Patents by Inventor Seung Chul BACK

Seung Chul BACK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Liner and epitaxial reactor comprising same
    Patent number: 12351940
    Abstract: According to an aspect of the present disclosure, there is provided a liner of an epitaxial reactor, including a lower body including an entrance stepped portion which is disposed on an upper end of one side of an outer side surface of the lower body and through which a source gas is introduced, a plurality of lower partitions disposed apart from each other on the entrance stepped portion, an upper body disposed on the lower body to face the lower body and including an entrance cover part forming a flow path which is interposed between the entrance stepped portion and the entrance cover part and through which the source gas is introduced, and a plurality of upper partitions disposed apart from each other on the entrance cover part, wherein the upper partitions are more densely disposed in both side portions than in a central portion of the entrance cover part.
    Type: Grant
    Filed: May 16, 2022
    Date of Patent: July 8, 2025
    Assignee: SK SILTRON CO., LTD.
    Inventors: Se Ri Lee, Seung Chul Back
  • LINER AND EPITAXIAL REACTOR COMPRISING SAME
    Publication number: 20230257903
    Abstract: According to an aspect of the present disclosure, there is provided a liner of an epitaxial reactor, including a lower body including an entrance stepped portion which is disposed on an upper end of one side of an outer side surface of the lower body and through which a source gas is introduced, a plurality of lower partitions disposed apart from each other on the entrance stepped portion, an upper body disposed on the lower body to face the lower body and including an entrance cover part forming a flow path which is interposed between the entrance stepped portion and the entrance cover part and through which the source gas is introduced, and a plurality of upper partitions disposed apart from each other on the entrance cover part, wherein the upper partitions are more densely disposed in both side portions than in a central portion of the entrance cover part.
    Type: Application
    Filed: May 16, 2022
    Publication date: August 17, 2023
    Inventors: Se Ri LEE, Seung Chul BACK