Patents by Inventor Setsuo Ogura

Setsuo Ogura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5300798
    Abstract: When a semiconductor integrated circuit device having a wiring structure of three or more layers is hierarchically considered as a collection of a plurality of functional blocks, each functional block is internally connected by wirings in the first wiring layer, in which wirings have their main extended direction prescribed to be the X-direction, and wirings in the second wiring layer, in which wirings have their main extended direction prescribed to be the Y-direction, formed over the first wiring layer. Wirings in the third wiring layer, in which wirings have their main extended direction prescribed to be the same as the wirings in the second wiring layer, formed over the second wiring layer, together with wirings in the first and second wiring layer, are used as signal wirings between functional blocks, while the wirings in the third wiring layer are used as power supply wirings for providing power supply to functional blocks.
    Type: Grant
    Filed: November 17, 1992
    Date of Patent: April 5, 1994
    Assignees: Hitachi, Ltd., Hitachi Microcomputer System, Ltd., Hitachi Tobu Semiconductor, Ltd., Hitachi Communication Systems, Incorporated
    Inventors: Kouichi Yamazaki, Setsuo Ogura, Kazuyuki Kamegaki, Kenya Yamauchi, Yukinori Kitamura, Tuyoshi Nagase
  • Patent number: 5132806
    Abstract: Disclosed is a novel semiconductor integrated circuit device for use in a color VTR (Video Tape Recorder). Concretely, the semiconductor integrated circuit device comprises a substantially rectangular semiconductor chip which has a principal surface, a luminance signal processing unit and a color signal processing unit which are disposed at the positions of the principal surface opposing to each other, and a semiconductor region which is provided in the interspace of the principal surface between the luminance signal and color signal processing units opposing to each other and which is supplied with a bias stable A.C.-wise. Further, the semiconductor region is located substantially at the central portion of the semiconductor chip and is extended so as to intersect with one set of opposing sides of the rectangular semiconductor chip.
    Type: Grant
    Filed: June 15, 1990
    Date of Patent: July 21, 1992
    Assignees: Hitachi, Ltd., Hitachi Microcomputer
    Inventors: Yukinori Kitamura, Setsuo Ogura, Shiro Mayuzumi, Shunji Mori, Toshiyuki Fukamachi, Yuji Kobayashi, Kouichi Yamazaki, Makoto Furihata, Kazuyuki Kamegaki
  • Patent number: 4857987
    Abstract: Herein disclosed is a semiconductor device including a plurality of IIL elements which are electrically connected by a plurality of first wirings arranged generally parallel with one another and a plurality of second wirings arranged generally parallel with one another and extended in different direction to the first wirings.
    Type: Grant
    Filed: September 19, 1988
    Date of Patent: August 15, 1989
    Assignees: Hitachi, Ltd., Hitachi Microcomputer Engineering Ltd.
    Inventors: Setsuo Ogura, Kazuyuki Kamegaki, Kouichi Yamazaki, Hideo Miyazaki, Yukinori Kitamura, Shirou Mayuzumi
  • Patent number: 4804940
    Abstract: A resistor is provided with a plurality of turn parts whose corners have an obtuse flexional angle in order to improve the relative resistance precision. A ladder resistor can be formed with a plurality of such resistors connected in series, and various electronic devices are formed employing the ladder resistor.
    Type: Grant
    Filed: March 25, 1986
    Date of Patent: February 14, 1989
    Assignees: Hitachi, Ltd., Hitachi Microcomputer Eng.
    Inventors: Akira Takigawa, Shizuo Kondo, Masumi Kasahara, Toshinori Hirashima, Mikio Haijima, Setsuo Ogura, Osamu Takada, Yoshiki Akamatsu
  • Patent number: 4725745
    Abstract: An integrated programmable logic array formed within a single silicon chip comprises a combination of a logical product gate array and a logical summation gate array. The logical product gate array is equipped with a plurality of MIS field-effect transistors whose gates are selectively driven by a plurality of input signals. Source-drain paths of these transistors are connected in series. The logical summation gate array is equipped with a plurality of inverted bipolar transistors having collector-emitter paths which are connected in parallel.
    Type: Grant
    Filed: August 22, 1984
    Date of Patent: February 16, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Shizuo Kondo, Setsuo Ogura, Eiji Minamimura, Makoto Furihata
  • Patent number: 4697102
    Abstract: A logic circuit is provided which includes a first multi-emitter transistor with its emitters coupled to a group of first input lines and a first transistor with its base coupled to the collector of said first multi-emitter transistor. A second transistor is also provided with its base coupled to the collector of said first transistor, said second transistor having a polarity opposite to that of said first multi-emitter transistor. A second multi-emitter transistor is connected with its base coupled to the collector of said second transistor and with its emitters coupled to a group of second input lines, and a third transistor is connected with its base coupled to the collector of said second multi-emitter transistor and with its collector coupled to an output line. The collector of said first multi-emitter transistor is coupled to the emitter of said second multi-emitter transistor in order to absorb minority carriers stored in the transistors. This feature significantly improves the circuit operating speed.
