Patents by Inventor Seulgee JEON

Seulgee JEON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11527399
    Abstract: Provided are a wafer cleaning apparatus based on light irradiation capable of effectively cleaning residue on a wafer without damaging the wafer, and a wafer cleaning system including the cleaning apparatus. The wafer cleaning apparatus is configured to clean residue on the wafer by light irradiation and includes: a light irradiation unit configured to irradiate light onto the wafer during the light irradiation; a wafer processing unit configured accommodate the wafer and to control a position of the wafer such that the light is irradiated onto the wafer during the light irradiation; and a cooling unit configured to cool the wafer after the light irradiation has been completed. The light irradiation unit, the wafer processing unit, and the cooling unit are sequentially arranged in a vertical structure with the light irradiation unit above the wafer processing unit and the wafer processing unit above the cooling unit.
    Type: Grant
    Filed: January 16, 2020
    Date of Patent: December 13, 2022
    Inventors: Byungkwon Cho, Sangjine Park, Yongsun Ko, Seulgee Jeon, Jihoon Jeong, Seongsik Hong
  • Patent number: 11302526
    Abstract: A supercritical drying apparatus and a method of drying a substrate, the apparatus including a drying chamber configured to receive a supercritical fluid and to dry a substrate; a chuck in the drying chamber, the chuck being configured to receive the substrate; and a particle remover in the drying chamber, the particle remover being configured to remove dry particles from the substrate by heating the substrate with radiant heat.
    Type: Grant
    Filed: September 5, 2019
    Date of Patent: April 12, 2022
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sangjine Park, Byung-Kwon Cho, Jihoon Jeong, Youngtak Kim, Yongsun Ko, Seulgee Jeon
  • Publication number: 20200388484
    Abstract: Provided are a wafer cleaning apparatus based on light irradiation capable of effectively cleaning residue on a wafer without damaging the wafer, and a wafer cleaning system including the cleaning apparatus. The wafer cleaning apparatus is configured to clean residue on the wafer by light irradiation and includes: a light irradiation unit configured to irradiate light onto the wafer during the light irradiation; a wafer processing unit configured accommodate the wafer and to control a position of the wafer such that the light is irradiated onto the wafer during the light irradiation; and a cooling unit configured to cool the wafer after the light irradiation has been completed. The light irradiation unit, the wafer processing unit, and the cooling unit are sequentially arranged in a vertical structure with the light irradiation unit above the wafer processing unit and the wafer processing unit above the cooling unit.
    Type: Application
    Filed: January 16, 2020
    Publication date: December 10, 2020
    Inventors: Byungkwon Cho, Sangjine Park, Yongsun Ko, Seulgee Jeon, Jihoon Jeong, Seongsik Hong
  • Publication number: 20200227253
    Abstract: A supercritical drying apparatus and a method of drying a substrate, the apparatus including a drying chamber configured to receive a supercritical fluid and to dry a substrate; a chuck in the drying chamber, the chuck being configured to receive the substrate; and a particle remover in the drying chamber, the particle remover being configured to remove dry particles from the substrate by heating the substrate with radiant heat.
    Type: Application
    Filed: September 5, 2019
    Publication date: July 16, 2020
    Inventors: Sangjine PARK, Byung-Kwon CHO, Jihoon JEONG, Youngtak KIM, Yongsun KO, Seulgee JEON