Patents by Inventor Setsuo Kaneko

Setsuo Kaneko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110090412
    Abstract: To provide an erasing device whose power consumption required for erasing operations is suppressed, which does not spoil the portability of an optical writing type display medium. In a first display function layer, voltages applied to two cholesteric liquid crystal layers when an erasing voltage is applied between a pair of electrodes are defined as V1, V2, respectively, and threshold voltages with which the cholesteric liquid crystal layers change to the homeotropic alignment are defined as Vth1, Vth2, respectively. In that case, in a state the voltages V1 and V2 are determined according to only each resistance of the cholesteric liquid crystal layers and resistance of a photoconductive layer, i.e., a sufficient time has passed from a point at which the erasing voltage is applied, V1?Vth1 and V2?Vth2 apply.
    Type: Application
    Filed: October 19, 2010
    Publication date: April 21, 2011
    Applicant: NEC LCD Technologies, Ltd.
    Inventors: Kenichi Mori, Tetsushi Satou, Koji Shigemura, Setsuo Kaneko
  • Patent number: 7678454
    Abstract: In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
    Type: Grant
    Filed: October 30, 2007
    Date of Patent: March 16, 2010
    Assignee: NEC Corporation
    Inventors: Shin-Ichi Uehara, Yuko Sato, Ken Sumiyoshi, Setsuo Kaneko, Jin Matsushima
  • Patent number: 7643100
    Abstract: In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
    Type: Grant
    Filed: October 30, 2007
    Date of Patent: January 5, 2010
    Assignee: NEC Corporation
    Inventors: Shin-Ichi Uehara, Yuko Sato, Ken Sumiyoshi, Setsuo Kaneko, Jin Matsushima
  • Publication number: 20090251626
    Abstract: To provide a structure and a manufacturing method which can manufacture, at a low cost and with good yield, a liquid crystal display panel having a lenticular lens and a substrate formed in a unified manner. When forming a lenticular lens onto a mother CF substrate by using a wet etching method, substrates are dipped into an etching solution while being raised up in such a manner that the length direction of slit openings of a mask is aligned with a vertical direction and an area having no mask pattern comes on a bottom side. With this, the residuals generated due to glass impurities can be drained towards the lower side along the lenticular lens shape to be discharged to the flat area, which makes it possible to suppress deterioration in the etching processed shape.
    Type: Application
    Filed: April 3, 2009
    Publication date: October 8, 2009
    Applicant: NEC LCD Technologies, Ltd..
    Inventors: Hiroshi OKUMURA, Setsuo KANEKO
  • Patent number: 7525732
    Abstract: In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
    Type: Grant
    Filed: August 23, 2007
    Date of Patent: April 28, 2009
    Assignee: NEC Corporation
    Inventors: Shin-ichi Uehara, Yuko Sato, Ken Sumiyoshi, Setsuo Kaneko, Jin Matsushima
  • Patent number: 7393554
    Abstract: In a method for manufacturing a flexible-type luminescent device, a flexible body is supplied from a flexible body supplying section to a luminescent material pattern forming section. Then, a luminescent material pattern is formed on the flexible body in the luminescent material pattern forming section. Finally, the flexible body is fed from the luminescent material pattern forming section to a flexible body receiving section.
    Type: Grant
    Filed: October 22, 2002
    Date of Patent: July 1, 2008
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Kazuhiko Hayashi, Setsuo Kaneko
  • Publication number: 20080088568
    Abstract: Disclosed is a display device for use of a surface display of an arbitrary shape, including a plural number of display element units, each made up of a circuit that forms a single stage of a scanning circuit and a pixel circuit connected to an output of the scanning circuit, are arranged in a unicursal fashion on a display substrate.
