Patents by Inventor Seung-Hyun EOM

Seung-Hyun EOM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11922884
    Abstract: A display device includes: a first pixel including a first organic light emitting diode; an initialization voltage generator for generating a first initialization voltage to be supplied to an anode of the first organic light emitting diode; and a timing controller including a first lookup table in which a plurality of first initialization voltage values corresponding to a plurality of maximum luminances are recorded, the timing controller being configured to determine a value of the first initialization voltage, based on reception information on a target maximum luminance and the first lookup table.
    Type: Grant
    Filed: February 17, 2023
    Date of Patent: March 5, 2024
    Assignee: Samsung Display Co., Ltd.
    Inventors: Ji Hyun Ka, Seung Ji Cha, Mi Hae Kim, Ki Myeong Eom
  • Patent number: 11916186
    Abstract: The present invention relates to a method for preparing a sulfide-based solid electrolyte, a sulfide-based solid electrolyte prepared by the method, and an all-solid-state lithium secondary battery including the sulfide-based solid electrolyte. The method of the present invention includes a) mixing Li2S with P2S5 to prepare a mixed powder, b) placing the mixed powder, an ether, and stirring balls in a container, sealing the container, followed by stirring to prepare a suspension, and c) stirring the suspension under high-temperature and high-pressure conditions to prepare sulfide-based solid particles.
    Type: Grant
    Filed: February 15, 2017
    Date of Patent: February 27, 2024
    Assignee: SOLIVIS INC.
    Inventors: Dong Wook Shin, Min Yong Eom, Seung Hyun Oh, Chan Hwi Park, Sun Ho Choi
  • Patent number: 11830923
    Abstract: Disclosed is an RF switch device and, more particularly, an RF switch device having an air gap over a gate electrode and a metal interconnect at a position higher than the air gap and that at least partially overlap the air gap in the vertical direction, thereby preventing exposure of an upper portion of the air gap in subsequent processing.
    Type: Grant
    Filed: April 11, 2022
    Date of Patent: November 28, 2023
    Assignee: DB HiTek, Co., Ltd.
    Inventors: Seung Hyun Eom, Jin Hyo Jung, Hae Taek Kim, Ja Geon Koo, Ki Won Lim, Hyun Joong Lee, Sang Yong Lee
  • Patent number: 11640938
    Abstract: A semiconductor device is disclosed. The semiconductor device includes impurity regions formed in surface portions of a substrate, gate structures formed on surface portions of the substrate between the impurity regions, a first insulating layer formed on the impurity regions and the gate structures, first wiring patterns formed on the first insulating layer, and first contact patterns connecting the impurity regions and the first wiring patterns through the first insulating layer, and the first wiring patterns are arranged in a zigzag shape.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: May 2, 2023
    Assignee: DB HITEK CO., LTD.
    Inventors: Ki Won Lim, Jin Hyo Jung, Hae Taek Kim, Seung Hyun Eom, Ja Geon Koo, Hyun Joong Lee, Sang Yong Lee
  • Publication number: 20220367354
    Abstract: An RF switch device and a method of manufacturing the same are disclosed. More particularly, an RF switch device in a stacked configuration and a method of manufacturing the same seeking to reduce or eliminate a voltage imbalance, a condition in which different voltages are applied to different stages of the RF switch device, by forming air gaps on or over corresponding gate electrodes, in which each of the air gaps in a single stage has a different width.
    Type: Application
    Filed: April 27, 2022
    Publication date: November 17, 2022
    Inventors: Ki Won LIM, Jin Hyo JUNG, Hae Taek KIM, Seung Hyun EOM, Ja Geon KOO, Hyun Joong LEE, Sang Yong LEE
  • Publication number: 20220336620
    Abstract: Disclosed is an RF switch device and, more particularly, an RF switch device having an air gap over a gate electrode and a metal interconnect at a position higher than the air gap and that at least partially overlap the air gap in the vertical direction, thereby preventing exposure of an upper portion of the air gap in subsequent processing.
    Type: Application
    Filed: April 11, 2022
    Publication date: October 20, 2022
    Inventors: Seung Hyun EOM, Jin Hyo JUNG, Hae Taek KIM, Ja Geon KOO, Ki Won LIM, Hyun Joong LEE, Sang Yong LEE
  • Patent number: 11362655
    Abstract: Provided is an RF switch device (100) in which body contact regions (190) are formed at respective positions adjacent to or partially overlapping opposite ends of a gate region (110) so that holes in a body of the device can escape or flow in either or both of two directions, rather than in only a single direction.
    Type: Grant
    Filed: February 25, 2021
    Date of Patent: June 14, 2022
    Assignee: DB HiTek Co., Ltd.
    Inventors: Ja-Geon Koo, Jin-Hyo Jung, Hae-Taek Kim, Seung-Hyun Eom, Ki-Won Lim, Hyun-Joong Lee, Sang-Yong Lee
  • Publication number: 20220068793
    Abstract: A semiconductor device is disclosed. The semiconductor device includes impurity regions formed in surface portions of a substrate, gate structures formed on surface portions of the substrate between the impurity regions, a first insulating layer formed on the impurity regions and the gate structures, first wiring patterns formed on the first insulating layer, and first contact patterns connecting the impurity regions and the first wiring patterns through the first insulating layer, and the first wiring patterns are arranged in a zigzag shape.
    Type: Application
    Filed: August 30, 2021
    Publication date: March 3, 2022
    Inventors: Ki Won LIM, Jin Hyo JUNG, Hae Taek KIM, Seung Hyun EOM, Ja Geon KOO, Hyun Joong LEE, Sang Yong LEE
  • Patent number: 11152354
    Abstract: A bipolar junction transistor, a BiCMOS device including same, and a method of manufacturing the BiCMOS device are disclosed. To fabricate the BiCMOS device, a bipolar region and a CMOS region are on a lightly doped substrate to enhance isolation between devices. First-conductivity-type deep well regions are in the bipolar region and/or the CMOS region to prevent well-to-substrate diffusion.
    Type: Grant
    Filed: May 6, 2020
    Date of Patent: October 19, 2021
    Assignee: DB HiTek Co., Ltd.
    Inventors: Hyun-Jin Kim, Sang-Gil Kim, Seung-Hyun Eom, Yong-Jin Kim
  • Publication number: 20210281260
    Abstract: Provided is an RF switch device (100) in which body contact regions (190) are formed at respective positions adjacent to or partially overlapping opposite ends of a gate region (110) so that holes in a body of the device can escape or flow in either or both of two directions, rather than in only a single direction.
    Type: Application
    Filed: February 25, 2021
    Publication date: September 9, 2021
    Inventors: Ja-Geon KOO, Jin-Hyo JUNG, Hae-Taek KIM, Seung-Hyun EOM, Ki-Won LIM, Hyun-Joong LEE, Sang-Yong LEE
  • Publication number: 20200357790
    Abstract: A bipolar junction transistor, a BiCMOS device including same, and a method of manufacturing the BiCMOS device are disclosed. To fabricate the BiCMOS device, a bipolar region and a CMOS region are on a lightly doped substrate to enhance isolation between devices. First-conductivity-type deep well regions are in the bipolar region and/or the CMOS region to prevent well-to-substrate diffusion.
    Type: Application
    Filed: May 6, 2020
    Publication date: November 12, 2020
    Inventors: Hyun-Jin KIM, Sang-Gil KIM, Seung-Hyun EOM, Yong-Jin KIM