Abstract: This disclosure describes systems, methods, and devices related to shifting layouts of electronic circuit vias during optical proximity corrections (OPC). A method may include identifying a first metal line, of an electronic circuit, drawn at a first position; identifying a second metal line, of the electronic circuit, drawn at a second position; identifying a via drawn at a third position extending between the first metal line and the second metal line; determining a fourth position to which the first metal line is to move from the first position; determining a fifth position to which the second metal line is to move from the second position; determining, based on the fourth position, the fifth position, a sixth position to which the via is to move from third position; and generating a layout for generating a photomask for the via at the sixth position.