Abstract: Discussed is a a mobile terminal including a communication device to communicate with a cloud server, a display to output an execution screen of an application, a local memory to store data, and a processor to control the communication device, the display, and the local memory. The processor can synchronize data of the application executed on the cloud server and store the synchronized data in the local memory when connected to the cloud server. Further, the processor can continuously execute the application locally at the mobile terminal using the synchronized data of the application when disconnected from the cloud server.

Abstract: A method of manufacturing a semiconductor device includes forming a channel layer on a substrate, forming a mask on the channel layer, surface-treating an exposed surface of the channel layer exposed from the mask, forming an electrode on the exposed surface of the channel layer, and removing the mask. The channel layer includes a two-dimensional material, and the surface-treating of the exposed surface of the channel layer includes surface-treating the exposed surface of the channel layer with HCl.

Abstract: A semiconductor device includes a channel on a substrate, the channel including a two-dimensional (2D) material, a gate insulating layer on a portion of the channel, a gate electrode on the gate insulating layer, first and second contact patterns on respective portions of the channel, the first and second contact patterns including a carbide of a transition metal, and first and second source/drain electrodes on the first and second contact patterns, respectively, and the first and second source/drain electrodes including a metal.

Abstract: A semiconductor device includes a channel on a substrate. The channel includes a 2-dimensional material. A gate insulating layer is on a first portion of the channel. A gate electrode is on a portion of the gate insulating layer. First and second contact patterns are on second portions of the channel, respectively. Each of the first and second contact patterns includes a 2-dimensional material having an intercalation material disposed therein. First and second source/drain electrodes are on the first and second contact patterns, respectively. Each of the first and second source/drain electrodes includes a metal.

Abstract: Disclosed is a method for treating a colitis disease in a subject in need thereof, the method comprising administering a composition comprising Lactobacillus sakei K040706 (Accession No: KCCM11472P) as an active ingredient to the subject in an amount effective in treating the colitis disease.

Abstract: Disclosed is a method for treating a colitis disease in a subject in need thereof, the method comprising administering a composition comprising Lactobacillus sakei K040706 (Accession No: KCCM11472P) as an active ingredient to the subject in an amount effective in treating the colitis disease.

Abstract: The present invention relates to a composition for preventing or treating of colitis comprising Lactobacillus sakei K040706 as an active ingredient. More particularly, the present invention relates to a pharmaceutical composition or a food composition for preventing or treating colitis comprising Lactobacillus sakei K040706 (Accession No: KCCM11472P) as an active ingredient. Since Lactobacillus sakei K040706 of the present invention is capable of enhancing immune function such as increasing intestinal NO production ability and reducing the damage of intestinal tissue, Lactobacillus sakei K040706 may be useful for improving and treating colitis.

Abstract: A method includes providing a semiconductor structure. The semiconductor structure includes a first transistor region, a second transistor region and a silicon dioxide layer on the first transistor region and the second transistor region. A layer of a high-k dielectric material is deposited on the silicon dioxide layer. A layer of a first metal is formed over the second transistor region. The layer of first metal does not cover the first transistor region. After the formation of the layer of the first metal, a layer of a second metal is deposited over the first transistor region and the second transistor region. A first annealing process is performed. The first annealing process initiates a scavenging reaction between the second metal and silicon dioxide from a portion of the silicon dioxide layer on the first transistor region. After the annealing process, a ferroelectric transistor dielectric is formed over the first transistor region.

Abstract: A method includes providing a semiconductor structure. The semiconductor structure includes a first transistor region, a second transistor region and a silicon dioxide layer on the first transistor region and the second transistor region. A layer of a high-k dielectric material is deposited on the silicon dioxide layer. A layer of a first metal is formed over the second transistor region. The layer of first metal does not cover the first transistor region. After the formation of the layer of the first metal, a layer of a second metal is deposited over the first transistor region and the second transistor region. A first annealing process is performed. The first annealing process initiates a scavenging reaction between the second metal and silicon dioxide from a portion of the silicon dioxide layer on the first transistor region. After the annealing process, a ferroelectric transistor dielectric is formed over the first transistor region.

Abstract: An illustrative semiconductor structure described herein includes a substrate including a logic transistor region, a ferroelectric transistor region and an input/output transistor region. A logic transistor is provided at the logic transistor region. The logic transistor includes a gate dielectric and a gate electrode. An input/output transistor is provided at the input/output transistor region. The input/output transistor includes a gate dielectric and a gate electrode. The gate dielectric of the input/output transistor has a greater thickness than the gate dielectric of the logic transistor. A ferroelectric transistor is provided at the ferroelectric transistor region. The ferroelectric transistor includes a ferroelectric dielectric and a gate electrode. The ferroelectric dielectric is arranged between the ferroelectric transistor region and the gate electrode of the ferroelectric transistor.

Abstract: An illustrative semiconductor structure described herein includes a substrate including a logic transistor region, a ferroelectric transistor region and an input/output transistor region. A logic transistor is provided at the logic transistor region. The logic transistor includes a gate dielectric and a gate electrode. An input/output transistor is provided at the input/output transistor region. The input/output transistor includes a gate dielectric and a gate electrode. The gate dielectric of the input/output transistor has a greater thickness than the gate dielectric of the logic transistor. A ferroelectric transistor is provided at the ferroelectric transistor region. The ferroelectric transistor includes a ferroelectric dielectric and a gate electrode. The ferroelectric dielectric is arranged between the ferroelectric transistor region and the gate electrode of the ferroelectric transistor.

Abstract: A circuit for providing additional current in a memory cell without a higher supply voltage is provided. Embodiments include a circuit having a six transistor static random access memory (SRAM) cell including a first inverter and second cross-coupled to a second inverter; a first transistor having a first source coupled to a first bit-line, a first drain coupled to the first inverter, and a first gate coupled to a word-line; a second transistor having a second source coupled to the second inverter, a second drain coupled to a second bit-line, and a second gate coupled to the word-line; and a plurality of bit-line sensing transistors coupled to the first transistor and to the second transistor.

Abstract: A circuit for providing additional current in a memory cell without a higher supply voltage is provided. Embodiments include a circuit having a six transistor static random access memory (SRAM) cell including a first inverter and second cross-coupled to a second inverter; a first transistor having a first source coupled to a first bit-line, a first drain coupled to the first inverter, and a first gate coupled to a word-line; a second transistor having a second source coupled to the second inverter, a second drain coupled to a second bit-line, and a second gate coupled to the word-line; and a plurality of bit-line sensing transistors coupled to the first transistor and to the second transistor.