned within the outer chamber and may comprise a plurality of microchannels. In some examples, the outer chamber may comprise dual gas inlet ports. In some instances, the spray chamber may be configured to provide tangential gas flow and laminar gas flows to prevent droplet formation on surfaces of the spray chamber. Optical emission devices, optical absorption devices and mass spectrometers using the spray chamber are also described.

Abstract: Devices, systems and methods including a spray chamber are described. In certain examples, the spray chamber may be configured with an outer chamber configured to provide tangential gas flows. In other instances, an inner tube can be positioned within the outer chamber and may comprise a plurality of microchannels. In some examples, the outer chamber may comprise dual gas inlet ports. In some instances, the spray chamber may be configured to provide tangential gas flow and laminar gas flows to prevent droplet formation on surfaces of the spray chamber. Optical emission devices, optical absorption devices and mass spectrometers using the spray chamber are also described.

Abstract: Certain configurations of a torch are described which can be used to sustain a plasma using lower powers and lower cooling gas flow rates. In some examples, the torch may comprise an inner tube of variable diameter along a longitudinal length with a selected gap between outer surfaces of a terminal end or third section of the inner tube and inner surfaces of the outer tube. The terminal end length and/or gap distance can be selected to sustain a concentric plasma using the torch and one or more induction devices. Methods and systems using the torch are also described.

Abstract: Devices, systems and methods including a spray chamber are described. In certain examples, the spray chamber may be configured with an outer chamber configured to provide tangential gas flows. In other instances, an inner tube can be positioned within the outer chamber and may comprise a plurality of microchannels. In some examples, the outer chamber may comprise dual gas inlet ports. In some instances, the spray chamber may be configured to provide tangential gas flow and laminar gas flows to prevent droplet formation on surfaces of the spray chamber. Optical emission devices, optical absorption devices and mass spectrometers using the spray chamber are also described.

Abstract: A mass spectrometer includes a plurality of guide stages for guiding ions between an ion source and an ion detector along a guide axis. Each of the guide stages is contained within one of a plurality of adjacent chambers. Pressure in each of the plurality of chambers is reduced downstream along the guide axis to guide ions along the axis. Each guide stage may further include a plurality of guide rods for producing a containment filed for containing ions about the guide axis, as they are guided to the detector.

Abstract: A mass spectrometer includes a plurality of guide stages for guiding ions between an ion source and an ion detector along a guide axis. Each of the guide stages is contained within one of a plurality of adjacent chambers. Pressure in each of the plurality of chambers is reduced downstream along the guide axis to guide ions along the axis. Each guide stage may further include a plurality of guide rods for producing a containment filed for containing ions about the guide axis, as they are guided to the detector.

Abstract: An ion source and method for providing ionized particles to a molecular/atomic analyser, such as a mass spectrometer, are disclosed. The ion source includes a vessel defining a channel; a gas inlet extending from the gas source into the channel, for introducing a gas flow into the channel; a sample inlet extending into the channel for introducing sample within the channel; and an ionizer to ionize the sample in the channel. The vessel is sufficiently sealed to allow the channel to be pressurized, at a pressure in excess of 100 Torr. At least one gas source maintains the pressure of the channel at a pressure in excess of 100 Torr and the pressure exterior to the channel at a pressure in excess of 0.1 Torr and provides a gas flow that sweeps across the ionizer to guide and entrain ions from the ionizer to the outlet.

Abstract: An ion source and method for providing ionized particles to a molecular/atomic analyser, such as a mass spectrometer, are disclosed. The ion source includes a vessel defining a channel; a gas inlet extending from the gas source into the channel, for introducing a gas flow into the channel; a sample inlet extending into the channel for introducing sample within the channel; and an ionizer to ionize the sample in the channel. The vessel is sufficiently sealed to allow the channel to be pressurized, at a pressure in excess of 100 Torr. At least one gas source maintains the pressure of the channel at a pressure in excess of 100 Torr and the pressure exterior to the channel at a pressure in excess of 0.1 Torr and provides a gas flow that sweeps across the ionizer to guide and entrain ions from the ionizer to the outlet.