    Type: Grant
    Filed: May 28, 1985
    Date of Patent: September 29, 1987
    Assignees: Hitachi Microcomputer Engineering Co., Ltd., Hitachi, Ltd.
    Inventors: Takahiro Okabe, Makoto Hayashi, Katuhiro Morisuye, Tomoyuki Watanabe, Katsuyoshi Washio, Setsuo Ogura, Makoto Furihata, Shizuo Kondo
  • Patent number: 4670859
    Abstract: A logic circuit of a large scale which consumes small amounts of electric power is comprised of a plurality of ROM portions each formed of IIL circuits. Input signal lines are commonly used to transmit input signals to the ROM portions. The plurality of ROM portions are selectively operated by ROM select signals, and outputs corresponding to the input signals are obtained from a selected ROM portion. To select a particular ROM portion out of the plurality of ROM portions, the emitters of inverse npn transistors of IIL circuits constituting the selected ROM portion are rendered to assume ground potential. In the meantime, the emitters of the inverse npn transistors of IIL circuits in the non-selected ROM portions are held in a floating condition. This makes it possible to obtain a logic circuit which consumes small amounts of electric power with a very simple construction since the non-selected ROM portions consume no power.
    Type: Grant
    Filed: February 22, 1985
    Date of Patent: June 2, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Furihata, Setsuo Ogura, Shizuo Kondo, Eiji Minamimura
  • Patent number: 4659947
    Abstract: An integrated programmable logic array formed within a single silicon chip comprises a combination of an NAND or AND gate array and an NOR or OR gate array.The NAND or AND gate array includes a plurality of bipolar transistors which are driven to operate in the forward direction by a plurality of input signals, and a plurality of Schottky barrier diodes provided between the collectors of the bipolar transistors and output signal lines. The NOR or OR gate array includes a plurality of other bipolar transistors which are driven to operate in the backward direction by a plurality of output signals from the NAND or AND gate array.
    Type: Grant
    Filed: October 26, 1984
    Date of Patent: April 21, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Setsuo Ogura, Shizuo Kondo, Eiji Minamimura, Makoto Furihata
  • Patent number: 4543499
    Abstract: A semiconductor integrated circuit includes low voltage operation circuitries such as I.sup.2 L and high voltage operation circuitries operating at a higher voltage than the low voltage operation circuitries. Both of the low and high voltage operation circuitries are implemented in a single semiconductor chip in coexistence with each other. The low voltage operation circuitries are disposed in constant current paths in the high voltage operation circuitries so that the currents once used by the high voltage operation circuits are utilized again by the low voltage operation circuitries. Power dissipation of the whole integrated circuit is thus reduced significantly.
    Type: Grant
    Filed: April 8, 1982
    Date of Patent: September 24, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Kenji Kaneko, Minoru Nagata, Makoto Furihata, Setsuo Ogura, Takahiro Okabe, Mitsuya Sato
  • Patent number: 4536784
    Abstract: A semiconductor device has a diffused layer of a first conductivity type which extends to a buried layer of a second conductivity type, formed in a manner to extend from a part of a surface of a semiconductor layer of the second conductivity type which is epitaxially grown on a semiconductor substrate of the first conductivity type through the buried layer of the second conductivity type. A semiconductor junction capacitance is formed of the diffused layer of the first conductivity type and the buried layer of the second conductivity type, and the concentration of an impurity to be introduced into the buried layer of the second conductivity type is controlled.
    Type: Grant
    Filed: October 13, 1983
    Date of Patent: August 20, 1985
    Assignees: Hitachi, Ltd., Hitachi Microcomputer Engineering Ltd.
    Inventors: Shuzo Nagumo, Setsuo Ogura, Yukinori Kitamura
  • Patent number: 4505766
    Abstract: A semiconductor device has a diffused layer of a first conductivity type which extends to a buried layer of a second conductivity type, formed in a manner to extend from a part of a surface of a semiconductor layer of the second conductivity type which is epitaxially grown on a semiconductor substrate of the first conductivity type through the buried layer of the second conductivity type. A semiconductor junction capacitance is formed of the diffused layer of the first conductivity type and the buried layer of the second conductivity type, and the concentration of an impurity to be introduced into the buried layer of the second conductivity type is controlled.
    Type: Grant
    Filed: May 4, 1983
    Date of Patent: March 19, 1985
    Assignees: Hitachi, Ltd., Hitachi Microcomputer Engineering, Ltd.
    Inventors: Shuzo Nagumo, Setsuo Ogura, Yukinori Kitamura