    Type: Application
    Filed: October 12, 2007
    Publication date: April 17, 2008
    Applicant: NEC LCD TECHNOLOGIES, LTD
    Inventors: Hiroshi Haga, Hideki Asada, Setsuo Kaneko
  • Publication number: 20080074564
    Abstract: In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
    Type: Application
    Filed: October 30, 2007
    Publication date: March 27, 2008
    Applicant: NEC CORPORATION
    Inventors: Shin-Ichi UEHARA, Yuko Sato, Ken Sumiyoshi, Setsuo Kaneko, Jin Matsushima
  • Publication number: 20080057731
    Abstract: In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
    Type: Application
    Filed: October 30, 2007
    Publication date: March 6, 2008
    Applicant: NEC CORPORATION
    Inventors: Shinichi UEHARA, Yuko Sato, Ken Sumiyoshi, Setsuo Kaneko, Jin Matsushima
  • Patent number: 7329611
    Abstract: In a formation method for forming a fine structure in a workpiece containing an etching control component, using an isotropic etching process, a mask having an opening is applied to the workpiece, and the workpiece is etched with an etching solution to thereby form a recess, corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
    Type: Grant
    Filed: April 10, 2003
    Date of Patent: February 12, 2008
    Assignee: NEC Corporation
    Inventors: Shinichi Uehara, Yuko Sato, Ken Sumiyoshi, Setsuo Kaneko, Jin Matsushima
  • Publication number: 20070291370
    Abstract: In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
    Type: Application
    Filed: August 23, 2007
    Publication date: December 20, 2007
    Applicant: NEC CORPORATION
    Inventors: Shinichi UEHARA, Yuko Sato, Ken Sumiyoshi, Setsuo Kaneko, Jin Matsushima
  • Publication number: 20070222915
    Abstract: A plurality of pixels is arranged periodically in the x-axis direction and the y-axis direction in the display panel of a display device, and because light is blocked by the portion other than the open part in each pixel, the display panel has a two-dimensional lattice structure. The pixels are rectangular, and the length Px of the long edges in the x direction is larger than the length Py of the short edges in the y direction. A louver, in which transparent regions and non-transparent regions are arranged periodically in a one-dimensional direction, is provided on the display panel, and the angle formed by the x axis and the one-dimensional period direction of the louver is 45 degrees or less, and preferably 10 degrees or less. This configuration makes it possible to obtain an optical element having high directivity, reduced moiré, and high transmittance. It is also possible to obtain a display device having excellent display quality into which the optical element is incorporated.
    Type: Application
    Filed: March 19, 2007
    Publication date: September 27, 2007
    Applicants: NEC CORPORATION, NEC LCD TECHNOLOGIES, LTD.
    Inventors: Shinya NIIOKA, Shin-ichi Uehara, Ken Sumiyoshi, Setsuo Kaneko
  • Publication number: 20050156811
    Abstract: In a display system in which display units with two screens are combined, suppressing an enlargement of the display system and suppressing a cost increase. There are provided one display unit formed on one insulating substrate, another display unit formed on another insulating substrate, and a circuit module for outputting display driving signals. The size of the other display unit is set to be smaller than that of the one display unit. The circuit module is formed on the one insulating substrate, and outputs the display driving signals to the one display device and to the other display device, respectively.
    Type: Application
    Filed: November 12, 2004
    Publication date: July 21, 2005
    Inventors: Naoyasu Ikeda, Hideki Asada, Setsuo Kaneko
  • Patent number: 6840647
    Abstract: A lighting device includes (a) an electroluminescence device which acts as a light source, and (b) an optical conductor which introduces a light emitted from the electroluminescence device, to a liquid crystal display device. The electroluminescence device is formed on an end surface of the optical conductor. The lighting device may be used as a backlight source in a liquid crystal display device.
    Type: Grant
    Filed: November 23, 2001
    Date of Patent: January 11, 2005
    Assignee: NEC Corporation
    Inventors: Kazuhiko Hayashi, Ichiro Fujieda, Atsushi Oda, Setsuo Kaneko
  • Publication number: 20040165264
    Abstract: A three-dimensional image display device is provided with a display panel. The display panel is provided with a plurality of pixels for the right eyes and pixels for the left eye, and light emitted from the pixels for the right eye is made incident to the right eye of a viewer and light emitted from the pixels for the left eye is made incident to the left eye. Then, when the distance between the display panel and the viewer is set to D (mm), definition X (dpi) of at least one of a vertical direction and a horizontal direction on a display plane of the display panel is set as in the following expression. 1 X ≥ 25.
