Patents by Inventor Seung Ho Yeon

Seung Ho Yeon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9615129
    Abstract: A method of synchronizing multiple devices with each other is provided. The method includes generating first interworking information corresponding to a first device, transmitting the generated first interworking information to the first device, receiving second interworking information from a second device and if the first interworking information corresponds to the second interworking information, synchronizing the first device with the second device, wherein the second device is configured to display broadcasting related information generated based on a broadcasting schedule provided by a broadcasting transmission apparatus that transmits broadcasting contents to the first device.
    Type: Grant
    Filed: November 16, 2012
    Date of Patent: April 4, 2017
    Assignee: KT Corporation
    Inventors: Joon-Woo Park, Hyun-Sook Kim, Sung-En Park, Seung-Ho Yeon
  • Patent number: 9470978
    Abstract: A passivation layer solution composition is provided. A passivation layer solution composition according to an exemplary embodiment of the present invention includes an organic siloxane resin represented by Chemical Formula 1 below. In Chemical Formula 1, R is at least one substituent selected from a saturated hydrocarbon or an unsaturated hydrocarbon having from 1 to about 25 carbon atoms, and x and y may each independently be from 1 to about 200, and wherein each wavy line indicates a bond to an H atom or to an x siloxane unit or a y siloxane unit, or a bond to an x siloxane unit or a y siloxane unit of another siloxane chain comprising x siloxane units or y siloxane units or a combination thereof.
    Type: Grant
    Filed: October 28, 2014
    Date of Patent: October 18, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Byung Du Ahn, Seung Ho Yeon, Sei-Yong Park, Mi-Hyae Park, Bu Sop Song, Tae Gweon Lee, Jun Hyun Park, Je Hun Lee, Jae Woo Park
  • Patent number: 9188867
    Abstract: A passivation layer solution composition is provided. A passivation layer solution composition according to an exemplary embodiment of the present invention includes an organic siloxane resin represented by Chemical Formula 1 below. In Chemical Formula 1, R is at least one substituent selected from a saturated hydrocarbon or an unsaturated hydrocarbon having from 1 to about 25 carbon atoms, and x and y may each independently be from 1 to about 200, and wherein each wavy line indicates a bond to an H atom or to an x siloxane unit or a y siloxane unit, or a bond to an x siloxane unit or a y siloxane unit of another siloxane chain comprising x siloxane units or y siloxane units or a combination thereof.
    Type: Grant
    Filed: September 3, 2013
    Date of Patent: November 17, 2015
    Assignees: SAMSUNG DISPLAY CO., LTD., SAMSUNG FINE CHEMICALS CO., LTD.
    Inventors: Byung Du Ahn, Seung Ho Yeon, Sei-Yong Park, Mi-Hyae Park, Bu Sop Song, Tae Gweon Lee, Jun Hyun Park, Je Hun Lee, Jae Woo Park
  • Publication number: 20150050597
    Abstract: A passivation layer solution composition is provided A passivation layer solution composition according to an exemplary embodiment of the present invention includes an organic siloxane resin represented by Chemical Formula 1 below. In Chemical Formula 1, R is at least one substituent selected from a saturated hydrocarbon or an unsaturated hydrocarbon having from 1 to about 25 carbon atoms, and x and y may each independently be from 1 to about 200, and wherein each wavy line indicates a bond to an H atom or to an x siloxane unit or a y siloxane unit, or a bond to an x siloxane unit or a y siloxane unit of another siloxane chain comprising x siloxane units or y siloxane units or a combination thereof.
    Type: Application
    Filed: October 28, 2014
    Publication date: February 19, 2015
    Inventors: Byung Du Ahn, Seung Ho Yeon, Sei-Yong Park, Mi-Hyae Park, Bu Sop Song, Tae Gweon Lee, Jun Hyun Park, Je Hun Lee, Jae Woo Park
  • Patent number: 8890139
    Abstract: A passivation layer solution composition is provided. A passivation layer solution composition according to an exemplary embodiment of the present invention includes an organic siloxane resin represented by Chemical Formula 1 below. In Chemical Formula 1, R is at least one substituent selected from a saturated hydrocarbon or an unsaturated hydrocarbon having from 1 to about 25 carbon atoms, and x and y may each independently be from 1 to about 200, and wherein each wavy line indicates a bond to an H atom or to an x siloxane unit or a y siloxane unit, or a bond to an x siloxane unit or a y siloxane unit of another siloxane chain comprising x siloxane units or y siloxane units or a combination thereof.
