Patents by Inventor Seung Heon KIM

Seung Heon KIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240429555
    Abstract: The present invention relates to a copolymer, a slurry composition using same, a separator, and a secondary battery, the copolymer comprising, relative to 100 weight % of the total weight of the copolymer: 3 weight % to 38 weight % of vinyl acetate-based monomer unit; 57 weight % to 81 weight % of vinyl alcohol-based monomer unit; 0.7 weight % to 18 weight % of acrylate-based monomer unit; 14 weight % to 38 weight % of acrylic acid-based monomer unit; and less than 1 weight % of amine organic compound.
    Type: Application
    Filed: September 30, 2021
    Publication date: December 26, 2024
    Inventors: Go-Eun Lee, Bo-Ok Jang, Jin-Yeong Kim, Seung-Heon Kim, Jun Park, Sae-Wook Oh, Se-Man Kwon
  • Publication number: 20240352168
    Abstract: The present invention relates to a copolymer and core-shell particles, a slurry composition, a separator and a secondary battery which comprise the copolymer, the copolymer comprising, with respect to 100 wt % of the total weight of the copolymer, greater than 5 wt % and less than or equal to 70 wt % of an acrylonitrile-based monomer unit, greater than or equal to 15 wt % and less than 90 wt % of an acrylate-based monomer unit, 1-20 wt % of an acrylamide-based monomer unit, and 1-10 wt % of an acrylic acid-based monomer unit.
    Type: Application
    Filed: October 19, 2021
    Publication date: October 24, 2024
    Inventors: Go-Eun Lee, Bo-Ok Jang, Jin-Yeong Kim, Seung-Heon Kim, Jun Park, Sae-Wook Oh, Se-Man Kwon
  • Publication number: 20240287230
    Abstract: A copolymer and a dispersion using same, the copolymer including two or more monomers selected from among a monomer containing two or more substituted or unsubstituted aromatic rings, a monomer containing a straight-chain or branched aliphatic hydrocarbon having 5 to 22 carbon atoms, and a polar monomer containing any one selected from the group consisting of cyano (CN), pyrrolidone (NC4H6O) and carboxylic acid (COOH).
    Type: Application
    Filed: February 21, 2022
    Publication date: August 29, 2024
    Inventors: Kwang-In KIM, Jin-Ju EOM, Chang-Beom KIM, Se-Man KWON, Si-Jin SONG, Jae-Hee HAN, Seung-Heon KIM, Chan-Su PARK
  • Publication number: 20240030550
    Abstract: The present disclosure relates to a copolymer, which contains: an acrylonitrile-based monomer unit in an amount in a range of greater than 0 wt % and 15 wt % or less; a hydroxyl group (—OH)-containing acrylate-based monomer unit in an amount in a range of greater than 0 wt % and 5 wt % or less; an acrylamide-based monomer unit in an amount in a range of greater than 80 wt % and less than 95 wt %; and an acrylic acid-based monomer unit in an amount in a range of greater than 0 wt % and 15 wt % or less, based on the total weight of the copolymer in an amount of 100 wt %, to a slurry composition containing the copolymer, to a separator, and to a secondary battery.
    Type: Application
    Filed: October 29, 2021
    Publication date: January 25, 2024
    Inventors: Go-Eun LEE, Bo-Ok JANG, Jin-Yeong KIM, Seung-Heon KIM, Jun PARK, Sae-Wook OH, Se-Man KWON
  • Publication number: 20200062995
    Abstract: Disclosed is a low gloss black polyimide film produced from a soluble black polyimide resin composition capable of realizing matte by surface transfer of a support film, without addition of a matting agent. Also provided is a black polyimide film including a stress canceling resin layer and having no curl or distortion. The black polyimide film includes: a stress canceling resin layer; a support film; and a black polyimide resin layer coated on the support film in a flexible manner, wherein low gloss is realized without addition of a matting agent, and the stress canceling resin layer for residual stress cancellation of the black polyimide resin layer is provided on the other surface of the support film.
    Type: Application
    Filed: August 16, 2019
    Publication date: February 27, 2020
    Applicant: KUK DO CHEMICAL CO., LTD.
    Inventors: Bum-Young MYUNG, Seung-Kyun KIM, Joo-Bin KIM, Seung-Heon KIM, Sang-Wan KIM, Ji-Hoon LEE, Yu-Bin KIM
  • Patent number: 9678503
    Abstract: A fail-over system and method relates to a fail-over technology of an equipment server managing a semiconductor fabrication equipment server.
    Type: Grant
    Filed: February 6, 2014
    Date of Patent: June 13, 2017
    Assignee: SK HYNIX INC.
    Inventors: Seung Heon Kim, Jong Young Moon
  • Publication number: 20150066185
    Abstract: A fail-over system and method relates to a fail-over technology of an equipment server managing a semiconductor fabrication equipment server.
    Type: Application
    Filed: February 6, 2014
    Publication date: March 5, 2015
    Applicant: SK HYNIX INC.
    Inventors: Seung Heon KIM, Jong Young MOON