Abstract: A testing apparatus using a scanning electron microscope for enabling tests and measurements on any part of a test subject in a nondestructive way without being limited by a size of the test subject, which is, a testing apparatus 1 using a scanning electron microscope for performing tests and measurements on any part of a test subject in a nondestructive way by using a scanning electron microscope 6a, comprising a local vacuum formation portion 9 for forming a local vacuum region by blocking around a part to be tested of the test subject from the outside air, wherein the local vacuum formation portion comprises an exhaust portion for exhausting to form a partial vacuum region, a float means 14 for floating the whole local vacuum formation portion above the test subject by emitting a compressed gas to an outer circumference portion of the local vacuum formation portion and a length measuring means 16 for measuring a distance between the test subject and the local vacuum formation portion for controlling floati

Abstract: A method of quickly and accurately inspecting the stitching accuracy at which regions of a lithographic pattern are stitched at boundaries. The numerous regions of the lithographic pattern are exposed or delineated, one at a time. Inspected regions are scanned with a charged-particle beam to detect secondary electrons. The obtained signal is stored as an inspected image in an image memory, together with positional data about the inspected regions. After completion of acceptance of images from all the inspected regions, the inspected image is compared with a separately prepared reference image by an image processing unit. Pattern elements in the inspected regions corresponding to the reference image are extracted. Deviations at field boundaries or the like can be detected from the relative positions of these pattern elements, if any.

Abstract: An electron beam irradiation system has a pumping block at an end of a microscope column of electron optics. The system has the rotary stage, the microscope column for directing an electron beam at the target on the rotary stage, the pumping block for evacuating air in the gap between the column and the target, a moving mechanism for sliding the rotary stage between a working position and a mounting position, and a cover member. In the working position, the target is opposite to the column. The cover member is brought into intimate contact with the rotary stage or target to prevent vacuum deterioration when the rotary stage moves from the working position to the mounting position.

Abstract: A testing apparatus using a scanning electron microscope for enabling tests and measurements on any part of a test subject in a nondestructive way without being limited by a size of the test subject, which is, a testing apparatus 1 using a scanning electron microscope for performing tests and measurements on any part of a test subject in a nondestructive way by using a scanning electron microscope 6a, comprising a local vacuum formation portion 9 for forming a local vacuum region by blocking around a part to be tested of the test subject from the outside air, wherein the local vacuum formation portion comprises an exhaust portion for exhausting to form a partial vacuum region, a float means 14 for floating the whole local vacuum formation portion above the test subject by emitting a compressed gas to an outer circumference portion of the local vacuum formation portion and a length measuring means 16 for measuring a distance between the test subject and the local vacuum formation portion for controlling floati

Abstract: An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18.

Abstract: An electron beam irradiation system for shooting an electron beam at a master disk to make recordings. This system is capable of focusing the beam easily and accurately in a corresponding manner to the master disk, thus permitting accurate recordings. The system has a support mechanism portion holding the master disk on it. The support mechanism portion has a slide table on which a focusing stage is placed. The focusing stage has a knife edge and a Faraday cup. The knife edge is located immediately beside the master disk. When recordings are made, an electron beam is first shot at the focusing stage and brought to focus. Then, the beam is shot at the master disk, thus making recordings.

Abstract: An electron beam irradiation system for shooting an electron beam at a master disk to make recordings. This system is capable of focusing the beam easily and accurately in a corresponding manner to the master disk, thus permitting accurate recordings. The system has a support mechanism portion holding the master disk on it. The support mechanism portion has a slide table on which a focusing stage is placed. The focusing stage has a knife edge and a Faraday cup. The knife edge is located immediately beside the master disk. When recordings are made, an electron beam is first shot at the focusing stage and brought to focus. Then, the beam is shot at the master disk, thus making recordings.

Abstract: An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18.

Abstract: An electron beam irradiation system has a pumping block at an end of a microscope column of electron optics. The system has the rotary stage, the microscope column for directing an electron beam at the target on the rotary stage, the pumping block for evacuating air in the gap between the column and the target, a moving mechanism for sliding the rotary stage between a working position and a mounting position, and a cover member. In the working position, the target is opposite to the column. The cover member is brought into intimate contact with the rotary stage or target to prevent vacuum deterioration when the rotary stage moves from the working position to the mounting position.

