Abstract: The present invention provides an apparatus of processing a substrate. The apparatus of processing a substrate includes: a chamber providing a treatment space; a substrate supporting unit provided in the treatment space; a gas supply unit introducing gas into the treatment space; a plasma source providing energy that excites the gas introduced in the treatment space using plasma; an exhaust unit exhausting an atmosphere in the treatment space out of the treatment space; and a laser emission unit disposed above the supporting unit and emitting a laser beam to a substrate placed on the supporting unit, wherein the laser emission unit includes: a laser source generating the laser beam; and a Digital Micro-mirror Device (DMD) unit that is a light modulation unit modulating the laser beam generated from the laser source, wherein the DMD unit includes: micromirrors provided to be rotatable; and a board substrate on which the micromirrors are installed.

Abstract: The present invention provides a substrate treatment method. The substrate processing method includes: a processing liquid supply step of supplying processing liquid to a substrate; and a heating step of heating a specific area of the substrate by emitting a laser beam, which is generated from a laser source, to the substrate, wherein the heating step may include: a laser modulation step of modulating the laser beam using a light modulation unit; and a laser emission step of emitting the laser beam modulated by the light modulation unit to the specific area.

Abstract: The present invention provides a substrate processing apparatus. The substrate processing apparatus includes: a supporting unit supporting a substrate; a laser emission assembly emitting a laser to the substrate, wherein the laser emission assembly includes: a laser source generating a laser; and a plurality of laser emission modules, the laser emission modules each include: a light modulation unit modulating distribution of a laser generated by the laser source; and an imaging unit adjusting and emitting the laser modulated by the light modulation unit to the substrate to correspond to an area to which the laser is emitted, an entire region that needs to be heated on the substrate is composed of a plurality of unit emission regions, and the plurality of laser emission modules are arranged to be able to emit the laser respectively to the different unit emission regions of the substrate supported on the supporting unit.

Abstract: A laser output device includes: a laser oscillator for oscillating a source laser pulse; a pulse extender for temporally extending the source laser pulse oscillated by the laser oscillator; an amplifier for amplifying the laser pulse temporally extended by the pulse extender; the laser pulse filter for filtering a pre-pulse and a post-pulse contained in the amplified laser pulse; and a pulse compressor for temporally compressing the laser pulse which has passed through the laser pulse filter.

Abstract: A laser amplifier capable of achieving a high output by offsetting distortion of an amplified laser beam. The laser amplifier includes: first and second amplification media which amplify a penetrating laser beam; a pre-compensation lens unit which pre-compensates for a laser beam irradiated to the first amplification medium so as to offset a thermal lensing effect generated in the first amplification medium and the second amplification medium; a first polarizing and penetrating mirror inclined to the laser beam irradiated to a front end of the first amplification medium and allowing a laser beam that vibrates in a specific direction to penetrate and reflecting a laser beam that vibrates in another direction; a polarization conversion plate provided at a rear side of the second amplification medium and changing a vibration direction of the laser beam penetrating the second amplification medium; and a first reflection mirror for reflecting a laser beam.