Patents by Inventor Seth J. Greenberg

Seth J. Greenberg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6465153
    Abstract: Advantageous methodologies are disclosed for embedding periodic patterns in optical waveguide elements such as optical fibers. Polarization independence in an elongated waist region of a coupler can be established by measuring polarization characteristics during fusion and elongation, and controlling the heating and stretching to impart a cross-sectional shape, such as a hybrid dumbbell-ellipsoid produces a polarization insensitive drop wavelength. Alternatively, or additionally, polarization dependence can be minimized by angular deformation of the elements along its light transmissive axis. In addition, an element of relatively low photosensitivity is held in an hydrogen or deuterium environment pressurized to about 1000 to 5000 psi. While the environment is pressurized, a scanning UV beam is transmitted through a photomask and impinges on the coupler waist. In writing the grating, the in-diffused gas is constantly replenished, enabling the grating to grow.
    Type: Grant
    Filed: October 31, 2000
    Date of Patent: October 15, 2002
    Assignee: Arroyo Optics, Inc.
    Inventors: Anthony S. Kewitsch, George A. Rakuljic, Doruk Engin, Seth J. Greenberg, Phil A. Willems, Xiaolin Tong
  • Patent number: 6169830
    Abstract: Advantageous methodologies are disclosed for embedding periodic patterns in optical waveguide elements such as optical fibers. Polarization independence in an elongated waist region of an add/drop coupler can be established by measuring polarization characteristics during fusion and elongation, and controlling the elongation to impart a cross-sectional shape, such as a hybrid dumbbell-ellipsoid. Polarization dependence can also be minimized by angular deformation of the elements along the light transmissive axis. To write a pattern, an element having potential photosensitivity is markedly photosensitized in a hydrogen or deuterium environment pressurized to about 1000 to 5000 psi and a scanning UV beam that is transmitted through a photo mask and impinges on the coupler waist as the in-diffused gas is constantly replenished.
    Type: Grant
    Filed: August 4, 1998
    Date of Patent: January 2, 2001
    Assignee: Arroyo Optics, Inc.
    Inventors: Anthony S. Kewitsch, George A. Rakuljic, Doruk Engin, Seth J. Greenberg, Phil A. Willems, Xiaolin Tong