    Type: Application
    Filed: February 23, 2004
    Publication date: August 26, 2004
    Applicant: NEC CORPORATION
    Inventors: Shin-ichi Uehara, Masao Imai, Nobuaki Takanashi, Setsuo Kaneko
  • Publication number: 20040060515
    Abstract: In a manufacturing technology for forming a thin film transistor comprising a laser irradiation step, objects of the present invention are to obtain a high performance and multifunction semiconductor manufacturing apparatus and thin film transistor manufacturing method. A silicon thin film 2001 is formed on a glass substrate 202, and laser 203 is irradiated onto this thin film 201 whereby a re-crystallization film is obtained. This re-crystallization film undergoes a hydrogen plasma processing so that dangling-bonds of silicon are terminated. Moreover, a step for forming a silicon dioxide film 205 on the re-crystallization film is included. These steps are performed under the conditions that the glass substrate 202 is not exposed to the air and a processing temperature is 350° C. or less.
    Type: Application
    Filed: October 1, 2003
    Publication date: April 1, 2004
    Applicant: NEC CORPORATION
    Inventors: Hiroshi Tanabe, Setsuo Kaneko
  • Publication number: 20030228759
    Abstract: In a formation method for forming a fine structure in a workpiece containing an etching control component, using an isotropic etching process, a mask having an opening is applied to the workpiece, and the workpiece is etched with an etching solution to thereby form a recess, corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
    Type: Application
    Filed: April 10, 2003
    Publication date: December 11, 2003
    Inventors: Shinichi Uehara, Yuko Sato, Ken Sumiyoshi, Setsuo Kaneko, Jin Matsushima
  • Patent number: 6657154
    Abstract: In a manufacturing technology for forming a thin film transistor comprising a laser irradiation step, objects of the present invention are to obtain a high performance and multifunction semiconductor manufacturing apparatus and thin film transistor manufacturing method. A silicon thin film 201 is formed on a glass substrate 202, and laser 203 is irradiated onto this thin film 201 whereby a re-crystallization film is obtained. This re-crystallization film undergoes a hydrogen plasma processing so that dangling-bonds of silicon are terminated. Moreover, a step for forming a silicon dioxide film 205 on the re-crystallization film is included. These steps are performed under the conditions that the glass substrate 202 is not exposed to the air and a processing temperature is 350° C. or less.
    Type: Grant
    Filed: May 30, 1997
    Date of Patent: December 2, 2003
    Assignee: NEC Corporation
    Inventors: Hiroshi Tanabe, Setsuo Kaneko
  • Publication number: 20030082984
    Abstract: In a method for manufacturing a flexible-type luminescent device, a flexible body is supplied from a flexible body supplying section to a luminescent material pattern forming section. Then, a luminescent material pattern is formed on the flexible body in the luminescent material pattern forming section. Finally, the flexible body is fed from the luminescent material pattern forming section to a flexible body receiving section.
    Type: Application
    Filed: October 22, 2002
    Publication date: May 1, 2003
    Applicant: NEC Corporation
    Inventors: Kazuhiko Hayashi, Setsuo Kaneko
  • Publication number: 20020101729
    Abstract: A lighting device includes (a) an electroluminescence device which acts as a light source, and (b) an optical conductor which introduces a light emitted from the electroluminescence device, to a liquid crystal display device. The electroluminescence device is formed on an end surface of the optical conductor. The lighting device may be used as a backlight source in a liquid crystal display device.
    Type: Application
    Filed: November 23, 2001
    Publication date: August 1, 2002
    Applicant: NEC Corporation
    Inventors: Kazuhiko Hayashi, Ichiro Fujieda, Atsushi Oda, Setsuo Kaneko