Patents by Inventor Serpil Gönen

Serpil Gönen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Programmable photolithographic mask based on semiconductor nano-particle optical modulators
    Patent number: 7605390
    Abstract: Nano-particles are provided with control circuitry to form a programmable mask. The optical characteristics of the nano-particles change to provide patterned light. Such patterned light can be used for example to expose a photoresist on a semiconductor wafer for photolithography.
    Type: Grant
    Filed: December 9, 2003
    Date of Patent: October 20, 2009
    Assignee: Pixelligent Technologies LLC
    Inventors: Zhiyun Chen, Gregory D. Cooper, Serpil Gönen, Erin F. Fleet
  • Reversible photobleachable materials based on nano-sized semiconductor particles and their optical applications
    Patent number: 7510818
    Abstract: Semiconductor nano-particles, due to their specific physical properties, can be used as reversible photo-bleachable materials for a wide spectrum, from far infrared to deep UV. Applications include, reversible contrast enhancement layer (R-CEL) in optical lithography, lithography mask inspection and writing and optical storage technologies.
    Type: Grant
    Filed: December 9, 2003
    Date of Patent: March 31, 2009
    Assignee: Pixelligent Technologies LLC
    Inventors: Zhiyun Chen, Erin F. Fleet, Serpil Gönen, Gregory D. Cooper