Patents by Inventor Serhiy Danylyuk

Serhiy Danylyuk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10067074
    Abstract: A lithographic manufacturing system produces periodic structures with feature sizes less than 10 nm and a direction of periodicity (D). A beam of radiation (1904) having a range of wavelengths in the EUV spectrum (1-100 nm or 1-150 nm) is focused into a spot (S) of around 5 ?m diameter. Reflected radiation (1908) is broken into a spectrum (1910) which is captured (1913) to obtain a target spectrum signal (ST). A reference spectrum is detected (1914) to obtain a reference spectrum signal (SR). Optionally a detector (1950) is provided to obtain a further spectrum signal (SF) using radiation diffracted at first order by the grating structure of the target. The angle of incidence (?) and azimuthal angle (?) are adjustable. The signals (ST, SR, SF) obtained at one or more angles are used to calculate measured properties of the target, for example CD and overlay.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: September 4, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Quintanilha, Serhiy Danylyuk
  • Publication number: 20160282282
    Abstract: A lithographic manufacturing system produces periodic structures with feature sizes less than 10 nm and a direction of periodicity (D). A beam of radiation (1904) having a range of wavelengths in the EUV spectrum (1-100 nm or 1-150 nm) is focused into a spot (S) of around 5 ?m diameter. Reflected radiation (1908) is broken into a spectrum (1910) which is captured (1913) to obtain a target spectrum signal (ST). A reference spectrum is detected (1914) to obtain a reference spectrum signal (SR). Optionally a detector (1950) is provided to obtain a further spectrum signal (SF) using radiation diffracted at first order by the grating structure of the target. The angle of incidence (?) and azimuthal angle (?) are adjustable. The signals (ST, SR, SF) obtained at one or more angles are used to calculate measured properties of the target, for example CD and overlay.
    Type: Application
    Filed: March 24, 2016
    Publication date: September 29, 2016
    Applicants: ASML Netherlands B.V., RWTH Aachen University
    Inventors: Richard QUINTANILHA, Serhiy DANYLYUK
  • Patent number: 8410792
    Abstract: A resonator arrangement has a conductive, semi-open outer housing, at an interior of which a conductive bar is provided disposed coaxially to the housing. At one end of the bar in a direction of a housing bottom, the bar has a die and, together with a dielectric and the housing bottom, forms a capacitor. The bar is short-circuited to the housing at another end, so that the bar and housing together form an LC oscillator circuit. Also disclosed is a method for analyzing a sample using a resonator arrangement.
    Type: Grant
    Filed: March 1, 2010
    Date of Patent: April 2, 2013
    Assignee: Forschungszentrum Juelich GmbH
    Inventors: Norbert Klein, Svetlana Vitusevich, Serhiy Danylyuk
  • Publication number: 20100327996
    Abstract: A resonator arrangement has a conductive, semi-open outer housing, at an interior of which a conductive bar is provided disposed coaxially to the housing. At one end of the bar in a direction of a housing bottom, the bar has a die and, together with a dielectric and the housing bottom, forms a capacitor. The bar is short-circuited to the housing at another end, so that the bar and housing together form an LC oscillator circuit. Also disclosed is a method for analyzing a sample using a resonator arrangement.
    Type: Application
    Filed: March 1, 2010
    Publication date: December 30, 2010
    Applicant: Forschungszentrum Juelich GmbH
    Inventors: Norbert Klein, Svetlana Vitusevich, Serhiy Danylyuk