    Type: Grant
    Filed: June 27, 2012
    Date of Patent: November 18, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventors: Byung Du Ahn, Seung Ho Yeon, Sei-Yong Park, Mi-Hyae Park, Bu Sop Song, Tae Gweon Lee, Jun Hyun Park, Je Hun Lee, Jae Woo Park
  • Publication number: 20140011932
    Abstract: A passivation layer solution composition is provided. A passivation layer solution composition according to an exemplary embodiment of the present invention includes an organic siloxane resin represented by Chemical Formula 1 below. In Chemical Formula 1, R is at least one substituent selected from a saturated hydrocarbon or an unsaturated hydrocarbon having from 1 to about 25 carbon atoms, and x and y may each independently be from 1 to about 200, and wherein each wavy line indicates a bond to an H atom or to an x siloxane unit or a y siloxane unit, or a bond to an x siloxane unit or a y siloxane unit of another siloxane chain comprising x siloxane units or y siloxane units or a combination thereof.
    Type: Application
    Filed: September 3, 2013
    Publication date: January 9, 2014
    Applicant: SAMSUNG DISPLAY CO., LTD.
    Inventors: Byung Du Ahn, Seung Ho Yeon, Sei-Yong Park, Mi-Hyae Park, Bu Sop Song, Tae Gweon Lee, Jun Hyun Park, Je Hun Lee, Jae Woo Park
  • Publication number: 20130099228
    Abstract: A passivation layer solution composition is provided. A passivation layer solution composition according to an exemplary embodiment of the present invention includes an organic siloxane resin represented by Chemical Formula 1 below. In Chemical Formula 1, R is at least one substituent selected from a saturated hydrocarbon or an unsaturated hydrocarbon having from 1 to about 25 carbon atoms, and x and y may each independently be from 1 to about 200, and wherein each wavy line indicates a bond to an H atom or to an x siloxane unit or a y siloxane unit, or a bond to an x siloxane unit or a y siloxane unit of another siloxane chain comprising x siloxane units or y siloxane units or a combination thereof.
    Type: Application
    Filed: June 27, 2012
    Publication date: April 25, 2013
    Inventors: Byung Du Ahn, Seung Ho Yeon, Sei-Yong Park, Mi-Hyae Park, Bu Sop Song, Tae Gweon Lee, Jun Hyun Park, Je Hun Lee, Jae Woo Park
  • Publication number: 20120331514
    Abstract: A method of providing image-associated information by an image-associated information providing apparatus includes receiving broadcasting image information from a mobile device, searching an object that matches the broadcasting image information, extracting image-associated information that matches the found object and transmitting the extracted image-associated information to the mobile device.
    Type: Application
    Filed: June 27, 2012
    Publication date: December 27, 2012
    Applicant: KT CORPORATION
    Inventors: Seung-ho YEON, Tae-seok SUH, Hyung-jin YOON, Myung-soon LEE
  • Patent number: 5302734
    Abstract: The present invention relates to a process for preparing 1,3-disilacyclotutanes by pyrolyzing alkoxytrisilaalkaness at a temperature of from 400.degree. C. to 800.degree. C. at the atmospheric pressure or under the vacuum. This is a new synthetic route of 1,3-disilacyclobutanes which employs readily available starting materials without using alkaline metals or magnesium, affords very good yields, produces very clean product mixtures separable by distillation, and tolerates functionality on silicon.
    Type: Grant
    Filed: June 11, 1992
    Date of Patent: April 12, 1994
    Assignee: Korea Institute of Science and Technology
    Inventors: Il Nam Jung, Gyu-Hwan Lee, Jang-Hwan Hong, Seung Ho Yeon
  • Patent number: 5138080
    Abstract: The invention is concerned with novel polysilamethylenosilane polymers having polysilane-polycarbosilane skeleton which can be prepared in one-step reaction from mixtures of chlorosilaalkanes and organochlorosilanes with alkali metals in one of appropriate solvents or in combination of solvents thereof. Such polysilamethylenosilane polymers are soluble and thermoplastic, and can be pyrolyzed to obtain improved yields of silicon carbide at atmospheric pressure.
    Type: Grant
    Filed: December 23, 1991
    Date of Patent: August 11, 1992
    Assignee: Korea Institute of Science and Technology
    Inventors: Il-Nam Jung, Gyu-Hwan Lee, Seung-Ho Yeon, Mi-Yeon Suk
  • Patent number: 5075477
    Abstract: A novel and improved method for simultaneously producing 2,4,6-trisilaheptane of the following formula (I) and 1,3-disilabutane of the following formula (II), which are the starting material essential for forming silicon polymers: wherein, R is methyl group or chloro group. ##STR1## The method is characterized by reacting silicon and chloromethylsilanes of the following formula (III) at 250.degree. C.-350.degree. C. and in the presence of copper as a catalyst, exclusively or together with cadmium powder as a co-catalyst.
    Type: Grant
    Filed: May 8, 1991
    Date of Patent: December 24, 1991
    Assignee: Korea Institute of Science and Technology
    Inventors: Il Nam Jung, Gyu-Hwan Lee, Seung Ho Yeon, Mi-Yeon Suk