Abstract: A method of quickly and accurately inspecting the stitching accuracy at which regions of a lithographic pattern are stitched at boundaries. The numerous regions of the lithographic pattern are exposed or delineated, one at a time. Inspected regions are scanned with a charged-particle beam to detect secondary electrons. The obtained signal is stored as an inspected image in an image memory, together with positional data about the inspected regions. After completion of acceptance of images from all the inspected regions, the inspected image is compared with a separately prepared reference image by an image processing unit. Pattern elements in the inspected regions corresponding to the reference image are extracted. Deviations at field boundaries or the like can be detected from the relative positions of these pattern elements, if any.

Abstract: A method of quite efficiently analyzing contaminants such as dust on a semiconductor material with a scanning electron microscope. The instrument holds a list of data about contaminants. The operator selects desired items from the list and marks them to register them in a registered contaminant data table. Then, he establishes illumination conditions used for analysis and starts x-ray analysis. A secondary electron image of any contaminant of interest is displayed on a CRT at a magnification corresponding to the dimensions of the contaminant. The dimensions are retrieved from the data table. All addresses of a frame memory are searched. According to the results, the coordinates of the position of the contaminant are measured. The difference between the central position of the viewing screen of the CRT and the coordinate of the contaminant is calculated for each direction. The calculated differences are sent either to a specimen stage-driving mechanism or to an image shift power supply.

Abstract: A condenser means for focusing an electron beam onto a specimen and a scanning means for scanning the beam in two dimensions on the specimen placed inside a specimen chamber are disposed inside an electron beam column. The top portion of the specimem chamber is connected with the column by an annular member of a high magnetic permeability which surrounds the column. Magnetic flux passed through the top wall of the chamber is made to penetrate the annular member of a high magnetic permeability. The flux is then caused to enter the portion of the upper wall remote from the column, after which the flux leaks out. Thus, leakage of the magnetic flux into the specimem chamber is prevented.

Abstract: In a field emission gun, current intensity of the electron beam passing through the gun anode contains a fluctuation component due to the ion bombardment and ion absorption near the emitter tip. For this reason, a scanning electron microscope having a field emission gun usually incorporates a fluctuation compensation device, which generates the signal ratio of the secondary electron signal from a specimen irradiated by the electron beam and the monitor signal corresponding to the current intensity of the electron beam passing through the gun anode and supplies the signal ratio for brightness modulation signal to the scanning image display means of the microscope. However, if the electron beam intensity is varied in a very wide operating range, the conventional fluctuation compensation device cannot operate with enough compensation effect.

Abstract: A converging lens system of the electron beam scanning device incorporates a condenser lens (or lenses), an objective lens and an aperture means being capable of changing the aperture diameter so as to produce an electron beam spot on a specimen and vary the electron beam current on the specimen. The optimum aperture diameter is determined based on the designated electron beam current and the accelerating voltage of the electron beam by means of a data processor, so that the minimum diameter of the electron beam is formed on the specimen.

Abstract: A charged particle beam scanning device is provided with two coordinates conversion circuits. For rotating the scanning direction of the charged particle beam, one of the coordinates conversion circuit is connected between a scanning signal generator and a magnification circuit, the output of which is supplied to a deflecting means for scanning the charged particle beam over the specimen surface, as in the case of a conventional device. Another coordinates conversion circuit is used for keeping independent operation of the image rotation and the image shift. This coordinates conversion circuit converts the output signal of a d.c. signal generator for image shift, and the converted signal is added to the input signal of the said magnification circuit.

Abstract: A control apparatus according to this invention is installed between an intensity specifying circuit and an excitation current source for a magnetic lens or deflecting coil. The intensity specifying circuit generates a target signal (B) corresponding to the desired magnetic flux density (B) in a magnetic lens or deflecting coil. The excitation current source outputs a current (I) which produces the desired flux density (B). Due to the effects of hysteresis the ferromagnetic yoke adjacent the lens or deflecting coil, the relationship between the target signal (B) and current (I) is nonlinear. The control apparatus has a memory in which data defining the hysteresis characteristics of the lens or coil being controlled has been stored.

Abstract: The relation between the focusing distance (D) of the objective lens and the excitation current (I) of the objective lens is stored in a data memory. The initial focusing distance (D.sub.o) corresponding to the optimum excitation current is determined as a result of the focusing adjustment operation. Thereafter, the change (.DELTA.D) in the focusing distance due to the specimen shift along the optical axis of the objective lens is detected. The magnitude of the excitation current corresponding to the focusing distance (D.sub.o +.alpha.D) is read from said memory and a current of that magnitude is supplied to the objective lens.